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公开(公告)号：US4563613A
公开(公告)日：1986-01-07
申请号：US605729
申请日：1984-05-01
CPC分类号： H01J31/126 , H01J29/46
摘要： A vacuum fluorescent printing device is disclosed having cathode filaments, a plurality of multiplexed control grids and a skewed matrix of addressable phosphor elements configured on an anode in such a fashion as to enable convenient electrical connection plus imagewise recombination of emitted light from said phosphor elements into a high resolution array for the purpose of directing this collection of addressable points of light onto a single line of a photoreceptor drum or belt thereby enabling a xerographic image to be generated. An equipotential screen grid is located between one of said plurality of grids and the anode in order to reduce voltage swings needed for cutoff of either grid for phosphor addressing purposes.
摘要翻译： 公开了一种真空荧光印刷装置，其具有阴极丝，多个多路复用控制网格和配置在阳极上的可寻址磷光体元件的倾斜矩阵，使得能够方便的电连接加上来自所述荧光体元件的发射光的图像复合 高分辨率阵列，用于将这种可寻址点光的集合引导到感光鼓或带的单个线上，从而使得能够产生静电复印图像。 等电位屏栅位于所述多个栅极之一和阳极之间，以便减少用于磷光体寻址目的的任一栅格截止所需的电压摆幅。
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2.发明授权Edge-out matrix light bar coupling apparatus and method using a fiber-optics plate 失效边缘矩阵光棒耦合装置和方法使用光纤板
公开(公告)号：US4558255A
公开(公告)日：1985-12-10
申请号：US605730
申请日：1984-05-01
申请人： Frank C. Genovese , Joel M. Pollack
发明人： Frank C. Genovese , Joel M. Pollack
IPC分类号： B41J2/44 , B41J2/447 , G02B6/04 , G02B6/06 , H01J29/89 , H01J31/12 , H01J31/15 , H04N1/036 , H01J1/62 , H01J63/04
CPC分类号： B41J2/4476 , H01J29/892 , H01J31/126 , H01J31/15
摘要： A vacuum fluorescent printing device is disclosed having cathode filaments, a plurality of multiplexed control grids and a skewed matrix of addressable phosphor elements configured on a fiber optic plate in such a fashion as to enable light emitted from the phosphor elements to be directed edgewise through the fiber optic plate to expose a photosensitive member.
摘要翻译： 公开了一种真空荧光印刷装置，其具有阴极丝，多个多路复用控制网格和配置在光纤板上的可寻址磷光体元件的倾斜矩阵，使得能够沿着荧光体元件发射的光沿着 光纤板以暴露感光构件。
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公开(公告)号：US4060316A
公开(公告)日：1977-11-29
申请号：US668896
申请日：1976-03-22
申请人： Joel M. Pollack , John B. Flannery
发明人： Joel M. Pollack , John B. Flannery
CPC分类号： G02F1/135
摘要： An imaging method which is comprised of a spatially varying imagewise output intensity for a corresponding imaging input. An imaging member comprising between two electrodes a photoconductor in contact with an about 1 to about 6 micron thick layer of nematic liquid crystalline material, which in the absence of an electrical field is in the homogeneous texture, and having negative dielectric anisotropy is utilized. A d.c. voltage above the parallel variable grating mode threshold for the nematic liquid crystalline material is applied between the two electrodes of the imaging member and, while the voltage is applied, the photoconductor is exposed to imagewise configured actinic electromagnetic radiation from a first radiation source. The actinic radiation causes the voltage to increase across portions of the nematic liquid crystalline layer in electrical contact with regions of the photoconductor exposed to the actinic radiation. The increase in voltage across these portions of the liquid crystalline material is sufficient to cause cylindrical, vortical domains of molecules of the nematic liquid crystalline material to form with their long axes parallel to the initial direction of homogeneous alignment (a parallel variable grating mode). The spatial frequency of the vortical domains varies dynamically with the intensity of the actinic electromagnetic radiation. From a second radiation source, electromagnetic radiation which is non-actinic to the photoconductor by virtue of either the photoconductor or imaging member structure, is modified by the imagewise configured liquid crystalline texture resulting in a projection image of second source radiation corresponding to the imagewise configured first source electromagnetic radiation.
