公开(公告)号：US5574247A

公开(公告)日：1996-11-12

申请号：US263323

申请日：1994-06-21

申请人： Eisuke Nishitani ,  Susmu Tsuzuku ,  Natsuyo Chiba ,  Shigeru Kobayashi ,  Naoyuki Tamura ,  Norihiro Uchida

发明人： Eisuke Nishitani ,  Susmu Tsuzuku ,  Natsuyo Chiba ,  Shigeru Kobayashi ,  Naoyuki Tamura ,  Norihiro Uchida

IPC分类号： H01L21/285 ,  C23C16/02 ,  C23C16/44 ,  C23C16/455 ,  C23C16/458 ,  C23C16/48 ,  C23C16/54 ,  H01L21/205 ,  H01L21/31 ,  C23C16/00

CPC分类号： C23C16/45521 ,  C23C16/0245 ,  C23C16/4585 ,  C23C16/481 ,  C23C16/54

摘要： A CVD reactor apparatus includes a substrate clamp for clamping a peripheral edge of the front of a substrate disposed in a CVD reactor and, dividing a space in the reactor into a first space adjacent the front of the substrate and a second space adjacent the backside of the substrate. The apparatus also includes a unit for cooling the surface temperature of an inner wall of the reactor to a temperature equal to or less than a deposition lower limit, and a unit for supplying a CVD gas to the first space adjacent the substrate front and supplying an inert gas to the second space adjacent the substrate backside at different pressures and causing a reaction at only the substrate front, a reaction gas monitor and a substrate temperature monitor.

摘要翻译： CVD反应器装置包括用于夹持设置在CVD反应器中的衬底的前部的周边边缘并将反应器中的空间分成邻近衬底前部的第一空间的衬底夹具和邻近衬底前侧的第二空间 底物。 该装置还包括用于将反应器的内壁的表面温度冷却到等于或小于沉积下限的温度的单元，以及用于将CVD气体供应到邻近基板前部的第一空间并提供 惰性气体在不同压力下靠近衬底背面的第二空间并且仅在衬底前部产生反应，反应气体监测器和衬底温度监测器。