公开(公告)号：US20240246033A1

公开(公告)日：2024-07-25

申请号：US18420661

申请日：2024-01-23

Applicant: ENTEGRIS, INC.

Inventor： Zhifeng Li ,  John P. Puglia

IPC: B01D63/06 ,  D03D1/00 ,  D03D9/00 ,  D03D15/283

CPC classification number: B01D63/067 ,  D03D1/00 ,  D03D9/00 ,  D03D15/283 ,  B01D2313/143 ,  B01D2313/146 ,  D10B2321/12 ,  D10B2505/04

Abstract: Spacers for filtration applications are provided. A spacer for a filtration device comprises a substrate comprising a cyclic polyolefin. The substrate comprises a plurality of through-holes for filtering particles having an average particle size of greater than 50 μm. Filtration assemblies, filtration devices, and related systems and methods are also provided.

公开(公告)号：US12101920B2

公开(公告)日：2024-09-24

申请号：US18131208

申请日：2023-04-05

Applicant: ENTEGRIS, INC.

Inventor： Yuxuan Liu ,  Zhifeng Li ,  Carlo Waldfried ,  Yan Liu ,  Chandra Venkatraman ,  Pushkara Rao Varanasi

IPC: H05K9/00 ,  H01B1/00 ,  H01B1/12 ,  H01L21/683

CPC classification number: H05K9/0079 ,  H01B1/124 ,  H01L21/6833

Abstract: A conductive polymeric layer on an electrostatic chuck. The conductive polymeric layer comprises a conductive polymer and a photosensitive polymer. The conductivity of the conductive polymer promotes charge dissipation by the conductive polymeric layer, while the photosensitivity of the photosensitive polymer allows the surface of the conductive polymeric layer to be photopatterned. The extent to which the conductive polymeric layer is conductive and photosensitive may be modulated by varying the relative amounts of the conductive polymer and the photosensitive polymer.

公开(公告)号：US20230197491A1

公开(公告)日：2023-06-22

申请号：US18086432

申请日：2022-12-21

Applicant: ENTEGRIS, INC.

Inventor： Zhifeng Li ,  Pushkara Rao Varanasi ,  Michael C. Zabka

IPC: H01L21/673 ,  C09D5/24

CPC classification number: H01L21/67396 ,  C09D5/24 ,  H01L21/67366 ,  H01L21/67386

Abstract: A semiconductor processing apparatus including: a substrate comprising a polymer material layer; and a conductive polymer coating layer that coats at least a portion of the polymer material layer of the substrate, wherein the conductive polymer coating layer comprises conjugated polymers, wherein the conductive polymer coating layer has a total extractable metals less than 400 ng/g, and wherein the conductive polymer coating layer is configured to discharge electrostatic buildup in the semiconductor processing apparatus when connected to a semiconductor processing system.

公开(公告)号：US20230337407A1

公开(公告)日：2023-10-19

申请号：US18131208

申请日：2023-04-05

Applicant: ENTEGRIS, INC.

Inventor： Yuxuan Liu ,  Zhifeng Li ,  Carlo Waldfried ,  Yan Liu ,  Chandra Venkatraman ,  Pushkara Rao Varanasi

IPC: H05K9/00 ,  H01L21/683

CPC classification number: H05K9/0079 ,  H01L21/6833

Abstract: A conductive polymeric layer on an electrostatic chuck. The conductive polymeric layer comprises a conductive polymer and a photosensitive polymer. The conductivity of the conductive polymer promotes charge dissipation by the conductive polymeric layer, while the photosensitivity of the photosensitive polymer allows the surface of the conductive polymeric layer to be photopatterned. The extent to which the conductive polymeric layer is conductive and photosensitive may be modulated by varying the relative amounts of the conductive polymer and the photosensitive polymer.

公开(公告)号：US20220401893A1

公开(公告)日：2022-12-22

申请号：US17840394

申请日：2022-06-14

Applicant: ENTEGRIS, INC.

Inventor： Zhifeng Li ,  Sina Bonyadi ,  Pushkara Rao Varanasi

IPC: B01D71/58 ,  B01D69/02 ,  B01D69/12 ,  B01D67/00 ,  B01D61/02

Abstract: In summary, the disclosure provides certain membranes useful as filter materials in the removal of metal ions, metal particulates, and/or organic contaminants from liquid compositions, in particular liquid compositions used in the microelectronic device industry. The membranes of the disclosure are porous membranes comprised of poly(quinoline) polymers. Advantageously, the poly(quinoline) membranes are thermally stable and hydrolytically stable and can thus be cleaned between uses using acidic material such as dilute hydrochloric acid, without suffering from significant degradation. The poly(quinoline) polymers can be designed to be soluble in certain solvents, thus enabling the manufacture of the corresponding porous membranes by immersion-casting techniques.

公开(公告)号：US20220362720A1

公开(公告)日：2022-11-17

申请号：US17738518

申请日：2022-05-06

Applicant: ENTEGRIS, INC.

Inventor： Sina Bonyadi ,  Pushkara Rao Varanasi ,  Zhifeng Li ,  Carrie Lynn Frazee

IPC: B01D71/44 ,  B01D69/02 ,  B01D67/00

Abstract: The disclosure provides certain porous membranes comprised of cyclic polyolefin polymers, such as poly(norbornene)s. In one embodiment, a poly(norbornene) polymer is dissolved in tetrahydrofuran, cast into a film and subjected to solvent induced phase separation to provide a porous filter membrane (i.e., film).