公开(公告)号：US20240427242A1

公开(公告)日：2024-12-26

申请号：US18813980

申请日：2024-08-23

Applicant: FUJIFILM Corporation

Inventor： Yosuke BEKKI ,  Aina SHIBUYA ,  Masafumi KOJIMA ,  Akiyoshi GOTO ,  Kazuhiro MARUMO

IPC: G03F7/039 ,  G03F7/004

Abstract: According to an actinic ray-sensitive or radiation-sensitive resin composition containing a compound (C) represented by a formula (Q1) below and an acid-decomposable resin (A), in the formula (Q1), Ar1 represents an aromatic group, W1 represents an organic group, X1 represents a linking group including at least one selected from the group consisting of —O—, —S—, —C(═O)—, —S(═O)—, and —S(═O)2—, Y1 represents an electron-withdrawing group, Z1 represents a halogen atom, M+ represents a cation, each of k1 and k2 represents an integer of 1 or more, and the group represented by —X1—W1— does not include *1—O—C(═O)—*2, *1 and *2 represent bonding sites, and *1 is a bonding site to Ar1, formation of a pattern excellent in CDU in ultrafine pattern formation even after a lapse of time from the preparation is enabled.

公开(公告)号：US20240329524A1

公开(公告)日：2024-10-03

申请号：US18737794

申请日：2024-06-07

Applicant: FUJIFILM Corporation

Inventor： Aina SHIBUYA ,  Minoru UEMURA ,  Akihiro KANEKO ,  Masafumi KOJIMA ,  Akiyoshi GOTO

IPC: G03F7/004

CPC classification number: G03F7/0045

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition including: a compound (N) having an anion and a cation represented by a formula (N1) below, and a resin (A) that is decomposed by an action of an acid to provide increased polarity,




wherein, in the formula (N1), RN1, RN2, and RN3 each independently represent a specified group, k1 to k6 each independently represents a specified integer, a plurality of RN1's may be the same or different, RN4, RN5, and RN6 each independently represent a specified substituent, and at least two among the aromatic rings in the formula (N1) may be bonded together via a single bond or a linking group.