公开(公告)号：US12106933B2

公开(公告)日：2024-10-01

申请号：US17694549

申请日：2022-03-14

Applicant: FEI Company

Inventor： Jan Stopka ,  Bohuslav Sed'a

IPC: H01J37/28 ,  H01J37/10 ,  H01J37/153

CPC classification number: H01J37/28 ,  H01J37/10 ,  H01J37/153 ,  H01J2237/0453 ,  H01J2237/1532

Abstract: An example multi-beam scanning electron microscope (MB-SEM) for correcting both astigmatism and linear distortion at least includes an electron source coupled to provide an electron beam, an aperture plate comprising an array of apertures, the aperture plate arranged to form an array of electron beamlets from the electron beam, and an electron column including a plurality of lenses and first and second stigmators, the electron column coupled to direct the array of electron beamlets toward a sample, wherein the first and second stigmators are arranged and excited to correct both astigmatism and linear distortion.

公开(公告)号：US20220328284A1

公开(公告)日：2022-10-13

申请号：US17694549

申请日：2022-03-14

Applicant: FEI Company

Inventor： Jan Stopka ,  Bohuslav Sed'a

IPC: H01J37/28 ,  H01J37/153 ,  H01J37/10

Abstract: An example multi-beam scanning electron microscope (MB-SEM) for correcting both astigmatism and linear distortion at least includes an electron source coupled to provide an electron beam, an aperture plate comprising an array of apertures, the aperture plate arranged to form an array of electron beamlets from the electron beam, and an electron column including a plurality of lenses and first and second stigmators, the electron column coupled to direct the array of electron beamlets toward a sample, wherein the first and second stigmators are arranged and excited to correct both astigmatism and linear distortion.

公开(公告)号：US20250006453A1

公开(公告)日：2025-01-02

申请号：US18342643

申请日：2023-06-27

Applicant: FEI Company

Inventor： Jan Stopka ,  Tomáš Radlicka ,  Martin Oral

IPC: H01J37/14 ,  H01J37/20 ,  H01J37/21 ,  H01J37/28

Abstract: Magnetic lenses, charged particle microscope systems including the same, and associated methods. In an example, a magnetic lens is configured to direct a charged particle beam to a sample location and comprises a plurality of pole pieces and at least two independent coils. The magnetic lens operates as an objective lens with variable main objective plane without immersing a sample in a magnetic field. The variable main objective plane permits selective adjustment of a magnification of the charged particle beam at the focal plane without immersing the sample location in the magnetic fields produced by coils of the magnetic lens. In an example, a charged particle microscope system comprises a charged particle source, a sample holder, and a magnetic objective lens. In an example, a method comprises positioning a sample relative to a magnetic lens and operating the magnetic lens to focus a charged particle beam to a focus location.

公开(公告)号：US20210296088A1

公开(公告)日：2021-09-23

申请号：US17191022

申请日：2021-03-03

Applicant: FEI Company

Inventor： Pavel Stejskal ,  Bohuslav Sed'a ,  Petr Hlavenka ,  Libor Novák ,  Jan Stopka

IPC: H01J37/28 ,  H01J37/20 ,  H01J37/244 ,  H01J37/26

Abstract: The invention relates to system and method of inspecting a specimen with a plurality of charged particle beamlets. The method comprises the steps of providing a specimen, providing a plurality of charged particle beamlets and focusing said plurality of charged particle beamlets onto said specimen, and detecting a flux of radiation emanating from the specimen in response to said irradiation by said plurality of charged particle beamlets.

公开(公告)号：US12057287B2

公开(公告)日：2024-08-06

申请号：US17709025

申请日：2022-03-30

Applicant: FEI Company

Inventor： Jan Stopka ,  Bohuslav Sed'A ,  Radovan Va{hacek over (s)}ina ,  Radim {hacek over (S)}ejnoha

IPC: H01J37/153 ,  G06T7/70 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/153 ,  G06T7/70 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/1534

Abstract: The beamlets in a multi-beam microscopy system are aligned based on coefficients of a fitted aberration model. In particular, an illuminator for directing the beamlets towards the sample is adjusted based on the coefficients to correct the aberrations. The coefficients are obtained based on measured beamlets' positions in the sample plane.

公开(公告)号：US11676795B2

公开(公告)日：2023-06-13

申请号：US17191022

申请日：2021-03-03

Applicant: FEI Company

Inventor： Pavel Stejskal ,  Bohuslav Sed'a ,  Petr Hlavenka ,  Libor Novák ,  Jan Stopka

IPC: H01J37/28 ,  H01J37/20 ,  H01J37/244 ,  H01J37/26

CPC classification number: H01J37/28 ,  H01J37/20 ,  H01J37/244 ,  H01J37/265 ,  H01J2237/049 ,  H01J2237/2445 ,  H01J2237/24475 ,  H01J2237/2801

Abstract: The invention relates to system and method of inspecting a specimen with a plurality of charged particle beamlets. The method comprises the steps of providing a specimen, providing a plurality of charged particle beamlets and focusing said plurality of charged particle beamlets onto said specimen, and detecting a flux of radiation emanating from the specimen in response to said irradiation by said plurality of charged particle beamlets.