公开(公告)号：US08908152B2

公开(公告)日：2014-12-09

申请号：US12621143

申请日：2009-11-18

申请人： Franciscus Godefridus Casper Bijnen ,  Jozef Cornelis Antonius Roijers ,  Patrick Warnaar ,  Marc Van Kemenade ,  Hoite Pieter Theodoor Tolsma

发明人： Franciscus Godefridus Casper Bijnen ,  Jozef Cornelis Antonius Roijers ,  Patrick Warnaar ,  Marc Van Kemenade ,  Hoite Pieter Theodoor Tolsma

IPC分类号： G03B27/32 ,  G03F9/00

CPC分类号： G03F9/7049 ,  G03F9/7003 ,  G03F9/7076 ,  G03F9/7084

摘要： A method for manufacturing a device includes providing a substrate, the substrate including a plurality of exposure fields, each exposure field including one or more target portions and at least one mark structure, the mark structure being arranged as positional mark for the exposure field; scanning and measuring the mark of each exposure field to obtain alignment information for the respective exposure field; determining an absolute position of each exposure field from the alignment information for the respective exposure field; determining a relative position of each exposure field with respect to at least one other exposure field by use of additional information on the relative parameters of the exposure field and the at least one other exposure field relative to each other; and combining the absolute positions and the determined relative positions into improved absolute positions for each of the plurality of exposure fields.

摘要翻译： 一种制造器件的方法包括：提供衬底，所述衬底包括多个曝光场，每个曝光场包括一个或多个目标部分和至少一个标记结构，所述标记结构被布置为所述曝光场的位置标记; 扫描和测量每个曝光场的标记以获得相应曝光场的对准信息; 根据相应曝光场的对准信息确定每个曝光场的绝对位置; 通过使用关于相对于彼此的曝光场和至少一个其他曝光场的相对参数的附加信息来确定每个曝光场相对于至少一个其它曝光场的相对位置; 以及将所述绝对位置和所确定的相对位置组合为所述多个曝光场中的每一个的改进的绝对位置。

公开(公告)号：US20100123886A1

公开(公告)日：2010-05-20

申请号：US12621143

申请日：2009-11-18

申请人： Franciscus Godefridus Casper BIJNEN ,  Jozef Cornelis Antonius Roijers ,  Patrick Warnaar ,  Marc Van Kemenade ,  Hoite Pieter Theodoor Tolsma

发明人： Franciscus Godefridus Casper BIJNEN ,  Jozef Cornelis Antonius Roijers ,  Patrick Warnaar ,  Marc Van Kemenade ,  Hoite Pieter Theodoor Tolsma

IPC分类号： G03B27/42 ,  G03B27/32

CPC分类号： G03F9/7049 ,  G03F9/7003 ,  G03F9/7076 ,  G03F9/7084

摘要： A method for manufacturing a device includes providing a substrate, the substrate including a plurality of exposure fields, each exposure field including one or more target portions and at least one mark structure, the mark structure being arranged as positional mark for the exposure field; scanning and measuring the mark of each exposure field to obtain alignment information for the respective exposure field; determining an absolute position of each exposure field from the alignment information for the respective exposure field; determining a relative position of each exposure field with respect to at least one other exposure field by use of additional information on the relative parameters of the exposure field and the at least one other exposure field relative to each other; and combining the absolute positions and the determined relative positions into improved absolute positions for each of the plurality of exposure fields.

摘要翻译： 一种制造器件的方法包括：提供衬底，所述衬底包括多个曝光场，每个曝光场包括一个或多个目标部分和至少一个标记结构，所述标记结构被布置为所述曝光场的位置标记; 扫描和测量每个曝光场的标记以获得相应曝光场的对准信息; 根据相应曝光场的对准信息确定每个曝光场的绝对位置; 通过使用关于相对于彼此的曝光场和至少一个其他曝光场的相对参数的附加信息来确定每个曝光场相对于至少一个其它曝光场的相对位置; 以及将所述绝对位置和所确定的相对位置组合为所述多个曝光场中的每一个的改进的绝对位置。