公开(公告)号：US09505165B2

公开(公告)日：2016-11-29

申请号：US14228501

申请日：2014-03-28

Applicant: FUJIFILM Corporation

Inventor： Kazuharu Nakamura ,  Satoshi Wakamatsu

IPC: B29C59/02 ,  B29C59/00 ,  B29C33/58 ,  B29C39/02 ,  B29C43/02 ,  G03F7/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/16

CPC classification number: B29C59/002 ,  B29C33/58 ,  B29C39/026 ,  B29C43/021 ,  B29C59/02 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/161

Abstract: A nanoimprinting mold includes: a mold main body having a fine pattern of protrusions and recesses on a surface thereof; and a mold release layer formed on the surface of the mold main body. The mold release layer is formed within a mold release layer forming region, which is a region of the mold main body that includes a patterned region where the fine pattern of protrusions and recesses is formed and has an outer edge positioned outside the outer edge of the patterned region. An outer peripheral mold release layer has a thickness distribution in which the thickness of the outer peripheral mold release layer is locally maximal at positions outside the outer edge of the patterned region, substantially continuously along the entire periphery. Thereby, it becomes possible to restrict the region in which resist flows during nanoimprinting, without employing a mesa type substrate.

Abstract translation: 纳米压印模具包括：模具主体，其表面上具有突出和凹陷的精细图案; 以及形成在模具主体的表面上的脱模层。 脱模层形成在脱模层形成区域内，脱模层形成区域是模具主体的区域，其包括形成有突出和凹部的精细图案的图案区域，并且具有位于外部边缘外侧的外边缘 图案区域。 外周脱模层具有厚度分布，其中外周脱模层的厚度在图案化区域的外边缘外部的位置处局部最大，沿着整个周边大致连续。 由此，可以在不使用台面型基板的情况下限制抗蚀剂在纳米压印过程中流动的区域。

公开(公告)号：US20140210140A1

公开(公告)日：2014-07-31

申请号：US14229410

申请日：2014-03-28

Applicant: FUJIFILM CORPORATION

Inventor： Tadashi OMATSU ,  Kazuharu Nakamura ,  Satoshi Wakamatsu

IPC: C09D133/22 ,  B29C59/02 ,  C09D133/08

CPC classification number: C09D133/22 ,  B29C59/026 ,  B82Y10/00 ,  B82Y40/00 ,  C08F2/48 ,  C08F220/18 ,  C08F220/30 ,  C08F222/1006 ,  C09D133/08 ,  G03F7/0002

Abstract: A nanoimprinting method employs a resist composition including polymerizable compounds and a polymerization initiating agent, each having absorption spectrum properties with absorption regions within a range from 250 nm to 500 nm. The polymerization initiating agent has an absorption region with a longer wavelength end wavelength longer than the longer wavelength end wavelength of the absorption region of the polymerizable compounds. Further, exposure of the resist composition is executed by light having spectral intensity properties that satisfy a predetermined relational formula. The present invention enables contamination of molds by adhered matter to be suppressed, and enables formation of resist patterns having sufficient etching resistance by nanoimprinting.

Abstract translation: 纳米压印方法采用包含可聚合化合物和聚合引发剂的抗蚀剂组合物，其各自具有吸收光谱性质，吸收区域在250nm至500nm的范围内。 聚合引发剂具有比聚合性化合物的吸收区域的长波长结束波长长的波长末端波长的吸收区域。 此外，抗蚀剂组合物的曝光由具有满足预定关系式的光谱强度特性的光进行。 本发明能够抑制由附着物污染模具，能够通过纳米压印形成具有足够耐蚀刻性的抗蚀剂图案。