公开(公告)号：US09958775B2

公开(公告)日：2018-05-01

申请号：US14560650

申请日：2014-12-04

Applicant: FUJIFILM Corporation

Inventor： Takuya Tsuruta ,  Tomotaka Tsuchimura ,  Tadeteru Yatsuo

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/038 ,  G03F7/20 ,  G03F7/32 ,  C07D333/46 ,  C07D327/08 ,  C07C309/65 ,  C07C381/12

CPC classification number: G03F7/0045 ,  C07C309/65 ,  C07C381/12 ,  C07C2601/14 ,  C07D327/08 ,  C07D333/46 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/0397 ,  G03F7/2037 ,  G03F7/325

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes; a compound (A) which generates an acid by irradiation with actinic rays or radiation, wherein the acid is linked with a group represented by the following general formula (M) through covalent bonding. In the formula, Y1 and Y2 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, or an acyl group. Z represents a hydrogen atom or a substituent. * represents a linking site with a residue of the compound (A)