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1.发明授权Lithographic apparatus and device manufacturing method to determine improved absolute position of exposure fields using mark structures 有权使用标记结构确定改善的曝光场绝对位置的光刻设备和器件制造方法公开(公告)号：US08908152B2
公开(公告)日：2014-12-09
申请号：US12621143
申请日：2009-11-18
申请人： Franciscus Godefridus Casper Bijnen , Jozef Cornelis Antonius Roijers , Patrick Warnaar , Marc Van Kemenade , Hoite Pieter Theodoor Tolsma
发明人： Franciscus Godefridus Casper Bijnen , Jozef Cornelis Antonius Roijers , Patrick Warnaar , Marc Van Kemenade , Hoite Pieter Theodoor Tolsma
CPC分类号： G03F9/7049 , G03F9/7003 , G03F9/7076 , G03F9/7084
摘要： A method for manufacturing a device includes providing a substrate, the substrate including a plurality of exposure fields, each exposure field including one or more target portions and at least one mark structure, the mark structure being arranged as positional mark for the exposure field; scanning and measuring the mark of each exposure field to obtain alignment information for the respective exposure field; determining an absolute position of each exposure field from the alignment information for the respective exposure field; determining a relative position of each exposure field with respect to at least one other exposure field by use of additional information on the relative parameters of the exposure field and the at least one other exposure field relative to each other; and combining the absolute positions and the determined relative positions into improved absolute positions for each of the plurality of exposure fields.
摘要翻译： 一种制造器件的方法包括：提供衬底，所述衬底包括多个曝光场，每个曝光场包括一个或多个目标部分和至少一个标记结构，所述标记结构被布置为所述曝光场的位置标记; 扫描和测量每个曝光场的标记以获得相应曝光场的对准信息; 根据相应曝光场的对准信息确定每个曝光场的绝对位置; 通过使用关于相对于彼此的曝光场和至少一个其他曝光场的相对参数的附加信息来确定每个曝光场相对于至少一个其它曝光场的相对位置; 以及将所述绝对位置和所确定的相对位置组合为所述多个曝光场中的每一个的改进的绝对位置。
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公开(公告)号：US20100123886A1
公开(公告)日：2010-05-20
申请号：US12621143
申请日：2009-11-18
申请人： Franciscus Godefridus Casper BIJNEN , Jozef Cornelis Antonius Roijers , Patrick Warnaar , Marc Van Kemenade , Hoite Pieter Theodoor Tolsma
发明人： Franciscus Godefridus Casper BIJNEN , Jozef Cornelis Antonius Roijers , Patrick Warnaar , Marc Van Kemenade , Hoite Pieter Theodoor Tolsma
CPC分类号： G03F9/7049 , G03F9/7003 , G03F9/7076 , G03F9/7084
摘要： A method for manufacturing a device includes providing a substrate, the substrate including a plurality of exposure fields, each exposure field including one or more target portions and at least one mark structure, the mark structure being arranged as positional mark for the exposure field; scanning and measuring the mark of each exposure field to obtain alignment information for the respective exposure field; determining an absolute position of each exposure field from the alignment information for the respective exposure field; determining a relative position of each exposure field with respect to at least one other exposure field by use of additional information on the relative parameters of the exposure field and the at least one other exposure field relative to each other; and combining the absolute positions and the determined relative positions into improved absolute positions for each of the plurality of exposure fields.
