公开(公告)号：US09971433B2

公开(公告)日：2018-05-15

申请号：US15015107

申请日：2016-02-03

Applicant: FUJIFILM Corporation

Inventor： Takeshi Ando ,  Hideyuki Nakamura ,  Shigekazu Suzuki ,  Satoru Yamada ,  Kentarou Toyooka

IPC: G06F3/041 ,  G02B1/115 ,  G06F3/044 ,  G02B1/14 ,  B32B7/02 ,  B32B7/12 ,  B32B9/04 ,  B32B27/36 ,  B32B3/08

CPC classification number: G06F3/041 ,  B32B3/08 ,  B32B7/02 ,  B32B7/12 ,  B32B9/045 ,  B32B27/08 ,  B32B27/36 ,  B32B2255/10 ,  B32B2255/20 ,  B32B2255/205 ,  B32B2255/26 ,  B32B2264/102 ,  B32B2307/412 ,  B32B2307/418 ,  B32B2457/208 ,  G02B1/115 ,  G02B1/14 ,  G06F3/044 ,  G06F2203/04103

Abstract: The object of the present invention is to provide a touch panel member that is excellent in terms of suppression of visibility of a transparent electrode and has low total reflection for visible light, and a touch panel and a touch panel display device having the touch panel member.The touch panel member of the present invention comprises, in order, at least a transparent substrate, a transparent electrode, and a protective layer provided so as to cover the transparent electrode, the protective layer comprising three or more layers having different refractive indices, all of the different refractive index layers of the protective layer satisfying a specific expression, and the protective layer satisfying another specific expression.

公开(公告)号：US09905768B2

公开(公告)日：2018-02-27

申请号：US15340831

申请日：2016-11-01

Applicant: FUJIFILM Corporation

Inventor： Yuzo Nagata ,  Hiroo Takizawa ,  Satoru Yamada

IPC: H01L51/00 ,  H01L51/05 ,  C08F220/06 ,  C08F220/18 ,  C08F220/28 ,  C08F220/32

CPC classification number: H01L51/004 ,  C08F220/06 ,  C08F220/18 ,  C08F220/28 ,  C08F220/32 ,  C08F2220/285 ,  H01L51/0043 ,  H01L51/052 ,  H01L51/0545

Abstract: Provided is a semiconductor device which includes a semiconductor layer and an insulating layer adjacent to the semiconductor layer, in which the insulating layer is formed of a crosslinked product of a polymer compound that has a repeating unit (IA) represented by the following Formula (IA) and a repeating unit (IB) represented by the following Formula (IB); and an insulating layer-forming composition which is used for forming an insulating layer of a semiconductor device and contains a polymer compound that has the following repeating units (IA) and (IB). In Formulae, R1a and R1b each independently represent a hydrogen atom, a halogen atom, or an alkyl group. L1a, L2a, and L1b each independently represent a single bond or a linking group. X represents a crosslinkable group and YB represents a decomposable group or a hydrogen atom. m1a and m2a each independently represent an integer of 1 to 5. The symbol “*” represents a bonding position of the repeating units.

公开(公告)号：US11604413B2

公开(公告)日：2023-03-14

申请号：US16238673

申请日：2019-01-03

Applicant: FUJIFILM Corporation

Inventor： Takashi Aridomi ,  Shinichi Kanna ,  Satoru Yamada

IPC: G03F7/038 ,  G03F7/16 ,  G06F3/041 ,  C08F290/12 ,  G03F7/027 ,  H05K3/28 ,  G03F7/20 ,  G03F7/32 ,  G03F7/38

Abstract: Provided is a photosensitive composition including: a polymer (P) which includes a structural unit derived from a vinylbenzene derivative, a structural unit including a radical polymerizable group, and a structural unit including at least one kind of functional group selected from the group consisting of a primary hydroxyl group and an amino group, and in which the content of the structural unit derived from the vinylbenzene derivative is equal to or greater than 30% by mol; and a radical polymerization initiator.

公开(公告)号：US10452209B2

公开(公告)日：2019-10-22

申请号：US15046453

申请日：2016-02-18

Applicant: FUJIFILM Corporation

Inventor： Takeshi Ando ,  Hideyuki Nakamura ,  Shigekazu Suzuki ,  Satoru Yamada

IPC: G06F3/041 ,  G06F3/044 ,  G02F1/1335 ,  G02B1/115 ,  G02F1/133 ,  G02B1/113 ,  G02B1/111 ,  G02B1/14 ,  G02F1/1333 ,  H01L51/52

Abstract: The object of the present invention is to provide a touch panel member that is excellent in terms of suppression of visibility of a transparent electrode and has low total reflection for visible light, and a touch panel and a touch panel display device having the touch panel member.The touch panel member of the present invention comprises, in order, at least a transparent substrate, a transparent electrode, and a protective layer provided so as to cover the transparent electrode and having a thickness of 0.04 to 10 μm, at least part of the protective layer having a refractive index that decreases continuously from the transparent substrate side toward the side opposite to the transparent substrate, and the protective layer satisfying specific expressions.

公开(公告)号：US20190137874A1

公开(公告)日：2019-05-09

申请号：US16238673

申请日：2019-01-03

Applicant: FUJIFILM Corporation

Inventor： Takashi ARIDOMI ,  Shinichi Kanna ,  Satoru Yamada

IPC: G03F7/038 ,  G03F7/16 ,  G03F7/20 ,  G03F7/38 ,  G03F7/32

Abstract: Provided is a photosensitive composition including: a polymer (P) which includes a structural unit derived from a vinylbenzene derivative, a structural unit including a radical polymerizable group, and a structural unit including at least one kind of functional group selected from the group consisting of a primary hydroxyl group and an amino group, and in which the content of the structural unit derived from the vinylbenzene derivative is equal to or greater than 30% by mol; and a radical polymerization initiator.

