公开(公告)号：US20240018376A1

公开(公告)日：2024-01-18

申请号：US18474241

申请日：2023-09-26

Applicant: FUJIFILM Corporation

Inventor： Keiichi TATEISHI ,  Yuta OKUAKI ,  Yuta TAKASAKI

IPC: C09D11/38 ,  C09D11/328

CPC classification number: C09D11/38 ,  C09D11/328

Abstract: An aqueous additive solution for an ink composition, containing a compound represented by general formula (A) as defined herein; a compound represented by general formula (II) as defined herein; and water, an aqueous colorant solution for an ink composition, containing a compound represented by general formula (A) as defined herein; a compound represented by general formula (II) as defined herein; water; and a colorant, and an ink composition containing a compound represented by general formula (A) as defined herein; a compound represented by general formula (II) as defined herein.

公开(公告)号：US20230259029A1

公开(公告)日：2023-08-17

申请号：US18191597

申请日：2023-03-28

Applicant: FUJIFILM Corporation

Inventor： Yuta OKUAKI ,  Akihiro KANEKO ,  Masafumi KOJIMA ,  Akiyoshi GOTO ,  Keita KATO

IPC: G03F7/039

CPC classification number: G03F7/0397

Abstract: An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition having an excellent resolution. In addition, another object of the present invention is to provide a resist film, a pattern forming method, and a method for manufacturing an electronic device, each relating to the actinic ray-sensitive or radiation-sensitive resin composition.
The actinic ray-sensitive or radiation-sensitive resin composition of the embodiment of the present invention includes:



a resin of which polarity increases through decomposition by the action of an acid; and
a compound that generates an acid upon irradiation with actinic rays or radiation,
in which the resin includes a resin including a repeating unit X1 having two or more groups of which polarity increases through decomposition by the action of an acid and a repeating unit X2 having a phenolic hydroxyl group.