摘要翻译： 一种制造器件的方法包括：提供衬底，所述衬底包括多个曝光场，每个曝光场包括一个或多个目标部分和至少一个标记结构，所述标记结构被布置为所述曝光场的位置标记; 扫描和测量每个曝光场的标记以获得相应曝光场的对准信息; 根据相应曝光场的对准信息确定每个曝光场的绝对位置; 通过使用关于相对于彼此的曝光场和至少一个其他曝光场的相对参数的附加信息来确定每个曝光场相对于至少一个其它曝光场的相对位置; 以及将所述绝对位置和所确定的相对位置组合为所述多个曝光场中的每一个的改进的绝对位置。
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3.发明授权Alignment mark and a method of aligning a substrate comprising such an alignment mark 有权对准标记和对准包括这种对准标记的基板的方法公开(公告)号：US08208121B2
公开(公告)日：2012-06-26
申请号：US12363320
申请日：2009-01-30
申请人： Franciscus Godefridus Casper Bijnen , Manfred Gawein Tenner , Patrick Warnaar , Marc Van Kemenade
发明人： Franciscus Godefridus Casper Bijnen , Manfred Gawein Tenner , Patrick Warnaar , Marc Van Kemenade
CPC分类号： G03B27/32 , G03F9/7076
摘要： An alignment mark comprising a periodic structure formed by mark lines is described. In an embodiment, the alignment mark is formed in a scribe lane of a substrate, the scribe lane extending in a scribe lane direction. The alignment mark includes: a first area including a first periodic structure formed by first mark lines extending in a first direction, the first direction being at a first angle α with respect to the scribe lane direction: 0°
摘要翻译： 描述包括由标记线形成的周期性结构的对准标记。 在一个实施例中，对准标记形成在基板的划线中，刻划线在划线方向延伸。 对准标记包括：第一区域，包括由第一方向延伸的第一标记线形成的第一周期性结构，第一方向相对于划线方向为第一角度α：0°<α<90°， 第二区域包括由沿第二方向延伸的第二标记线形成的第二周期性结构，第二方向为第二角度＆amp; bgr; 相对于划线方向：-90°＆nlE;＆bgr; <0°。
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4.发明申请Alignment Mark and a Method of Aligning a Substrate Comprising Such an Alignment Mark 有权对准标记和对准包括这种对准标记的基板的方法公开(公告)号：US20090195768A1
公开(公告)日：2009-08-06
申请号：US12363320
申请日：2009-01-30
申请人： Franciscus Godefridus Casper Bijnen , Manfred Gawein Tenner , Patrick Warnaar , Marc Van Kemenade
发明人： Franciscus Godefridus Casper Bijnen , Manfred Gawein Tenner , Patrick Warnaar , Marc Van Kemenade
CPC分类号： G03B27/32 , G03F9/7076
摘要： An alignment mark comprising a periodic structure formed by mark lines is described. In an embodiment, the alignment mark is formed in a scribe lane of a substrate, the scribe lane extending in a scribe lane direction. The alignment mark includes: a first area including a first periodic structure formed by first mark lines extending in a first direction, the first direction being at a first angle α with respect to the scribe lane direction: 0°
摘要翻译： 描述包括由标记线形成的周期性结构的对准标记。 在一个实施例中，对准标记形成在基板的划线中，刻划线在划线方向延伸。 对准标记包括：第一区域，包括由沿第一方向延伸的第一标记线形成的第一周期性结构，第一方向相对于划线方向为第一角度α：0°<α<90°， 第二区域包括由沿第二方向延伸的第二标记线形成的第二周期性结构，第二方向相对于划线方向为第二角度β：-90°<=β<0°。
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公开(公告)号：US08208139B2
公开(公告)日：2012-06-26
申请号：US12346063
申请日：2008-12-30
IPC分类号： G01B11/00
CPC分类号： G03B27/42 , G03F9/7003 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088
摘要： A lithographic apparatus according to one embodiment of the invention includes an alignment system for aligning a substrate or a reticle. The alignment system includes a radiation source configured to illuminate an alignment mark on the substrate or on the reticle, the alignment mark comprising a maximum length sequence or a multi periodic coarse alignment mark. An alignment signal produced from the alignment mark is detected by a detection system. A processor determines an alignment position of the substrate or the reticle based on the alignment signal.
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公开(公告)号：US08208140B2
公开(公告)日：2012-06-26
申请号：US12718485
申请日：2010-03-05
IPC分类号： G01B11/00
CPC分类号： G03B27/42 , G03F9/7003 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088
摘要： A lithographic apparatus according to one embodiment of the invention includes an alignment system for aligning a substrate or a reticle. The alignment system includes a radiation source configured to illuminate an alignment mark on the substrate or on the reticle, the alignment mark comprising a maximum length sequence or a multi periodic coarse alignment mark. An alignment signal produced from the alignment mark is detected by a detection system. A processor determines an alignment position of the substrate or the reticle based on the alignment signal.
