公开(公告)号：US20210165323A1

公开(公告)日：2021-06-03

申请号：US17169757

申请日：2021-02-08

Applicant: FUJIFILM Corporation

Inventor： Kazunari YAGI ,  Akihiro KANEKO ,  Takashi KAWASHIMA ,  Akiyoshi GOTO

IPC: G03F7/039 ,  G03F7/038 ,  C08F220/58 ,  C08F220/18 ,  C08F212/14

Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition which is excellent in LER performance and a collapse suppressing ability. Furthermore, the present invention provides a resist film, a pattern forming method, and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a resin having a polarity that increases by the action of an acid; and a compound that generates an acid upon irradiation with actinic rays or radiation, in which the resin has a repeating unit represented by General Formula (B-1).

公开(公告)号：US20160062211A1

公开(公告)日：2016-03-03

申请号：US14934687

申请日：2015-11-06

Applicant: FUJIFILM Corporation

Inventor： Akihiro KANEKO ,  Kimiatsu NOMURA ,  Masataka SATO ,  Masaomi KIMURA

IPC: G02F1/361 ,  C07D207/44

CPC classification number: G02F1/3617 ,  C07D207/44 ,  C08K5/3415 ,  G02F1/061 ,  G02F1/3612 ,  G02F1/3615

Abstract: There is provided an organic non-linear optical material containing a compound represented by the Formula (I), and the Formula (I) is defined as herein, and a polymer binder: and an optical element comprising the organic non-linear optical material, and an optical modulator comprising the organic non-linear optical material, and a compound represented by the Formula (I) and the formula (I) is defined as herein.

Abstract translation: 提供了含有式（I）表示的化合物和式（I）如本文所定义的有机非线性光学材料和聚合物粘合剂：和包含有机非线性光学材料的光学元件， 并且包含有机非线性光学材料的光学调制剂和由式（I）和式（I）表示的化合物如本文所定义。

公开(公告)号：US20150014607A1

公开(公告)日：2015-01-15

申请号：US14497593

申请日：2014-09-26

Applicant: FUJIFILM Corporation

Inventor： Akihiro KANEKO ,  Masaaki TSUKASE ,  Masataka SATOU

IPC: G02B1/08 ,  C07D207/44 ,  C07D417/14 ,  C07D417/06 ,  C07D409/04 ,  G02B5/30 ,  C07D495/04

CPC classification number: G02B1/08 ,  C07D207/44 ,  C07D409/04 ,  C07D417/06 ,  C07D417/14 ,  C07D495/04 ,  G02B5/3025 ,  G02F1/3612 ,  G02F1/3614 ,  G02F1/3615

Abstract: There is provided an organic nonlinear optical material including a polymer binder and a compound represented by the following Formula (I): wherein, in Formula (I), R1 and R2 each independently represent a substituted or unsubstituted alkyl group or a substituted or unsubstituted aryl group; R3 represents a hydrogen atom, a substituted or unsubstituted alkyl group, or a substituted or unsubstituted aryl group; and L represents a divalent linking group connecting a nitrogen atom and an oxopyrroline ring having a dicyanomethylidene group in a π-conjugated system containing an azo group (—N═N—).

Abstract translation: 提供了包含聚合物粘合剂和由下式（I）表示的化合物的有机非线性光学材料：其中，在式（I）中，R 1和R 2各自独立地表示取代或未取代的烷基或取代或未取代的芳基 组; R3表示氢原子，取代或未取代的烷基或取代或未取代的芳基; L表示在含有偶氮基（-N = N - ）的共轭体系中连接氮原子和具有二氰基亚甲基的氧代吡咯啉环的二价连接基团。

公开(公告)号：US20230259029A1

公开(公告)日：2023-08-17

申请号：US18191597

申请日：2023-03-28

Applicant: FUJIFILM Corporation

Inventor： Yuta OKUAKI ,  Akihiro KANEKO ,  Masafumi KOJIMA ,  Akiyoshi GOTO ,  Keita KATO

IPC: G03F7/039

CPC classification number: G03F7/0397

Abstract: An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition having an excellent resolution. In addition, another object of the present invention is to provide a resist film, a pattern forming method, and a method for manufacturing an electronic device, each relating to the actinic ray-sensitive or radiation-sensitive resin composition.
The actinic ray-sensitive or radiation-sensitive resin composition of the embodiment of the present invention includes:



a resin of which polarity increases through decomposition by the action of an acid; and
a compound that generates an acid upon irradiation with actinic rays or radiation,
in which the resin includes a resin including a repeating unit X1 having two or more groups of which polarity increases through decomposition by the action of an acid and a repeating unit X2 having a phenolic hydroxyl group.