公开(公告)号：US10254645B2

公开(公告)日：2019-04-09

申请号：US15442935

申请日：2017-02-27

Applicant: FUJIFILM Corporation

Inventor： Kenta Yoshida ,  Takuma Amemiya ,  Satoru Yamada ,  Mikio Nakagawa

IPC: G03F7/023 ,  G03F7/40 ,  C08G73/22 ,  G03F7/039 ,  G06F3/041 ,  H05B33/10 ,  H05B33/12 ,  H05B33/22 ,  G03F7/038 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  G03F7/38 ,  G06F3/044 ,  G02F1/1333 ,  H01L27/32 ,  H01L51/56

Abstract: There are provided a photosensitive resin composition having excellent chemical resistance, light resistance, and solubility in a solvent, a method for producing a cured film, a cured film, a liquid crystal display device, an organic electroluminescent display device, and a touch panel. The photosensitive resin composition contains a polybenzoxazole precursor, a photoacid generator which generates an acid having a pKa of 3 or less or a quinone diazide compound, and a solvent, in which the polybenzoxazole precursor contains a total of 70 mol % or more of a repeating unit represented by the following Formula (1) and a repeating unit represented by the following Formula (2) with respect to the total repeating units, and a ratio between the repeating unit represented by Formula (1) and the repeating unit represented by Formula (2) is 9:1 to 3:7 in a molar ratio. Y1 represents a cyclic aliphatic group having 3 to 15 carbon atoms, and Y2 represents a linear or branched aliphatic group having 4 to 20 carbon atoms.

公开(公告)号：US10133175B2

公开(公告)日：2018-11-20

申请号：US15209870

申请日：2016-07-14

Applicant: FUJIFILM Corporation

Inventor： Daisuke Kashiwagi ,  Takeshi Andou ,  Satoru Yamada ,  Yasumasa Kawabe ,  Hisamitsu Tomeba

IPC: G03F7/004 ,  G03F7/038 ,  C08F220/18 ,  G02F1/1335 ,  G02B5/20 ,  G03F7/00 ,  G03F7/039 ,  G03F7/32 ,  G03F7/40 ,  H01L51/52 ,  H01L27/32 ,  C08F212/14 ,  C08F220/16 ,  C08F220/28 ,  C08F220/36 ,  G02B1/04 ,  G02B5/22 ,  G03F7/16 ,  G03F7/20 ,  H01L27/146 ,  H01L51/00 ,  H01L51/56

Abstract: Provided are a photosensitive resin composition from which a cured product having a thin film thickness, excellent light-shielding properties, and a high surface hardness is obtained; as well as a cured product obtained by curing the photosensitive resin composition, a cured film and a method for producing the same, a method for producing a resin pattern, and a liquid crystal display device, an organic EL display device, an infrared cut filter, or a solid-state imaging device, each having the cured film. The photosensitive resin composition of the present invention includes (Component A) a polymer having a constitutional unit containing a group in which an acid group is protected by an acid-decomposable group; (Component B) a photoacid generator; (Component C) a solvent; (Component D) a compound having a crosslinkable group and a molecular weight in the range of 100 to 2,000; and (Component S) titanium black.

公开(公告)号：US09599901B2

公开(公告)日：2017-03-21

申请号：US15212936

申请日：2016-07-18

Applicant: FUJIFILM Corporation

Inventor： Daisuke Kashiwagi ,  Takeshi Andou ,  Satoru Yamada ,  Yasumasa Kawabe ,  Hisamitsu Tomeba

IPC: G03F7/039 ,  C08F212/14 ,  C08F220/10 ,  G02B5/20 ,  G03F7/40 ,  G03F7/00 ,  G03F7/004 ,  G03F7/038 ,  H01L51/52 ,  H01L27/32 ,  G02B5/22 ,  G02F1/1335 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  H01L27/146

CPC classification number: G03F7/0397 ,  C08F212/14 ,  C08F220/10 ,  C09B55/002 ,  G02B5/20 ,  G02B5/206 ,  G02B5/208 ,  G02B5/223 ,  G02F1/133516 ,  G03F7/0007 ,  G03F7/0045 ,  G03F7/038 ,  G03F7/0388 ,  G03F7/0392 ,  G03F7/168 ,  G03F7/20 ,  G03F7/32 ,  G03F7/40 ,  H01L27/14621 ,  H01L27/14623 ,  H01L27/322 ,  H01L51/5253 ,  H01L51/5284

Abstract: Provided is a photosensitive resin composition from which a cured product having thin film thickness, excellent light-shielding properties, and high surface hardness is obtained. A a cured film and a method for producing the same, a method for producing a resin pattern, and an LCD device, an organic EL display device, an infrared cut filter, or a solid-state imaging device are also provided. The photosensitive resin composition includes a polymer component including at least one of categories (1) or (2), a photoacid generator, a solvent, and titanium black, wherein (1) includes (a1) a constitutional unit containing a group in which an acid group is protected by an acid-decomposable group, and (a2) a constitutional unit containing a crosslinkable group, and (2) includes (a1) a constitutional unit containing a group in which an acid group is protected by an acid-decomposable group, and (a2) a constitutional unit containing a crosslinkable group.