公开(公告)号：US09868846B2

公开(公告)日：2018-01-16

申请号：US14151367

申请日：2014-01-09

Applicant: FUJIFILM Corporation

Inventor： Kunihiko Kodama ,  Yuichiro Enomoto ,  Kazuyuki Usuki ,  Tadashi Omatsu ,  Hirotaka Kitagawa

IPC: C08K5/053 ,  C08F220/22 ,  C08F222/10 ,  G11B5/855 ,  B29C59/00 ,  C08F2/48 ,  C08F220/10 ,  C09D4/06 ,  C08F2/46 ,  C08F220/18 ,  C08F230/08 ,  C08F220/38

CPC classification number: C08K5/053 ,  B29C59/005 ,  C08F2/46 ,  C08F2/48 ,  C08F220/10 ,  C08F220/22 ,  C08F222/1006 ,  C08F230/08 ,  C08F2220/1833 ,  C08F2220/185 ,  C08F2220/1875 ,  C08F2220/1891 ,  C08F2220/382 ,  C08F2222/1013 ,  C08F2222/102 ,  C09D4/06 ,  G11B5/855 ,  Y10T428/24479 ,  C09D133/04 ,  C08L71/02

Abstract: Disclosed is a to provide a curable composition for imprints capable of keeping a good patternability and of producing less defects even after repetitive pattern transfer. The curable composition for imprints comprising: a polymerizable compound (A); a photo-polymerization initiator (B); and a non-polymerizable compound (C) having a polyalkylene glycol structure having at least one terminal hydroxy group, or at least one etherified terminal hydroxy group, and containing substantially no fluorine atom and no silicon atom.