公开(公告)号：US20200050106A1

公开(公告)日：2020-02-13

申请号：US16655447

申请日：2019-10-17

Applicant: FUJIFILM Corporation

Inventor： Michihiro SHIRAKAWA ,  Hajime FURUTANI ,  Mitsuhiro FUJITA ,  Tomotaka TSUCHIMURA ,  Takashi KAWASHIMA ,  Michihiro OGAWA ,  Akihiro KANEKO ,  Hironori OKA ,  Yasuharu SHIRAISHI

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/20

Abstract: A photosensitive composition for EUV light includes a predetermined resin and a photoacid generator, or includes a predetermined resin having a repeating unit having a photoacid generating group, and satisfies Conditions 1 and 2, Condition 1: The A value determined by Formula (1) is 0.14 or more, A=([H]×0.04+[C]×1.0+[N]×2.1+[O]×3.6+[F]×5.6+[S]×1.5+[I]×39.5)/([H]×1+[C]×12+[N]×14+[O]×16+[F]×19+[S]×32+[I]×127)  Formula (1): Condition 2: The concentration of the solid content in the photosensitive composition for EUV light is 2.5% by mass or less.

公开(公告)号：US20190276575A1

公开(公告)日：2019-09-12

申请号：US16362820

申请日：2019-03-25

Applicant: FUJIFILM Corporation

Inventor： Akihiro KANEKO ,  Shuji Hirano ,  Wataru Nihashi

IPC: C08F212/14 ,  G03F7/20 ,  G03F7/039 ,  G03F7/038 ,  C08F220/16

Abstract: By a method for producing a resin, a resin containing a repeating unit represented by General Formula (1) and a repeating unit containing a group that decomposes by the action of an acid to generate a polar group is produced, and the method includes a first step of obtaining a resin precursor containing a repeating unit represented by General Formula (2) and the repeating unit containing a group that decomposes by the action of an acid to generate a polar group, and a second step of obtaining the repeating unit represented by General Formula (1) by deprotecting a group represented by —OY in the repeating unit represented by General Formula (2) in the resin precursor with an acid or a base.

公开(公告)号：US20160126460A1

公开(公告)日：2016-05-05

申请号：US14993403

申请日：2016-01-12

Applicant: FUJIFILM Corporation

Inventor： Akihiro KANEKO ,  Koji TAKAKU ,  Yasunori YONEKUTA ,  Yuki HIRAI ,  Hiroki SUGIURA ,  Masashi KOYANAGI ,  Kensuke MASUI

IPC: H01L51/00 ,  C08G61/12

CPC classification number: H01L51/0036 ,  C08G61/126 ,  C08G2261/1412 ,  C08G2261/1424 ,  C08G2261/18 ,  C08G2261/314 ,  C08G2261/3223 ,  C08G2261/3243 ,  C08G2261/344 ,  C08G2261/414 ,  C08G2261/92 ,  C08L65/00 ,  H01L51/0003 ,  H01L51/0043 ,  H01L51/0545 ,  H01L51/0558

Abstract: An organic film transistor containing a compound, which is composed of n repeating units represented by Formula (1-1), (1-2), (101-1), or (101-2), in a semiconductor active layer is an organic film transistor using a compound having high carrier mobility and high solubility in an organic solvent. (Cy represents a benzene ring, a naphthalene ring, or an anthracene ring; each of R11 to R14 and R15 to R18 independently represents a hydrogen atom or a substituent; each of Ar1 to Ar4 independently represents a heteroarylene group or an arylene group; each of V1 and V2 represents a divalent linking group; m represents an integer of 0 to 6; when m is equal to or greater than 2, two or more groups represented by V1 may be the same as or different from each other; n is equal to or greater than 2; p represents an integer of 0 to 6; and when p is equal to or greater than 2, two or more groups represented by V2 may be the same as or different from each other.)

