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公开(公告)号：US20220372330A1
公开(公告)日：2022-11-24
申请号：US17729672
申请日：2022-04-26
Applicant: FUJIMI INCORPORATED
Inventor： Masashi Abe , Toshio Shinoda , Satoshi Ishiguro , Satoru Yarita
IPC: C09G1/02 , C01B33/141
Abstract: The method for producing a polishing composition according to the present invention includes mixing a dispersion containing silica and a solution containing a silane coupling agent having a cationic group at a concentration of 0.03% by mass or more and less than 1% by mass to obtain a dispersion containing cationically modified silica.
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