Abstract:
An array of scattering and/or reflector antennas are configured to produce a series of beam patterns, where in some embodiments the scattering antenna and/or the reflector antenna includes complementary metamaterial elements. In some embodiments control circuitry is operably connected to the array to produce an image of an object in the beam pattern.
Abstract:
An array of scattering and/or reflector antennas are configured to produce a series of beam patterns, where in some embodiments the scattering antenna and/or the reflector antenna includes complementary metamaterial elements. In some embodiments control circuitry is operably connected to the array to produce an image of an object in the beam pattern.
Abstract:
An array of scattering and/or reflector antennas are configured to produce a series of beam patterns, where in some embodiments the scattering antenna and/or the reflector antenna includes complementary metamaterial elements. In some embodiments circuitry may be configured to set a series of conditions corresponding to the array to produce the series of beam patterns, and to produce an image of an object that is illuminated by the series of beam patterns.
Abstract:
A surface scattering reflector antenna includes a plurality of adjustable scattering elements and is configured to produce a reflected beam pattern according to the configuration of the adjustable scattering elements.
Abstract:
An array of scattering and/or reflector antennas are configured to produce a series of beam patterns, where in some embodiments the scattering antenna and/or the reflector antenna includes complementary metamaterial elements. In some embodiments circuitry may be configured to set a series of conditions corresponding to the array to produce the series of beam patterns, and to produce an image of an object that is illuminated by the series of beam patterns.
Abstract:
A surface scattering reflector antenna includes a plurality of adjustable scattering elements and is configured to produce a reflected beam pattern according to the configuration of the adjustable scattering elements.