摘要翻译： 一种成像方法，其由对应的成像输入的空间变化的成像输出强度组成。 在两个电极之间包括与约1至约6微米厚的向列型液晶材料层接触的感光体的成像构件，其在不存在电场的情况下具有均匀质地并具有负介电各向异性。 一个d.c. 在向列液晶材料的平行可变光栅模式阈值以上的电压被施加在成像构件的两个电极之间，并且在施加电压的同时，光电导体暴露于来自第一辐射源的成像配置的光化学电磁辐射。 光化辐射导致向列型液晶层的部分电压增加，其与暴露于光化辐射的光电导体的区域电接触。 液晶材料的这些部分上的电压的增加足以使向列型液晶材料的分子的圆柱形涡旋域形成为平行于均匀取向的初始方向的长轴（平行可变光栅模式）。 涡旋域的空间频率随着光化电磁辐射的强度而动态变化。 从第二辐射源，通过光电导体或成像构件结构对光电导体非光化的电磁辐射通过成像构型的液晶纹理进行修改，导致对应于图像配置的第二源辐射的投影图像 第一源电磁辐射。
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公开(公告)号：US4045124A
公开(公告)日：1977-08-30
申请号：US552898
申请日：1975-02-25
申请人： Joel M. Pollack , John B. Flannery
发明人： Joel M. Pollack , John B. Flannery
摘要： Bistable deflection of a beam of light into and out from a layer of nematic liquid crystalline material having negative dielectric anisotropy and having a thickness of from about 1 micron to about 6 microns is achieved by providing the nematic liquid crystalline material in the parallel variable grating mode between two electrodes, the nematic being under an applied voltage between the two electrodes at a voltage level above the threshold voltage level for parallel variable diffraction mode for said nematic liquid crystalline material, and increasing and decreasing the applied voltage so that light diffracted by the parallel variable grating mode nematic is deflected at an angle which either exceeds or is less than the critical angle between the layer of nematic liquid crystalline material and one of the electrodes. When the deflection of diffracted light is increased in excess of the critical angle, the incident light is totally reflected within the nematic layer; and, when the deflection angle of the diffracted light is decreased below the critical angle, the incident light is diffracted through the nematic layer and the one electrode. The bistable deflection can be utilized in a reproduction device which converts a data chain of electrical signals into an image and in integrated optics.
摘要翻译： 通过提供具有平行可变光栅模式的向列型液晶材料，实现光束的双稳态偏转进入和离开具有负介电各向异性并具有约1微米至约6微米厚度的向列型液晶材料层 在两个电极之间，向列在两个电极之间施加的电压处于高于用于所述向列液晶材料的并行可变衍射模式的阈值电压电平的电压电平，并且增加和减小施加的电压，使得由平行 可变光栅模式向列偏转的角度大于或小于向列液晶材料层与其中一个电极之间的临界角度。 当衍射光的偏转增加超过临界角时，入射光在向列层内全部被反射; 并且当衍射光的偏转角降低到临界角以下时，入射光通过向列层和一个电极衍射。 双稳态偏转可用于将电信号的数据链转换为图像和集成光学的再现装置。
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公开(公告)号：US4374707A
公开(公告)日：1983-02-22
申请号：US245422
申请日：1981-03-19
申请人： Joel M. Pollack
发明人： Joel M. Pollack
CPC分类号： B41J2/1643 , B41J2/162 , B41J2/1626 , B41J2/1631 , C25D1/08 , Y10T428/12361 , Y10T428/1291
摘要： An orifice plate for use in ink jet printing machines is produced by an electroplating technique. The plate is bilaminar with nickel being plated onto copper to form a substantially rigid structure.
