System and method for the inspection of micro and nanomechanical structures
    1.
    发明授权
    System and method for the inspection of micro and nanomechanical structures 有权
    微纳米机械结构检测系统及方法

    公开(公告)号:US07978344B2

    公开(公告)日:2011-07-12

    申请号:US11988737

    申请日:2006-07-13

    IPC分类号: G01B11/14

    CPC分类号: G01Q10/06 G01Q20/02 G01Q70/06

    摘要: The system for surface inspection is arranged to detect relative displacement and/or vibration features of a plurality of points of a plurality of elements (51) forming part of a mechanical structure (5), such as a micro- or nanomechanical structure. A light beam is displaced along the mechanical structure along a first trajectory (A), so as to detect a plurality of subsequent reference positions (C) along said first trajectory (A), and the light beam is further displaced along the mechanical structure along a plurality of second trajectories (B), each of said second trajectories (B) being associated with one of said reference positions (C).The invention further relates to a corresponding method and to a program for carrying out the method.

    摘要翻译: 用于表面检查的系统被布置成检测形成机械结构(5)的一部分的多个元件(51)的多个点的相对位移和/或振动特征,诸如微机械结构或纳米机械结构。 沿着机械结构沿着第一轨迹(A)移动光束,以沿着所述第一轨迹(A)检测多个随后的参考位置(C),并且光束沿机械结构进一步移位 多个第二轨迹(B),每个所述第二轨迹(B)与所述参考位置(C)中的一个相关联。 本发明还涉及相应的方法和用于执行该方法的程序。

    System and Method for Surface Inspection of Micro- and Nanomechanical Structures
    3.
    发明申请
    System and Method for Surface Inspection of Micro- and Nanomechanical Structures 有权
    微机械结构和纳米机械结构表面检测系统与方法

    公开(公告)号:US20090207404A1

    公开(公告)日:2009-08-20

    申请号:US11988737

    申请日:2006-07-13

    IPC分类号: G01C3/00

    CPC分类号: G01Q10/06 G01Q20/02 G01Q70/06

    摘要: The system for surface inspection is arranged to detect relative displacement and/or vibration features of a plurality of points of a plurality of elements (51) forming part of a mechanical structure (5), such as a micro- or nanomechanical structure. A light beam is displaced along the mechanical structure along a first trajectory (A), so as to detect a plurality of subsequent reference positions (C) along said first trajectory (A), and the light beam is further displaced along the mechanical structure along a plurality of second trajectories (B), each of said second trajectories (B) being associated with one of said reference positions (C).The invention further relates to a corresponding method and to a program for carrying out the method.

    摘要翻译: 用于表面检查的系统被布置成检测形成机械结构(5)的一部分的多个元件(51)的多个点的相对位移和/或振动特征,诸如微机械结构或纳米机械结构。 沿着机械结构沿着第一轨迹(A)移动光束,以沿着所述第一轨迹(A)检测多个随后的参考位置(C),并且光束沿机械结构进一步移位 多个第二轨迹(B),每个所述第二轨迹(B)与所述参考位置(C)中的一个相关联。 本发明还涉及相应的方法和用于执行该方法的程序。

    SYSTEM AND METHOD FOR DETECTING THE DISPLACEMENT OF A PLURALITY OF MICRO- AND NANOMECHANICAL ELEMENTS, SUCH AS MICRO-CANTILEVERS
    5.
    发明申请
    SYSTEM AND METHOD FOR DETECTING THE DISPLACEMENT OF A PLURALITY OF MICRO- AND NANOMECHANICAL ELEMENTS, SUCH AS MICRO-CANTILEVERS 有权
    用于检测微量元素和微量元素等微量元素和微量元素的多样性的系统和方法

    公开(公告)号:US20080259356A1

    公开(公告)日:2008-10-23

    申请号:US11962027

    申请日:2007-12-20

    IPC分类号: G01B11/14

    CPC分类号: G01Q70/06 G01Q20/02 G01Q30/04

    摘要: The invention relates to a system and method for detecting the displacement, such as the deflection, of a plurality of elements (1), such as microcantilevers, forming part of an array (2), by emitting a light beam (4) towards the array (2) and by receiving a reflected light beam on an optical position detector, whereby the position of incidence of the light beam is determined by the displacement of the corresponding element. The system further comprises: scanning means (7) for the displacing the light beam (4) along the array (2) so that the light beam is sequentially reflected, by the individual elements (1) along said array (2); and reflection detecting means (11) for detecting when the light beam is reflected by an element. The system is arranged so that when the reflection detecting means (11) detect that the light beam is reflected by an element, the corresponding position of incidence of the light on the detector is taken as an indication of the displacement of the element.

    摘要翻译: 本发明涉及一种系统和方法,用于通过将光束(4)朝向所述阵列(2)发射来检测多个元件(1)的位移,例如偏转,形成阵列(2)的一部分的诸如微悬臂梁的元件 阵列(2)并且通过在光学位置检测器上接收反射光束,由此光束的入射位置由相应元件的位移确定。 该系统还包括:用于沿着阵列(2)移位光束(4)的扫描装置(7),使得光束被沿着所述阵列(2)的各个元件(1)顺序反射; 以及用于检测光束何时被元件反射的反射检测装置(11)。 该系统被布置成使得当反射检测装置(11)检测到光束被元件反射时,将检测器上的光的入射的相应位置作为元件的位移的指示。