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1.发明授权Fine powder of hydrophobic metal oxide, method for producing it, and toner composition for electrophotography 有权疏水性金属氧化物的细粉末，其制造方法和电子照相用调色剂组合物
公开(公告)号：US6077640A
公开(公告)日：2000-06-20
申请号：US306798
申请日：1999-05-07
CPC分类号： G03G9/09716 , G03G9/09708 , G03G9/09725
摘要： A fine powder of a hydrophobic metal oxide is provided which is produced through surface treatment of fine powder of a metal oxide with an epoxy compound and an alkylsilazane or ammonia thereby ring-opening the epoxy groups in the surface of the fine powder followed by introducing an amino group and an alkylsilyl group, or an amino group into the ring-opened epoxy groups. The fine hydrophobic metal oxide powder has good dispersability, flowability and electrification properties, and has good time-dependent stability. A toner composition for electrophotography that contains the fine hydrophobic metal oxide powder has stable and good imaging capabilities for a long period of time. Also provided is a method for modifying the surface of the fine metal oxide powder with a surface modifier, in which ammonia is introduced into the reaction system prior to the treatment of the fine powder with the surface modifier.
摘要翻译： 提供了通过用环氧化合物和烷基硅氮烷或氨表面处理金属氧化物的细粉而制备的疏水性金属氧化物的细粉末，从而使细粉表面中的环氧基开环，然后引入 氨基和烷基甲硅烷基，或氨基组成开环的环氧基。 细疏水性金属氧化物粉末具有良好的分散性，流动性和起电性，并且具有良好的时间依赖性稳定性。 含有微细疏水性金属氧化物粉末的电子照相用调色剂组合物长期稳定且良好的成像能力。 还提供了一种用表面改性剂改性金属氧化物粉末的表面的方法，其中在用表面改性剂处理细粉之前将氨引入反应体系中。
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公开(公告)号：US06573018B2
公开(公告)日：2003-06-03
申请号：US09821622
申请日：2001-03-29
申请人： Naruyasu Ishibashi , Eiji Komai , Ralph M. Brandes
发明人： Naruyasu Ishibashi , Eiji Komai , Ralph M. Brandes
IPC分类号： G03G9113
CPC分类号： C09C3/12 , C01P2006/12 , C01P2006/20 , C01P2006/90 , C09C1/3081
摘要： The tribo-electro static charge is stabilized by treating the surface of the metallic-oxide fine powders such as a silica powder, using the mixed solution which consists of a specific silane coupling agent containing primary amino group, other silane coupling agent containing amino group and the hydrophobic agent The powder such as silica has the small charge variation with time, and is suitable as the additive of the powder coatings or the electrophotographic toner.
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公开(公告)号：US20080145659A1
公开(公告)日：2008-06-19
申请号：US12017861
申请日：2008-01-22
IPC分类号： C01B33/12
CPC分类号： C01B33/183 , Y10T428/2982
摘要： Pyrogenically produced silicon dioxide powder in the form of aggregates of primary particles having a BET surface area of 300±25 m2/g, wherein the aggregates display an average surface area of 4800 to 6000 nm2, an average equivalent circle diameter (ECD) of 60 to 80 nm and an average circumference of 580 to 750 nm.It is produced by a pyrogenic process in which silicon tetrachloride and a maximum of up to 40 wt. % of a second silicon component comprising H3SiCl, H2SiCl2, HSiCl3, CH3SiCl3, (CH3)2SiCl2, (CH3)3SiCl and/or (n-C3H7)SiCl3 are mixed with primary air and a combustion gas and burnt into a reaction chamber, secondary air also being introduced into the reaction chamber, and the feed materials being chosen such that an adiabatic flame temperature of 1390 to 1450° C. is obtained.It can be used as a filler.
