公开(公告)号：US20150219993A1

公开(公告)日：2015-08-06

申请号：US14687491

申请日：2015-04-15

Applicant: FUJIFILM Corporation

Inventor： Hideaki ITO ,  Shinji FUJIMOTO ,  Yasumasa KAWABE

IPC: G03F7/039 ,  G03F7/40 ,  G03F7/30

CPC classification number: G03F7/094 ,  C08F12/22 ,  C08F12/24 ,  C08F212/14 ,  C08F220/28 ,  C08F2220/281 ,  G03F7/0045 ,  G03F7/033 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/161 ,  G03F7/20 ,  G03F7/26 ,  G03F7/30 ,  G03F7/40 ,  H03K17/962 ,  Y02P20/582 ,  C08F212/32

Abstract: A photosensitive transfer material including a support, a thermoplastic resin layer, and a photosensitive resin composition layer in this order, in which the photosensitive resin composition layer includes a polymer component (A) including a polymer having a constituent unit (a1) that includes a group in which an acid group is protected by an acid-decomposable group and a photoacid generator (B).

Abstract translation: 感光性树脂组合物层包括具有包含具有构成单元（a1）的聚合物的聚合物成分（A）的感光性转印材料，其包含支撑体，热塑性树脂层和感光性树脂组合物层， 酸基被酸可分解基团和光酸产生剂（B）保护的基团。

公开(公告)号：US20170199458A1

公开(公告)日：2017-07-13

申请号：US15470110

申请日：2017-03-27

Applicant: FUJIFILM Corporation

Inventor： Hideaki ITO ,  Shinji FUJIMOTO ,  Yasumasa KAWABE

IPC: G03F7/09 ,  G03F7/004 ,  G03F7/11 ,  C08F212/14 ,  H03K17/96 ,  G03F7/16 ,  G03F7/20 ,  G03F7/26 ,  G03F7/033 ,  G03F7/039 ,  G03F7/40 ,  C08F220/28

CPC classification number: G03F7/094 ,  C08F12/22 ,  C08F12/24 ,  C08F212/14 ,  C08F220/28 ,  C08F2220/281 ,  G03F7/0045 ,  G03F7/033 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/161 ,  G03F7/20 ,  G03F7/26 ,  G03F7/30 ,  G03F7/40 ,  H03K17/962 ,  Y02P20/582 ,  C08F212/32

Abstract: A pattern forming method includes forming a photosensitive resin composition layer on at least one surface of a substrate using a photosensitive transfer material, exposing the photosensitive resin composition layer; and developing the exposed photosensitive resin composition layer, in which the photosensitive transfer material includes a support, a thermoplastic resin layer, and a photosensitive resin composition layer in this order, and the photosensitive resin composition layer includes a polymer component (A) including a polymer having a constituent unit (a1) that includes a group in which an acid group is protected by an acid-decomposable group and a photoacid generator (B).

公开(公告)号：US20150148546A1

公开(公告)日：2015-05-28

申请号：US14607644

申请日：2015-01-28

Applicant: FUJIFILM Corporation

Inventor： Kyouhei SAKITA ,  Shinji FUJIMOTO ,  Mikio NAKAGAWA ,  Kenta YAMAZAKI

IPC: G03F7/027 ,  C07D277/84 ,  C07D263/60 ,  C07D277/64 ,  C07D263/56

CPC classification number: G03F7/027 ,  C07D263/56 ,  C07D263/60 ,  C07D277/64 ,  C07D277/84 ,  C07D417/12 ,  C08F12/22 ,  C08F20/26 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/40 ,  H01L27/3258 ,  H05B33/22

Abstract: Provided is a photosensitive resin composition having high sensitivity and storage stability. The photosensitive resin composition comprises (A) a polymer component including a polymer satisfying at least one of (1) and (2) below:(1) a polymer comprising (a1) a structural unit containing a group in which an acid group is protected by an acid-dissociable group, and (a2) a structural unit containing a crosslinkable group, and (2) a polymer comprising (a1) a structural unit containing a group in which an acid group is protected by an acid-dissociable group, and a polymer comprising (a2) a structural unit containing a crosslinkable group; (B) a compound represented by formula (I) below; and (C) a solvent;

Abstract translation: 提供具有高灵敏度和储存稳定性的感光性树脂组合物。 感光性树脂组合物包含（A）包含满足下述（1）和（2）中至少一项的聚合物的聚合物组分：（1）包含（a1）含有酸基被保护基团的结构单元的聚合物 通过酸解离基团，和（a2）含有可交联基团的结构单元，和（2）包含（a1）含有酸基被酸解离基团保护的基团的结构单元的聚合物，以及 包含（a2）包含可交联基团的结构单元的聚合物; （B）由下式（I）表示的化合物; 和（C）溶剂;