Amorphous, fine silica particles, and method for their production and their use
    2.
    发明授权
    Amorphous, fine silica particles, and method for their production and their use 失效
    无定形,细二氧化硅颗粒及其制备方法及其用途

    公开(公告)号:US07083770B2

    公开(公告)日:2006-08-01

    申请号:US10049902

    申请日:2001-06-20

    IPC分类号: C01B33/18 C08K3/36

    摘要: The amorphous-silica particle having 0.1–0.7 μm of the average particle diameter, 5–30 m2/g of the specific surface area, less than 40% of the dispersion coefficient, and 20 μC/m2 of the absolute value of the triboelectrostatic charge, can be obtained, by setting flame temperature to more than melting point of silica, raising the silica concentration in a flame, and staying the generated silica particle in the flame for a short time to be grew up. Since this silica particle has a particle shape being near a true sphere, and a particle size of said particle is remarkably uniform, so it is suitable for a filler of a semiconductor sealing agent or various materials, etc. In addition, since said particle has strong electrification, it is also suitable for an outer or an inner additional agent of a toner for an electronic photograph, a photo conductor material for a electronic photograph, and a material of an electric charge transportation layer, etc.

    摘要翻译: 平均粒径为0.1-0.7μm,比表面积为5-30m 2 / g,分散系数小于40%的非晶二氧化硅颗粒和20μm/ m 2 通过将火焰温度设定为大于二氧化硅的熔点,提高火焰中的二氧化硅浓度,并将所产生的二氧化硅粒子停留在火焰中,可以获得摩擦电沉积电荷的绝对值的“2” 在短时间内长大。 由于该二氧化硅粒子具有接近真实球体的粒子形状,并且所述粒子的粒径非常均匀,因此适合于半导体密封剂或各种材料等的填料。此外,由于所述粒子具有 强电气化,也适用于电子照相用调色剂的外部或内部附加剂,电子照相用光导体材料和电荷输送层的材料等。

    Highly dispersible fine hydrophobic silica powder and process for producing the same
    3.
    发明申请
    Highly dispersible fine hydrophobic silica powder and process for producing the same 有权
    高分散性疏水性疏水性二氧化硅粉末及其制造方法

    公开(公告)号:US20060067867A1

    公开(公告)日:2006-03-30

    申请号:US10540002

    申请日:2003-12-25

    IPC分类号: C01B33/12

    摘要: A high dispersible hydrophobic fine silica powder can be made, wherein the silica powder has hydrophobicity of more than 50%, triboelectrostatic charge of more than −500 μC/g, decomposition rate of an organic group on the powder surface of less than 15%, transmittance of a 5% alcoholic dispersion liquid of more than 40% preferably, and a specific surface area of more than 200 m2/g. This high dispersible hydrophobic fine silica powder can be made by mixing a hydrophobic agent comprising a volatile organic silicon compound in the gas state with a fine silica powder in a fluidized bed type reaction vessel at the time of a hydrophobic treatment, and controlling a gas flow rate to more than 5.0 cm/sec at the time of this mixing.

    摘要翻译: 可以制备高分散性疏水性二氧化硅微粉,其中二氧化硅粉末的疏水性大于50%,摩擦电沉积量大于-500μC/ g,粉末表面有机基团的分解率小于15% 5%醇分散液的透光率优选大于40%,比表面积大于200m 2 / g。 这种高分散性疏水性细二氧化硅粉末可以通过在疏水处理时将包含气态挥发性有机硅化合物的疏水剂与流化床型反应容器中的二氧化硅细粉混合,并控制气流 在混合时速率超过5.0厘米/秒。

    Pyrogenically produced silicon dioxide powder and dispersion thereof
    5.
    发明授权
    Pyrogenically produced silicon dioxide powder and dispersion thereof 有权
    热解产生的二氧化硅粉末及其分散体

    公开(公告)号:US07537833B2

    公开(公告)日:2009-05-26

    申请号:US11055605

    申请日:2005-02-11

    IPC分类号: B32B5/16

    摘要: Pyrogenically produced silicon dioxide powder in the form of aggregates of primary particles having a BET surface area of 90±15 m2/g, wherein the aggregates display an average surface area of 10000 to 20000 nm2, an average equivalent circle diameter (ECD) of 90 to 130 nm and an average circumference of 1000 to 1400 nm.It is produced by a pyrogenic process in which silicon tetrachloride and a second silicon component comprising H3SiCl, H2SiCl2, HSiCl3, CH3SiCl3, (CH3)2SiCl2, (CH3)3SiCl and/or (n-C3H7)SiCl3 are mixed with primary air and a combustion gas and burnt into a reaction chamber, secondary air also being introduced into the reaction chamber, and the feed materials being chosen such that an adiabatic flame temperature of 1810 to 1890° C. is obtained.Dispersion containing the pyrogenically produced silicon dioxide powder.