摘要翻译： 以BET表面积为300±25m 2 / g的一次粒子的聚集体形式的热解生成的二氧化硅粉末，其中聚集体的平均表面积为4800〜6000nm， 2，平均当量圆直径（ECD）为60〜80nm，平均周长为580〜750nm。 它是通过热解法生产的，其中四氯化硅和最多达40wt。 ％的包含H 3 SiCl，H 2 SiCl 2，HSiCl 3，CH，SUB的第二硅组分的％ （CH 3）3 SiCl 3，（CH 3 3）2 SiCl 2，（CH 3） 3 N 3 SiCl 3和/或（n C 3 H 7）SiCl 3 3与 初级空气和燃烧气体并燃烧到反应室中，二次空气也被引入反应室，并且进料选择为使得绝热火焰温度为1390至1450℃。 它可以用作填料。
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公开(公告)号：US07537833B2
公开(公告)日：2009-05-26
申请号：US11055605
申请日：2005-02-11
申请人： Kai Schumacher , Hauke Jacobsen , Ralph Brandes , Matthias Rochnia , Takeyoshi Shibasaki , Naruyasu Ishibashi
发明人： Kai Schumacher , Hauke Jacobsen , Ralph Brandes , Matthias Rochnia , Takeyoshi Shibasaki , Naruyasu Ishibashi
IPC分类号： B32B5/16
CPC分类号： C09K3/1463 , C01B33/1417 , C01B33/183 , Y10T428/2982 , Y10T428/2991 , Y10T428/2993 , Y10T428/2998
摘要： Pyrogenically produced silicon dioxide powder in the form of aggregates of primary particles having a BET surface area of 90±15 m2/g, wherein the aggregates display an average surface area of 10000 to 20000 nm2, an average equivalent circle diameter (ECD) of 90 to 130 nm and an average circumference of 1000 to 1400 nm.It is produced by a pyrogenic process in which silicon tetrachloride and a second silicon component comprising H3SiCl, H2SiCl2, HSiCl3, CH3SiCl3, (CH3)2SiCl2, (CH3)3SiCl and/or (n-C3H7)SiCl3 are mixed with primary air and a combustion gas and burnt into a reaction chamber, secondary air also being introduced into the reaction chamber, and the feed materials being chosen such that an adiabatic flame temperature of 1810 to 1890° C. is obtained.Dispersion containing the pyrogenically produced silicon dioxide powder.
摘要翻译： 以BET表面积为90±15m 2 / g的一次粒子聚集体形式的热解法生产的二氧化硅粉末，其中聚集体的平均表面积为10000〜20000nm 2，平均当量圆直径（ECD）为90 至130nm，平均周长为1000〜1400nm。 其通过热解法制备，其中将四氯化硅和包含H3SiCl，H 2 SiCl 2，HSiCl 3，CH 3 SiCl 3，（CH 3）2 SiCl 2，（CH 3）3 SiCl和/或（n-C 3 H 7）SiCl 3的第二硅组分与一次空气和 燃烧气体并燃烧到反应室中，二次空气也被引入反应室，并且进料选择为使得获得1810至1890℃的绝热火焰温度。 含有热解产生的二氧化硅粉末的分散体。
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5.发明授权Glycols starting materials containing dispersed superfine ceramic powder coagulates capable of forming polyester molded bodies having high mechanical strength and transparency 失效含有分散的超细陶瓷粉末的二醇原料凝结，能够形成具有高机械强度和透明度的聚酯成型体公开(公告)号：US06852789B2
公开(公告)日：2005-02-08
申请号：US10076079
申请日：2002-02-15
申请人： Mitsuru Ochiai , Keiichi Iida , Naruyasu Ishibashi
发明人： Mitsuru Ochiai , Keiichi Iida , Naruyasu Ishibashi
摘要： Glycol starting materials for manufacturing a polyester molded body containing 1 to 20% by weight of dispersed superfine ceramic powder aggregates relative to the total weight of the glycol for enabling polyester molded bodies having a high mechanical strength and transparency to be manufactured. The superfine ceramic powder aggregates dispersed in the glycol starting material have a mean particle size of 0.05 to 0.5 μm as measured with a laser diffraction particle size distribution analyzer, and wherein the peak indicated in a particle size distribution curve of the superfine ceramic powder aggregates obtained based on the results of the measurement satisfies the relationship of w/h≦0.7, wherein h is the peak height and w is the peak width at one half of the peak height (a half-width).
