公开(公告)号：US20150171017A1

公开(公告)日：2015-06-18

申请号：US14104210

申请日：2013-12-12

申请人： Frank Evans ,  Shipeng Qiu ,  Dhruv Bhate ,  Sergei Voronov ,  Tao Wang

发明人： Frank Evans ,  Shipeng Qiu ,  Dhruv Bhate ,  Sergei Voronov ,  Tao Wang

IPC分类号： H01L23/544 ,  B23K26/36 ,  B23K26/08 ,  B23K26/06 ,  H01L21/3105 ,  H01L21/67

CPC分类号： H01L23/544 ,  B23K26/0626 ,  B23K26/082 ,  B23K26/362 ,  H01L21/3105 ,  H01L21/67282 ,  H01L2223/54406 ,  H01L2223/54413 ,  H01L2223/5442 ,  H01L2223/54433 ,  H01L2924/0002 ,  H01L2924/00

摘要： Apparatus, systems, and methods are provided to generate markings on the surface of a die or substrate. The markings represent information. The markings can be annealed onto the surface of the die or substrate using a laser. Another embodiment can use an out-of-focus laser beam to mark a solder resist material.

摘要翻译： 提供了设备，系统和方法以在管芯或衬底的表面上产生标记。 标记代表信息。 标记可以使用激光退火到模具或衬底的表面上。 另一个实施例可以使用离焦激光束来标记阻焊材料。

公开(公告)号：US20240093479A1

公开(公告)日：2024-03-21

申请号：US18468185

申请日：2023-09-15

申请人： Yash Mistry ,  Siying Liu ,  Mandar Shinde ,  Xiangfan Chen ,  Dhruv Bhate ,  Nikhilesh Chawla ,  Swapnil Morankar ,  Clint Penick

发明人： Yash Mistry ,  Siying Liu ,  Mandar Shinde ,  Xiangfan Chen ,  Dhruv Bhate ,  Nikhilesh Chawla ,  Swapnil Morankar ,  Clint Penick

IPC分类号： E04B1/19 ,  B29C64/182

CPC分类号： E04B1/19 ,  B29C64/182 ,  B33Y10/00

摘要： A unit cell of an interwoven lattice structure having an interwoven point therein. The unit cell includes first, second, third, and fourth struts each having an interwoven node offset from the interwoven point. The first strut has a first interwoven node offset from a first diagonal unit cell plane in a first distance and first direction. The second strut has a second interwoven node offset from the first diagonal unit cell plane in a second distance and second direction opposite the first direction. The third strut has a third interwoven node offset from a second diagonal unit cell plane in a third distance and third direction. The fourth strut has a fourth interwoven node offset from the second diagonal unit cell plane in a fourth distance and fourth direction opposite the third direction. The first and second diagonal unit cell planes both pass through the interwoven point.