公开(公告)号：US20140083971A1

公开(公告)日：2014-03-27

申请号：US14030985

申请日：2013-09-18

Applicant: FUJIFILM CORPORATION

Inventor： Takamichi FUJII ,  Akihiro MUKAIYAMA

IPC: H01L41/332

CPC classification number: H01L41/332 ,  C09K13/08 ,  H01L41/0477 ,  H01L41/1876

Abstract: The present invention provides an etching solution for etching a piezoelectric film having a thin film of a perovskite structure grown to be a columnar structure on a lower electrode formed on a substrate and having a pyrochlore layer at an interface thereof with the lower electrode, wherein the etching solution comprises at least: a hydrofluoric acid type chemical comprising at least any of buffered hydrofluoric acid (BHF), hydrogen fluoride (HF), and diluted hydrofluoric acid (DHF); and nitric acid, and has a concentration by weight of hydrochloric acid of less than 10% and a weight ratio of hydrochloric acid to nitric acid (hydrochloric acid/nitric acid) of 1/4 or less. The present invention also provides a method of manufacturing a piezoelectric element to carry out etching using the etching solution.

Abstract translation: 本发明提供了一种蚀刻溶液，用于蚀刻具有在基板上形成的下电极上形成为柱状结构的钙钛矿型结构的薄膜的压电膜，并在其与下电极的界面处具有烧绿石层，其中， 蚀刻溶液至少包括：包含缓冲氢氟酸（BHF），氟化氢（HF）和稀释氢氟酸（DHF）中的至少任一种的氢氟酸型化学品; 和硝酸，盐酸浓度小于10％，盐酸与硝酸（盐酸/硝酸）的重量比为1/4以下。 本发明还提供一种制造压电元件以使用蚀刻溶液进行蚀刻的方法。

公开(公告)号：US20230270014A1

公开(公告)日：2023-08-24

申请号：US18167151

申请日：2023-02-10

Applicant: FUJIFILM Corporation

Inventor： Fumihiko MOCHIZUKI ,  Hiroyuki KOBAYASHI ,  Akihiro MUKAIYAMA

IPC: H10N30/853 ,  H10N30/20

CPC classification number: H10N30/8554 ,  H10N30/2047

Abstract: There is provided a piezoelectric laminate including, in the following order, a lower electrode layer and a piezoelectric film containing a Pb-containing perovskite-type oxide, in which the piezoelectric film contains an oxygen atom 18O having a mass number of 18 in oxygen as a constituent element in excess of a natural abundance ratio. There are also provided a piezoelectric laminate, a piezoelectric element, and a manufacturing method for a piezoelectric laminate.

公开(公告)号：US20160027996A1

公开(公告)日：2016-01-28

申请号：US14871339

申请日：2015-09-30

Applicant: FUJIFILM Corporation

Inventor： Takamichi FUJII ,  Akihiro MUKAIYAMA

IPC: H01L41/332 ,  H01L41/29

CPC classification number: H01L41/332 ,  H01L41/0477 ,  H01L41/1875 ,  H01L41/1876 ,  H01L41/29

Abstract: In a method for etching a piezoelectric film and a manufacturing method thereof, a piezoelectric film is formed on a substrate on which a lower electrode is formed, a metal film having a thickness of 20 nm to 300 nm is formed, a patterned resist film is formed, the metal film is etched with a first etchant to which the piezoelectric film has etching resistance, and the piezoelectric film is etched with a second etchant to which the metal film has etching resistance.

Abstract translation: 在蚀刻压电膜的方法及其制造方法中，在形成有下电极的基板上形成压电膜，形成厚度为20nm〜300nm的金属膜，图案化抗蚀剂膜为 形成的金属膜用压电膜具有耐腐蚀性的第一蚀刻剂进行蚀刻，并用第二蚀刻剂蚀刻压电膜，金属膜具有耐蚀刻性。

公开(公告)号：US20130300254A1

公开(公告)日：2013-11-14

申请号：US13837420

申请日：2013-03-15

Applicant: FUJIFILM CORPORATION

Inventor： Takamichi FUJII ,  Akihiro MUKAIYAMA

IPC: H01L41/047 ,  H01L41/33

CPC classification number: H01L41/047 ,  G01C19/5663 ,  H01L41/0475 ,  H01L41/0477 ,  H01L41/0805 ,  H01L41/1876 ,  H01L41/29 ,  H01L41/316 ,  H01L41/33 ,  Y10T29/42

Abstract: A piezoelectric device includes: a substrate; a lower electrode provided on a substrate; a piezoelectric film provided by being laminated on the lower electrode, the piezoelectric film being formed of lead zirconate titanate (PZT) containing 6 at % or more in atomic composition percentage of at least one type of metal element selected from V group and VI group; an oxide electrode layer provided by being laminated on the piezoelectric film; a first metal electrode layer containing an oxidation-resistant precious metal provided by being laminated on the oxide electrode layer; a second metal electrode layer provided by being laminated on the first metal electrode layer; and a wire connected to the second metal electrode layer.

Abstract translation: 压电装置包括：基板; 设置在基板上的下电极; 通过层压在下电极上的压电膜，所述压电膜由选自V族和VI族的至少一种金属元素的原子组成百分比含有6原子％以上的钛酸铅钛酸铅（PZT）形成; 通过层压在压电膜上而提供的氧化物电极层; 含有通过层压在所述氧化物电极层上而提供的抗氧化性贵金属的第一金属电极层; 通过层叠在第一金属电极层上而形成的第二金属电极层; 以及连接到第二金属电极层的导线。