摘要翻译： 用于制造聚酯成型体的二醇原料，其含有1至20重量％的分散的超细陶瓷粉末聚集体相对于二醇的总重量，用于制造具有高机械强度和透明度的聚酯成型体。 分散在二醇起始原料中的超细陶瓷粉末聚集体的平均粒径为0.05〜0.5μm，用激光衍射式粒度分布分析仪测定，其中所获得的超细陶瓷粉末聚集体的粒度分布曲线中所示的峰 基于测量结果满足w / h <= 0.7的关系，其中h是峰高，w是峰高（半宽）的一半处的峰宽。
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公开(公告)号：US07351388B2
公开(公告)日：2008-04-01
申请号：US11085151
申请日：2005-03-22
IPC分类号： C01B33/12
CPC分类号： C01B33/183 , Y10T428/2982
摘要： Pyrogenically produced silicon dioxide powder in the form of aggregates of primary particles having a BET surface area of 300±25 m2/g, wherein the aggregates display an average surface area of 4800 to 6000 nm2, an average equivalent circle diameter (ECD) of 60 to 80 nm and an average circumference of 580 to 750 nm.It is produced by a pyrogenic process in which silicon tetrachloride and a maximum of up to 40 wt. % of a second silicon component comprising H3SiCl, H2SiCl2, HSiCl3, CH3SiCl3, (CH3)2SiCl2, (CH3)3SiCl and/or (n-C3H7)SiCl3 are mixed with primary air and a combustion gas and burnt into a reaction chamber, secondary air also being introduced into the reaction chamber, and the feed materials being chosen such that an adiabatic flame temperature of 1390 to 1450° C. is obtained.It can be used as a filler.
摘要翻译： 以BET表面积为300±25m 2 / g的一次粒子的聚集体形式的热解生成的二氧化硅粉末，其中聚集体的平均表面积为4800〜6000nm， 2，平均当量圆直径（ECD）为60〜80nm，平均周长为580〜750nm。 它是通过热解法生产的，其中四氯化硅和最多达40wt。 ％的包含H 3 SiCl，H 2 SiCl 2，HSiCl 3，CH，SUB的第二硅组分的％ （CH 3）3 SiCl 3，（CH 3 3）2 SiCl 2，（CH 3） 3 N 3 SiCl 3和/或（n C 3 H 7）SiCl 3 3与 初级空气和燃烧气体并燃烧到反应室中，二次空气也被引入反应室，并且进料选择为使得绝热火焰温度为1390至1450℃。 它可以用作填料。
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公开(公告)号：US20060153764A1
公开(公告)日：2006-07-13
申请号：US11085151
申请日：2005-03-22
IPC分类号： C01B33/12
CPC分类号： C01B33/183 , Y10T428/2982
摘要： Pyrogenically produced silicon dioxide powder in the form of aggregates of primary particles having a BET surface area of 300±25 m2/g, wherein the aggregates display an average surface area of 4800 to 6000 nm2, an average equivalent circle diameter (ECD) of 60 to 80 nm and an average circumference of 580 to 750 nm. It is produced by a pyrogenic process in which silicon tetrachloride and a maximum of up to 40 wt. % of a second silicon component comprising H3SiCl, H2SiCl2, HSiCl3, CH3SiCl3, (CH3)2SiCl2, (CH3)3SiCl and/or (n-C3H7)SiCl3 are mixed with primary air and a combustion gas and burnt into a reaction chamber, secondary air also being introduced into the reaction chamber, and the feed materials being chosen such that an adiabatic flame temperature of 1390 to 1450° C. is obtained. It can be used as a filler.
