公开(公告)号：US12057287B2

公开(公告)日：2024-08-06

申请号：US17709025

申请日：2022-03-30

Applicant: FEI Company

Inventor： Jan Stopka ,  Bohuslav Sed'A ,  Radovan Va{hacek over (s)}ina ,  Radim {hacek over (S)}ejnoha

IPC: H01J37/153 ,  G06T7/70 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/153 ,  G06T7/70 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/1534

Abstract: The beamlets in a multi-beam microscopy system are aligned based on coefficients of a fitted aberration model. In particular, an illuminator for directing the beamlets towards the sample is adjusted based on the coefficients to correct the aberrations. The coefficients are obtained based on measured beamlets' positions in the sample plane.