    摘要翻译: 以BET表面积为90±15m 2 / g的一次粒子聚集体形式的热解法生产的二氧化硅粉末,其中聚集体的平均表面积为10000〜20000nm 2,平均当量圆直径(ECD)为90 至130nm,平均周长为1000〜1400nm。 其通过热解法制备,其中将四氯化硅和包含H3SiCl,H 2 SiCl 2,HSiCl 3,CH 3 SiCl 3,(CH 3)2 SiCl 2,(CH 3)3 SiCl和/或(n-C 3 H 7)SiCl 3的第二硅组分与一次空气和 燃烧气体并燃烧到反应室中,二次空气也被引入反应室,并且进料选择为使得获得1810至1890℃的绝热火焰温度。 含有热解产生的二氧化硅粉末的分散体。

    Ultrafine particle silicon dioxide and process for producing the same
    6.
    发明授权
    Ultrafine particle silicon dioxide and process for producing the same 有权
    超微粒子二氧化硅及其制造方法

    公开(公告)号:US06352679B1

    公开(公告)日:2002-03-05

    申请号:US09395142

    申请日:1999-09-14

    IPC分类号: C01B3312

    摘要: An ultrafine particle silicon dioxide which comprises silicon dioxide powders in the range of ultrafine particles having a BET specific surface area of 350 m2/g or more and has a ratio of BET/CTAB specific surface areas of 0.6 to 1.1, a number average of primary particle diameters of 1 to 20 nm, void volume measured with a mercury porosimeter of 0.1 to 1.0 ml/g and linseed oil absorption of 350 to 600 ml/100 g. According to the present invention, the ultrafine particle silicon dioxide can provide various kinds of polymers with excellent mechanical strength and transparency as a filler.

    摘要翻译: 一种超微粒子二氧化硅,其特征在于,在BET比表面积为350m 2 / g以上的超微粒子范围内的二氧化硅粉末,BET / CTAB比表面积的比例为0.6〜1.1, 粒径为1至20nm,用水银孔隙度计测量的空隙体积为0.1至1.0ml / g,亚麻籽油吸收为350至600ml / 100g。 根据本发明,超细颗粒二氧化硅可以提供具有优异的机械强度和透明度的各种聚合物作为填料。

    Lancing apparatus with means for ready replacement or renewal of lances
for top blown metallurgical furnaces
    8.
    发明授权
    Lancing apparatus with means for ready replacement or renewal of lances for top blown metallurgical furnaces 失效
    具有用于即将更换或更新顶吹冶金炉的喷枪的装置的切割机

    公开(公告)号:US3968956A

    公开(公告)日:1976-07-13

    申请号:US523877

    申请日:1974-11-14

    IPC分类号: C21C5/46 C21C5/32

    CPC分类号: C21C5/462

    摘要: For detachably holding a lance in axial alignment with the mouth or top opening of a metallurgical furnace, use is made of a chuck through which the lance can be inserted upwardly for communication with an outlet conduit extending downwardly from a vessel defining a pressure-tight air or oxygen chamber therein. A packing box supported under the outlet conduit houses means for establishing pressure-tight communication between the lance and the outlet conduit. The vessel, the packing box and the chuck are all bracketed to a carriage movable along a vertical track for causing up-and-down motion of the lance into and out of the furnace mouth. According to another embodiment of the invention, means are further provided for rotating the lance while the latter is inserted into the furnace.

    摘要翻译: 为了可拆卸地保持喷枪与冶金炉的口或顶部开口轴向对准,使用卡盘,喷枪可以通过该卡盘向上插入,用于与从限定压力空气的容器向下延伸的出口导管连通 或氧气室。 支撑在出口导管下方的包装箱容纳用于在喷枪和出口导管之间建立压力连通的装置。 容器,包装盒和卡盘都被包围到可沿着垂直轨道运动的托架,用于使得喷枪进出炉口的上下运动。 根据本发明的另一个实施例,还提供了用于使喷枪旋转的装置,同时将喷枪插入炉中。

    Highly dispersible fine hydrophobic silica powder and process for producing the same
    10.
    发明授权
    Highly dispersible fine hydrophobic silica powder and process for producing the same 有权
    高分散性疏水性疏水性二氧化硅粉末及其制造方法

    公开(公告)号:US07494636B2

    公开(公告)日:2009-02-24

    申请号:US10540002

    申请日:2003-12-25

    IPC分类号: C01B33/12

    摘要: A high dispersible hydrophobic fine silica powder can be made, wherein the silica powder has hydrophobicity of more than 50%, triboelectrostatic charge of more than −500 μC/g, decomposition rate of an organic group on the powder surface of less than 15%, transmittance of a 5% alcoholic dispersion liquid of more than 40% preferably, and a specific surface area of more than 200 m2/g. This high dispersible hydrophobic fine silica powder can be made by mixing a hydrophobic agent comprising a volatile organic silicon compound in the gas state with a fine silica powder in a fluidized bed type reaction vessel at the time of a hydrophobic treatment, and controlling a gas flow rate to more than 5.0 cm/sec at the time of this mixing.

    摘要翻译: 可以制备高分散性疏水性二氧化硅微粉,其中二氧化硅粉末具有超过50%的疏水性,大于-500μC/ g的摩擦电沉积电荷,粉末表面上的有机基团的分解速率小于15% 5%酒精分散液的透光率优选大于40%,比表面积大于200m2 / g。 这种高分散性疏水性细二氧化硅粉末可以通过在疏水处理时将包含气态挥发性有机硅化合物的疏水剂与流化床型反应容器中的二氧化硅细粉混合,并控制气流 在混合时速率超过5.0厘米/秒。