摘要翻译： 以BET表面积为300±25m 2 / g的一次粒子的聚集体形式的热解生成的二氧化硅粉末，其中聚集体的平均表面积为4800〜6000nm， 2，平均当量圆直径（ECD）为60〜80nm，平均周长为580〜750nm。 它是通过热解法生产的，其中四氯化硅和最多达40wt。 ％的包含H 3 SiCl，H 2 SiCl 2，HSiCl 3，CH，SUB的第二硅组分的％ （CH 3）3 SiCl 3，（CH 3 3）2 SiCl 2，（CH 3） 3 N 3 SiCl 3和/或（n C 3 H 7）SiCl 3 3与 初级空气和燃烧气体并燃烧到反应室中，二次空气也被引入反应室，并且进料选择为使得绝热火焰温度为1390至1450℃。 它可以用作填料。
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8.发明申请Highly dispersible fine hydrophobic silica powder and process for producing the same 有权高分散性疏水性疏水性二氧化硅粉末及其制造方法公开(公告)号：US20060067867A1
公开(公告)日：2006-03-30
申请号：US10540002
申请日：2003-12-25
IPC分类号： C01B33/12
CPC分类号： C09C1/3081 , C01B33/18 , C01P2006/12 , C01P2006/40 , C01P2006/80 , C08K3/36 , C08K9/06 , C09D7/62
摘要： A high dispersible hydrophobic fine silica powder can be made, wherein the silica powder has hydrophobicity of more than 50%, triboelectrostatic charge of more than −500 μC/g, decomposition rate of an organic group on the powder surface of less than 15%, transmittance of a 5% alcoholic dispersion liquid of more than 40% preferably, and a specific surface area of more than 200 m2/g. This high dispersible hydrophobic fine silica powder can be made by mixing a hydrophobic agent comprising a volatile organic silicon compound in the gas state with a fine silica powder in a fluidized bed type reaction vessel at the time of a hydrophobic treatment, and controlling a gas flow rate to more than 5.0 cm/sec at the time of this mixing.
摘要翻译： 可以制备高分散性疏水性二氧化硅微粉，其中二氧化硅粉末的疏水性大于50％，摩擦电沉积量大于-500μC/ g，粉末表面有机基团的分解率小于15％ 5％醇分散液的透光率优选大于40％，比表面积大于200m 2 / g。 这种高分散性疏水性细二氧化硅粉末可以通过在疏水处理时将包含气态挥发性有机硅化合物的疏水剂与流化床型反应容器中的二氧化硅细粉混合，并控制气流 在混合时速率超过5.0厘米/秒。
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公开(公告)号：US06759451B2
公开(公告)日：2004-07-06
申请号：US10176547
申请日：2002-06-24
IPC分类号： C08K906
摘要： A surface modified inorganic oxide powder is provided, which includes inorganic oxide particles having a surface modified with a mixed solution, which includes an organopoly-siloxane and a silane compound, in the presence of an acid or a base.
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10.发明授权Highly dispersible fine hydrophobic silica powder and process for producing the same 有权高分散性疏水性疏水性二氧化硅粉末及其制造方法公开(公告)号：US07494636B2
公开(公告)日：2009-02-24
申请号：US10540002
申请日：2003-12-25
IPC分类号： C01B33/12
CPC分类号： C09C1/3081 , C01B33/18 , C01P2006/12 , C01P2006/40 , C01P2006/80 , C08K3/36 , C08K9/06 , C09D7/62
摘要： A high dispersible hydrophobic fine silica powder can be made, wherein the silica powder has hydrophobicity of more than 50%, triboelectrostatic charge of more than −500 μC/g, decomposition rate of an organic group on the powder surface of less than 15%, transmittance of a 5% alcoholic dispersion liquid of more than 40% preferably, and a specific surface area of more than 200 m2/g. This high dispersible hydrophobic fine silica powder can be made by mixing a hydrophobic agent comprising a volatile organic silicon compound in the gas state with a fine silica powder in a fluidized bed type reaction vessel at the time of a hydrophobic treatment, and controlling a gas flow rate to more than 5.0 cm/sec at the time of this mixing.
摘要翻译： 可以制备高分散性疏水性二氧化硅微粉，其中二氧化硅粉末具有超过50％的疏水性，大于-500μC/ g的摩擦电沉积电荷，粉末表面上的有机基团的分解速率小于15％ 5％酒精分散液的透光率优选大于40％，比表面积大于200m2 / g。 这种高分散性疏水性细二氧化硅粉末可以通过在疏水处理时将包含气态挥发性有机硅化合物的疏水剂与流化床型反应容器中的二氧化硅细粉混合，并控制气流 在混合时速率超过5.0厘米/秒。
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