Abstract translation: 在半导体活性层中含有由式（1-1），（1-2），（101-1）或（101-2）表示的n个重复单元构成的化合物的有机薄膜晶体管是 有机薄膜晶体管，其使用在有机溶剂中具有高载流子迁移率和高溶解度的化合物。 （Cy表示苯环，萘环或蒽环，R 11〜R 14，R 15〜R 18各自独立地表示氢原子或取代基，Ar 1〜Ar 4各自独立地表示亚亚芳基或亚芳基） 的V1和V2表示二价连接基团; m表示0〜6的整数;当m为2以上时，由V1表示的2个以上的基团可以相同或不同; n相同 2以上; p表示0〜6的整数，p为2以上时，由V2表示的2个以上的基团可以相同或不同。

公开(公告)号：US20240329524A1

公开(公告)日：2024-10-03

申请号：US18737794

申请日：2024-06-07

Applicant: FUJIFILM Corporation

Inventor： Aina SHIBUYA ,  Minoru UEMURA ,  Akihiro KANEKO ,  Masafumi KOJIMA ,  Akiyoshi GOTO

IPC: G03F7/004

CPC classification number: G03F7/0045

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition including: a compound (N) having an anion and a cation represented by a formula (N1) below, and a resin (A) that is decomposed by an action of an acid to provide increased polarity,




wherein, in the formula (N1), RN1, RN2, and RN3 each independently represent a specified group, k1 to k6 each independently represents a specified integer, a plurality of RN1's may be the same or different, RN4, RN5, and RN6 each independently represent a specified substituent, and at least two among the aromatic rings in the formula (N1) may be bonded together via a single bond or a linking group.

公开(公告)号：US20190219922A1

公开(公告)日：2019-07-18

申请号：US16363238

申请日：2019-03-25

Applicant: FujiFilm Corporation

Inventor： Akihiro KANEKO ,  Shuji Hirano ,  Takashi Kawashima ,  Michihiro Ogawa ,  Hajime Furutani ,  Wataru Nihashi ,  Hideaki Tsubaki ,  Kyohei Sakita

IPC: G03F7/038 ,  G03F7/004 ,  G03F7/20

CPC classification number: G03F7/0382 ,  C08F12/14 ,  G03F7/0045 ,  G03F7/038 ,  G03F7/0381 ,  G03F7/039 ,  G03F7/20 ,  G03F7/2053 ,  G03F7/325

Abstract: There is provided a resist composition containing a resin. The resin includes a repeating unit (a) having one or more *—OY0 groups substituted for an aromatic ring; and a phenolic hydroxyl group (b) or a partial structure (c) represented by Formula (X). Here, the *—OY0 group is a group that is decomposed due to an action of an acid to generate a phenolic hydroxyl group, and Y0 is a specific protective group. In a case where the repeating unit (a) includes none of the phenolic hydroxyl group (b) and the partial structure (c), the repeating unit (a) is a repeating unit in which the *—OY0 group is decomposed due to an action of an acid to generate two or more phenolic hydroxyl groups.

公开(公告)号：US20160322576A1

公开(公告)日：2016-11-03

申请号：US15207574

申请日：2016-07-12

Applicant: FUJIFILM Corporation

Inventor： Takafumi NAKAYAMA ,  Akihiro KANEKO ,  Kensuke MASUI

IPC: H01L51/00 ,  C09D165/00 ,  C09D5/24 ,  C08G61/12

CPC classification number: H01L51/0036 ,  C08G61/124 ,  C08G61/126 ,  C08G2261/124 ,  C08G2261/1424 ,  C08G2261/3223 ,  C08G2261/3241 ,  C08G2261/3328 ,  C08G2261/344 ,  C08G2261/364 ,  C08G2261/414 ,  C08G2261/51 ,  C08G2261/512 ,  C08G2261/92 ,  C09D5/24 ,  C09D165/00 ,  H01L51/0003 ,  H01L51/0035 ,  H01L51/0043 ,  H01L51/0541 ,  H01L51/0545 ,  H01L51/0558

Abstract: Provided are an organic transistor which contains a compound having a repeating unit represented by any of the following formulae in a semiconductor active layer and has high carrier mobility; a compound; an organic semiconductor material for a non-light-emitting organic semiconductor device; an organic semiconductor material; a coating solution for a non-light-emitting organic semiconductor device; and an organic semiconductor film for a non-light-emitting organic semiconductor device (W represents an oxygen atom, a sulfur atom, NR1, or C(R2)2; R1 represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, or a heteroaryl group; R2 represents a cyano group, an acyl group, a (per)fluoroalkyl group, or a (per)fluoroaryl group; cy represents an aromatic ring or a heterocyclic aromatic ring that may have a substituent; and each of R3 and R4 represents a hydrogen atom or a monovalent substituent).