公开(公告)号：US20180043301A1

公开(公告)日：2018-02-15

申请号：US15791427

申请日：2017-10-24

Applicant: FUJIFILM CORPORATION

Inventor： Toshihiro NAKATANI ,  Shin OZAWA ,  Ryuta TAKEGAMI ,  Takao ASAKURA

IPC: B01D53/28 ,  B01J20/26 ,  B65D81/26 ,  B01J20/04 ,  B65D65/16 ,  B32B27/30 ,  B01J20/28

Abstract: Provided are a hygroscopic material having a transparent base material, a upper layer including a vinyl acetate resin, and a hygroscopic layer which is arranged between the base material and the upper layer to be adjacent to the upper layer and includes a moisture-absorbing agent which is an inorganic salt, and a resin, a method for producing the same, and a packaging material.

公开(公告)号：US20140206128A1

公开(公告)日：2014-07-24

申请号：US14221172

申请日：2014-03-20

Applicant: FUJIFILM CORPORATION

Inventor： Toshihiro NAKATANI

IPC: H01L27/146

CPC classification number: H01L27/14687 ,  H01L27/305 ,  H01L51/001 ,  H01L51/0011

Abstract: The solid-state imaging device in which pixel electrodes, a photoelectric conversion portion having an organic film generating electric charge in response to incident light, a transparent counter electrode, and a sealing layer are formed on a substrate is produced by the method including causing a metal mask to come into close contact with a substrate surface, on which the pixel electrodes are disposed, by magnetic force; forming the organic film by vapor-depositing an organic substance to the substrate surface on which the pixel electrodes are disposed; removing the metal mask after the organic film is formed; forming the counter electrode on the organic film; and forming the sealing layer covering the counter electrode, wherein the metal mask has undergone half etching to have a half etching portion and comes into close contact with the substrate surface such that a lower surface of the half etching portion faces the pixel electrodes.

Abstract translation: 在基板上形成像素电极，具有响应于入射光产生电荷的有机膜的光电转换部，透明对电极和密封层的固态成像装置，该方法包括： 金属掩模通过磁力与设置有像素电极的基板表面紧密接触; 通过将有机物质气相沉积到其上设置有像素电极的基板表面来形成有机膜; 在形成有机膜之后去除金属掩模; 在有机膜上形成对电极; 以及形成覆盖对电极的密封层，其中金属掩模已进行半蚀刻以具有半蚀刻部分并且与基板表面紧密接触，使得半蚀刻部分的下表面面向像素电极。

公开(公告)号：US20160013247A1

公开(公告)日：2016-01-14

申请号：US14861099

申请日：2015-09-22

Applicant: FUJIFILM Corporation

Inventor： Toshihiro NAKATANI

IPC: H01L27/30 ,  H01L51/44

CPC classification number: H01L27/307 ,  H01L51/4253 ,  H01L51/4273 ,  H01L51/441

Abstract: A solid-state imaging device includes a plurality of pixel electrodes disposed two-dimensionally, an opposite electrode provided opposite to the pixel electrodes, and an organic layer formed of an organic material and provided between the pixel electrodes and the opposite electrode, in which a protrusion and recess section is formed on a surface of the organic layer on the opposite electrode side, and the protrusion and recess section includes a first protrusion and recess section formed at a position opposite to each pixel electrode and a second protrusion and recess section formed at a position opposite to the space between each pixel electrode.

Abstract translation: 固态成像装置包括：二维设置的多个像素电极，与像素电极相对设置的对置电极，以及设置在像素电极和对置电极之间的由有机材料形成的有机层，其中， 在相对电极侧的有机层的表面上形成突起和凹部，突起和凹部包括形成在与每个像素电极相对的位置处的第一突起和凹部，以及形成在第二突起和凹部 与每个像素电极之间的空间相对的位置。

公开(公告)号：US20140231782A1

公开(公告)日：2014-08-21

申请号：US14263287

申请日：2014-04-28

Applicant: FUJIFILM Corporation

Inventor： Shinji IMAI ,  Toshihiro NAKATANI

IPC: H01L27/30 ,  H01L51/44 ,  H01L51/42

CPC classification number: H01L27/307 ,  H01L51/428 ,  H01L51/448 ,  Y02E10/549 ,  Y02P70/521

Abstract: An imaging device includes a substrate, lower electrodes formed on the substrate, an organic layer formed on the lower electrodes and generating electric charges in response to irradiation with light, an upper electrode formed on the organic layer and transmitting the light, a protective film formed on the upper electrode, and a patterned organic film formed on the protective film. The protective film is composed of at least one layer and has a total thickness of 30 to 500 nm. The protective film of a single layer type has an internal stress of −50 MPa to +60 MPa in the whole of the protective film.

Abstract translation: 一种成像装置，包括基板，形成在基板上的下电极，形成在下电极上的有机层，并响应于照射而产生电荷;形成在有机层上的上电极，透过光，形成的保护膜 在上电极上形成图案化的有机膜，形成在保护膜上。 保护膜由至少一层构成，总厚度为30〜500nm。 在整个保护膜中，单层型保护膜的内应力为-50MPa〜+ 60MPa。

公开(公告)号：US20140087514A1

公开(公告)日：2014-03-27

申请号：US14073504

申请日：2013-11-06

Applicant: FUJIFILM CORPORATION

Inventor： Toshihiro NAKATANI ,  Takashi GOTO ,  Yoshiki MORITA ,  Shinji IMAI ,  Hideyuki SUZUKI ,  Daigo SAWAKI

IPC: H01L31/18

CPC classification number: H01L31/18 ,  H01L27/307 ,  H01L51/0026 ,  H01L51/4253 ,  H01L51/4273 ,  H01L51/441 ,  Y02E10/549 ,  Y02P70/521

Abstract: A photoelectric converter includes a pair of electrodes and a plurality of organic layers. The pair of electrodes is provided above a substrate. The plurality of organic layers is interposed between the pair of electrodes and includes a photoelectric conversion layer and a given organic layer being formed on one electrode of the pair of electrodes. The one electrode is one of pixel electrodes arranged two-dimensionally. The given organic layer has a concave portion that is formed in a corresponding position located above a step portion among the arranged pixel electrodes. An angle θ of the concave portion is less than 50°, where an inclination angle of a tangent plane at a given point on the concave portion to a surface plane of the substrate is defined as θ.

Abstract translation: 光电转换器包括一对电极和多个有机层。 一对电极设置在基板上。 多个有机层插入在该对电极之间，并且包括形成在该对电极的一个电极上的光电转换层和给定的有机层。 一个电极是二维布置的像素电极之一。 给定的有机层具有形成在布置的像素电极中位于台阶部分之上的对应位置的凹部。 角度和角度 的凹部的面的角度小于50°，其中凹部上的给定点上的切平面与基板的表面平面的倾斜角度定义为θ。