摘要翻译： 根据本发明的一个实施例的光刻设备包括用于对准衬底或掩模版的对准系统。 对准系统包括被配置为照亮衬底或掩模版上的对准标记的辐射源，对准标记包括最大长度序列或多周期性粗略对准标记。 由对准标记产生的对准信号由检测系统检测。 处理器基于对准信号确定基板或掩模版的对准位置。
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公开(公告)号：US08130366B2
公开(公告)日：2012-03-06
申请号：US12395091
申请日：2009-02-27
CPC分类号： G03F9/7069 , G03F9/7076 , G03F9/7088
摘要： A method for alignment of a substrate, in which the substrate includes a mark in a scribe lane, and the scribe lane extends along a longitudinal direction as a first direction. The mark has a periodic structure in the first direction. The method includes providing an illumination beam for scanning the mark in a direction perpendicular to a direction of the mark's periodic structure along a first scan path across the mark, scanning the spot of the illumination beam along a second scan path across the mark, the second scan path being parallel to the first scan path, wherein the second scan path is shifted relative to the first scan path over a first shift that corresponds to a fraction of the repeating distance of the periodic structure.
摘要翻译： 用于对准衬底的方法，其中衬底包括划线中的标记和划线，沿着纵向方向作为第一方向延伸。 标记在第一方向上具有周期性结构。 该方法包括提供照射光束，用于沿着与标记的周期结构的方向垂直的方向沿着标记的第一扫描路径扫描标记，沿着标记的第二扫描路径扫描照明光束的光点，第二 扫描路径平行于第一扫描路径，其中第二扫描路径相对于对应于周期性结构的重复距离的一部分的第一移位相对于第一扫描路径移位。
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公开(公告)号：US20100214550A1
公开(公告)日：2010-08-26
申请号：US12718485
申请日：2010-03-05
CPC分类号： G03B27/42 , G03F9/7003 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088
摘要： A lithographic apparatus according to one embodiment of the invention includes an alignment system for aligning a substrate or a reticle. The alignment system includes a radiation source configured to illuminate an alignment mark on the substrate or on the reticle, the alignment mark comprising a maximum length sequence or a multi periodic coarse alignment mark. An alignment signal produced from the alignment mark is detected by a detection system. A processor determines an alignment position of the substrate or the reticle based on the alignment signal.
摘要翻译： 根据本发明的一个实施例的光刻设备包括用于对准基板或掩模版的对准系统。 对准系统包括被配置为照亮衬底或掩模版上的对准标记的辐射源，对准标记包括最大长度序列或多周期性粗略对准标记。 由对准标记产生的对准信号由检测系统检测。 处理器基于对准信号确定基板或掩模版的对准位置。
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公开(公告)号：US20090237637A1
公开(公告)日：2009-09-24
申请号：US12395091
申请日：2009-02-27
CPC分类号： G03F9/7069 , G03F9/7076 , G03F9/7088
摘要： A method for alignment of a substrate, in which the substrate includes a mark in a scribe lane, and the scribe lane extends along a longitudinal direction as a first direction. The mark has a periodic structure in the first direction. The method includes providing an illumination beam for scanning the mark in a direction perpendicular to a direction of the mark's periodic structure along a first scan path across the mark, scanning the spot of the illumination beam along a second scan path across the mark, the second scan path being parallel to the first scan path, wherein the second scan path is shifted relative to the first scan path over a first shift that corresponds to a fraction of the repeating distance of the periodic structure.
摘要翻译： 用于对准衬底的方法，其中衬底包括划线中的标记和划线，沿着纵向方向作为第一方向延伸。 标记在第一方向上具有周期性结构。 该方法包括提供照射光束，用于沿着与标记的周期结构的方向垂直的方向沿着标记的第一扫描路径扫描标记，沿着标记的第二扫描路径扫描照明光束的光点，第二 扫描路径平行于第一扫描路径，其中第二扫描路径相对于对应于周期性结构的重复距离的一部分的第一移位相对于第一扫描路径移位。
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公开(公告)号：US20090176167A1
公开(公告)日：2009-07-09
申请号：US12346063
申请日：2008-12-30
CPC分类号： G03B27/42 , G03F9/7003 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088
摘要： A lithographic apparatus according to one embodiment of the invention includes an alignment system for aligning a substrate or a reticle. The alignment system includes a radiation source configured to illuminate an alignment mark on the substrate or on the reticle, the alignment mark comprising a maximum length sequence or a multi periodic coarse alignment mark. An alignment signal produced from the alignment mark is detected by a detection system. A processor determines an alignment position of the substrate or the reticle based on the alignment signal.
摘要翻译： 根据本发明的一个实施例的光刻设备包括用于对准衬底或掩模版的对准系统。 对准系统包括被配置为照亮衬底或掩模版上的对准标记的辐射源，对准标记包括最大长度序列或多周期性粗略对准标记。 由对准标记产生的对准信号由检测系统检测。 处理器基于对准信号确定基板或掩模版的对准位置。
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