公开(公告)号：US11567405B2

公开(公告)日：2023-01-31

申请号：US16689389

申请日：2019-11-20

Applicant: FUJIFILM Corporation

Inventor： Takeshi Kawabata ,  Kenta Yoshida ,  Yu Iwai ,  Akinori Shibuya

IPC: G03F7/037 ,  G03F7/004 ,  C08G73/10 ,  C08G73/22 ,  H01L23/29 ,  H01L21/56 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  G03F7/38

Abstract: A photosensitive resin composition is also provided that includes a polymer precursor selected from a polyimide precursor and a polybenzoxazole precursor; a photo-radical polymerization initiator; and a solvent, in which an acid value of an acid group contained in the polymer precursor and having a neutralization point in a pH range of 7.0 to 12.0 is in a range of 2.5 to 34.0 mgKOH/g, and either the polymer precursor contains a radically polymerizable group or the photosensitive resin composition includes a radically polymerizable compound other than the polymer precursor.

公开(公告)号：US10254645B2

公开(公告)日：2019-04-09

申请号：US15442935

申请日：2017-02-27

Applicant: FUJIFILM Corporation

Inventor： Kenta Yoshida ,  Takuma Amemiya ,  Satoru Yamada ,  Mikio Nakagawa

IPC: G03F7/023 ,  G03F7/40 ,  C08G73/22 ,  G03F7/039 ,  G06F3/041 ,  H05B33/10 ,  H05B33/12 ,  H05B33/22 ,  G03F7/038 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  G03F7/38 ,  G06F3/044 ,  G02F1/1333 ,  H01L27/32 ,  H01L51/56

Abstract: There are provided a photosensitive resin composition having excellent chemical resistance, light resistance, and solubility in a solvent, a method for producing a cured film, a cured film, a liquid crystal display device, an organic electroluminescent display device, and a touch panel. The photosensitive resin composition contains a polybenzoxazole precursor, a photoacid generator which generates an acid having a pKa of 3 or less or a quinone diazide compound, and a solvent, in which the polybenzoxazole precursor contains a total of 70 mol % or more of a repeating unit represented by the following Formula (1) and a repeating unit represented by the following Formula (2) with respect to the total repeating units, and a ratio between the repeating unit represented by Formula (1) and the repeating unit represented by Formula (2) is 9:1 to 3:7 in a molar ratio. Y1 represents a cyclic aliphatic group having 3 to 15 carbon atoms, and Y2 represents a linear or branched aliphatic group having 4 to 20 carbon atoms.

公开(公告)号：US11487202B2

公开(公告)日：2022-11-01

申请号：US16689389

申请日：2019-11-20

Applicant: FUJIFILM Corporation

Inventor： Takeshi Kawabata ,  Kenta Yoshida ,  Yu Iwai ,  Akinori Shibuya

IPC: G03F7/037 ,  G03F7/004 ,  C08G73/10 ,  C08G73/22 ,  H01L23/29 ,  H01L21/56 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  G03F7/38

Abstract: A photosensitive resin composition is also provided that includes a polymer precursor selected from a polyimide precursor and a polybenzoxazole precursor; a photo-radical polymerization initiator; and a solvent, in which an acid value of an acid group contained in the polymer precursor and having a neutralization point in a pH range of 7.0 to 12.0 is in a range of 2.5 to 34.0 mgKOH/g, and either the polymer precursor contains a radically polymerizable group or the photosensitive resin composition includes a radically polymerizable compound other than the polymer precursor.