摘要翻译： 通过电镀技术制造用于喷墨印刷机的孔板。 该板是双层的，其中镍镀在铜上以形成基本刚性的结构。
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公开(公告)号：US3980396A
公开(公告)日：1976-09-14
申请号：US552899
申请日：1975-02-25
申请人： Joel M. Pollack , Richard F. Bergen
发明人： Joel M. Pollack , Richard F. Bergen
摘要： Deflection and modulation of monochromatic light is achieved by providing an about 1 micron to about 6 micron thick layer of homogeneously aligned nematic liquid crystalline material having negative dielectric anisotropy between two transparent electrodes; applying a voltage between the two electrodes at a voltage level above the threshold voltage level for parallel variable diffraction mode for said nematic liquid crystalline material; directing a ribbon or beam of monochromatic light into the layer of nematic liquid crystalline material and coplanar therewith; and increasing and decreasing the applied voltage so that light diffracted by the parallel variable grating mode nematic is deflected at an angle which either exceeds or is less than a critical angle .theta..sub.c. When the deflection of diffracted light is increased in excess of critical angle .theta..sub.c the incident monochromatic light is diffracted through the nematic layer and the electrodes; and, when the deflection angle of the diffracted light is decreased below critical angle .theta..sub.c the incident monochromatic light is totally reflected within the nematic layer provided the voltage level is above the parallel variable grating mode level. At voltages below the parallel variable grating more threshold voltage level, the incident monochromatic light passes through the layer of nematic liquid crystalline material without reflection. Imaging devices utilizing the above deflection and modulation are disclosed.
摘要翻译： 通过在两个透明电极之间提供具有负介电各向异性的均匀排列向列型液晶材料的约1微米至约6微米厚的层来实现单色光的偏转和调制; 在所述向列型液晶材料的平行可变衍射模式下，以高于阈值电压电平的电压电平在两个电极之间施加电压; 将带状或单色光束引导到向列型液晶材料层中并共面; 并且增加和减小所施加的电压，使得由平行可变光栅模式向列衍射的光以超过或小于临界角θc的角度偏转。 当衍射光的偏转超过临界角θc时，入射的单色光通过向列层和电极衍射; 并且当衍射光的偏转角降低到临界角θc以下时，如果电压电平高于并行可变光栅模式电平，则入射单色光在向列中被全反射。 在低于并联可变光栅的电压低于阈值电压电平的情况下，入射单色光通过向列型液晶材料层而没有反射。 公开了利用上述偏转和调制的成像装置。
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公开(公告)号：US3980403A
公开(公告)日：1976-09-14
申请号：US552909
申请日：1975-02-25
申请人： Joel M. Pollack
发明人： Joel M. Pollack
CPC分类号： G02F1/135
摘要： A novel projection imaging method. An imaging member is utilized comprising between two electrodes a negative photoconductor in contact with an about 1 to about 6 micron thick layer of nematic liquid crystalline material which, in the absence of an electrical field is provided in the homogeneous texture, and of negative dielectric anisotropy. A d.c. voltage above the parallel variable grating mode threshold for the nematic liquid crystalline material is applied between the two electrodes of the imaging member and the entire nematic layer goes into the parallel variable grating mode. While the voltage is applied, the negative photoconductor is exposed to imagewise configured actinic electromagnetic radiation and becomes more resistive in exposed areas. The actinic radiation causes the voltage to decrease across portions of the nematic liquid crystalline layer in contact with regions of the negative photoconductor exposed to the actinic radiation. The decrease in voltage across these portions of the liquid crystalline material is sufficient to cause cylindrical, vortical domains of molecules of the nematic liquid crystalline material in the parallel variable grating mode to disappear in imagewise configuration. Conventional Schlieren readout utilizing light linearly polarized in a direction orthogonal to the major axes of the vortical domains prevents unwanted exposure of the negative photoconductor while simultaneously maintaining the resistance of the negative photoconductor in imagewise configuration. Selective write and erase capabilities are provided.
摘要翻译： 一种新颖的投影成像方法。 使用成像构件，其包括在两个电极之间，与大约1至大约6微米厚的向列型液晶材料层接触的负光电导体，其在不存在均匀纹理中的电场的情况下和负介电各向异性 。 一个d.c. 向上型液晶材料的平行可变光栅模式阈值以上的电压被施加在成像部件的两个电极之间，并且整个向列层进入平行可变光栅模式。 当施加电压时，负光电导体暴露于成像配置的光化电磁辐射，并在暴露的区域变得更具阻性。 光化辐射导致向列液晶层的部分与负光电导体暴露于光化辐射的区域接触的电压降低。 液晶材料的这些部分上的电压的降低足以使并联可变光栅模式中的向列型液晶材料的分子的圆柱形涡旋域在成像方式上消失。 使用在垂直于涡旋域的长轴的方向上线性偏振的光的常规Schlieren读数防止负光电导体的不期望的曝光，同时保持负光电导体在成像构型中的电阻。 提供了选择性写入和擦除功能。
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