公开(公告)号：US20240061331A1

公开(公告)日：2024-02-22

申请号：US18485674

申请日：2023-10-12

Applicant: FUJIFILM Corporation

Inventor： Yosuke BEKKI ,  Masafumi KOJIMA ,  Akiyoshi GOTO ,  Nishiki FUJIMAKI

IPC: G03F7/004 ,  C07C25/02 ,  C07C309/42 ,  C07C381/12 ,  C07D307/00 ,  C07D307/12 ,  C07D307/33 ,  C07D309/12 ,  C07D327/06 ,  C07D333/46 ,  C07D333/76 ,  C07D493/18 ,  C08F220/18 ,  C08F220/28 ,  C08F220/38 ,  G03F7/038 ,  G03F7/039

CPC classification number: G03F7/0045 ,  C07C25/02 ,  C07C309/42 ,  C07C381/12 ,  C07D307/00 ,  C07D307/12 ,  C07D307/33 ,  C07D309/12 ,  C07D327/06 ,  C07D333/46 ,  C07D333/76 ,  C07D493/18 ,  C08F220/1806 ,  C08F220/1807 ,  C08F220/1809 ,  C08F220/281 ,  C08F220/382 ,  G03F7/038 ,  G03F7/039 ,  C07C2601/14 ,  C07C2602/42 ,  C07C2603/74

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a compound represented by general formula (S1) and an acid decomposable resin. In the general formula (S1), Q1, Q2, Q3, Q4, and Q5 each independently represent a hydrogen atom or a substituent, provided that at least one of Q1, Q2, Q3, Q4, or Q5 represents a substituent including an aryloxy group represented by general formula (QR1), Lq1 represents a single bond or a divalent linking group; and M+ represents an organic cation. In the general formula (QR1), G1, G2, G3, G4, and G5 each independently represent a hydrogen atom or a substituent, provided that at least one of G1, G2, G3, G4, or G5 represents a substituent including an ester group; and * represents a bonding position.

公开(公告)号：US20240427242A1

公开(公告)日：2024-12-26

申请号：US18813980

申请日：2024-08-23

Applicant: FUJIFILM Corporation

Inventor： Yosuke BEKKI ,  Aina SHIBUYA ,  Masafumi KOJIMA ,  Akiyoshi GOTO ,  Kazuhiro MARUMO

IPC: G03F7/039 ,  G03F7/004

Abstract: According to an actinic ray-sensitive or radiation-sensitive resin composition containing a compound (C) represented by a formula (Q1) below and an acid-decomposable resin (A), in the formula (Q1), Ar1 represents an aromatic group, W1 represents an organic group, X1 represents a linking group including at least one selected from the group consisting of —O—, —S—, —C(═O)—, —S(═O)—, and —S(═O)2—, Y1 represents an electron-withdrawing group, Z1 represents a halogen atom, M+ represents a cation, each of k1 and k2 represents an integer of 1 or more, and the group represented by —X1—W1— does not include *1—O—C(═O)—*2, *1 and *2 represent bonding sites, and *1 is a bonding site to Ar1, formation of a pattern excellent in CDU in ultrafine pattern formation even after a lapse of time from the preparation is enabled.

公开(公告)号：US20240152049A1

公开(公告)日：2024-05-09

申请号：US18392802

申请日：2023-12-21

Applicant: FUJIFILM Corporation

Inventor： Masafumi KOJIMA ,  Yosuke BEKKI ,  Nobuhiro HIURA

IPC: G03F7/004 ,  G03F7/20 ,  G03F7/32

CPC classification number: G03F7/0045 ,  G03F7/2004 ,  G03F7/325

Abstract: Provided is an actinic ray-sensitive or radiation-sensitive resin composition that can provide a pattern having good cross-sectional rectangularity. The actinic ray-sensitive or radiation-sensitive resin composition includes: a resin having a group that is decomposed by the action of an acid to generate a polar group; an onium salt (I) that generates an acid represented by formula (1) upon irradiation with actinic rays or radiation; and an onium salt (II) having at least one structural moiety W that includes an anionic moiety A and a cationic moiety M and forms an acidic moiety represented by HA upon irradiation with the actinic rays or radiation. The acid dissociation constant derived from the acidic moiety represented by HA and formed by replacing the cationic moiety in the structural moiety W with H+ is larger than the acid dissociation constant of the acid represented by formula (1).

公开(公告)号：US20240004293A1

公开(公告)日：2024-01-04

申请号：US18468245

申请日：2023-09-15

Applicant: FUJIFILM Corporation

Inventor： Naoya HATAKEYAMA ,  Akiyoshi GOTO ,  Hideyuki ISHIHARA ,  Michihiro SHIRAKAWA ,  Yosuke BEKKI

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/038 ,  C08F220/18 ,  C08F220/38 ,  C08F220/28 ,  C08F220/36 ,  C08F212/14

CPC classification number: G03F7/039 ,  C08F220/282 ,  G03F7/038 ,  C08F220/1809 ,  C08F220/382 ,  C08F220/281 ,  C08F220/1808 ,  C08F220/283 ,  C08F220/365 ,  C08F220/1807 ,  C08F220/1806 ,  C08F220/1811 ,  C08F212/22 ,  C08F220/1818 ,  G03F7/0045

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin which is decomposed by action of acid to increase polarity; and (B) a compound which generates an acid by irradiation with an actinic ray or a radiation, in which the resin (A) and the acid generated from the compound (B) form a bond by the actinic ray or the radiation or by the action of acid.