公开(公告)号：US08345262B2

公开(公告)日：2013-01-01

申请号：US13361442

申请日：2012-01-30

申请人： Frank Schillke ,  Rolf Freimann ,  Matthias Dreher

发明人： Frank Schillke ,  Rolf Freimann ,  Matthias Dreher

IPC分类号： G01B11/02

CPC分类号： G01B11/2441 ,  G01B9/02039

摘要： An optical element having an optical surface (12; 103), which optical surface has an actual shape, the actual shape deviating from a desired shape by maximum 0.2 nm, wherein the desired shape is either: a free-form surface having a deviation from its best-fitting sphere of at least 5 μm or a substantially rotationally symmetrical surface having a deviation from its best-fitting sphere of at least 0.5 mm.

摘要翻译： 一种具有光学表面（12; 103）的光学元件，该光学表面具有实际形状，实际形状偏离所需形状最大为0.2nm，其中所需形状为：自由曲面与 其最适合的球体至少为5μm，或者具有与其最佳拟合球体至少为0.5mm的偏差的基本上旋转对称的表面。

公开(公告)号：US08104905B2

公开(公告)日：2012-01-31

申请号：US12263564

申请日：2008-11-03

申请人： Frank Schillke ,  Rolf Freimann ,  Matthias Dreher

发明人： Frank Schillke ,  Rolf Freimann ,  Matthias Dreher

IPC分类号： G02B5/08 ,  G01B11/02 ,  G01B9/02 ,  G02B5/18 ,  G02B27/44

CPC分类号： G01B11/2441 ,  G01B9/02039

摘要： An optical element having an optical surface (12; 103), which optical surface has an actual shape, the actual shape deviating from a desired shape by maximum 0.2 nm, wherein the desired shape is either: a free-form surface having a deviation from its best-fitting sphere of at least 5 μm or a substantially rotationally symmetrical surface having a deviation from its best-fitting sphere of at least 0.5 mm.

摘要翻译： 一种具有光学表面（12; 103）的光学元件，该光学表面具有实际形状，实际形状偏离所需形状最大为0.2nm，其中所需形状为：自由曲面与 其最适合的球体至少为5μm，或者具有与其最佳拟合球体至少为0.5mm的偏差的基本上旋转对称的表面。

公开(公告)号：US20090128829A1

公开(公告)日：2009-05-21

申请号：US12263564

申请日：2008-11-03

申请人： Frank Schillke ,  Rolf Freimann ,  Matthias Dreher

发明人： Frank Schillke ,  Rolf Freimann ,  Matthias Dreher

IPC分类号： G01B9/02

CPC分类号： G01B11/2441 ,  G01B9/02039

摘要： A method of determining a deviation of an actual shape from a desired shape of an optical surface (12; 103) includes: providing an incoming electromagnetic measuring wave (20; 113), providing two diffractive structures (47, 49; 145, 146, 141, 143) which are respectively designed to reshape the wavefront of an arriving wave, calibrating one of the two diffractive structures (47, 49; 145, 146, 141, 143) by radiating the incoming measuring wave (20; 113) onto the at least one diffractive structure to be calibrated (47, 49; 145, 146, 141, 143) and determining a calibration deviation of the actual wavefront from a desired wavefront of the measuring wave (20; 113) after interaction of the latter with the at least one diffractive structure to be calibrated (47, 49; 145, 146, 141, 143), positioning the two diffractive structures (47; 49; 145, 146, 141, 143) in the optical path of the incoming measuring wave (20; 113) such that individual rays of the measuring wave radiate through both diffractive structures (47; 49; 145, 146, 141, 143), and reshaping the incoming measuring wave (20; 113) by means of the two diffractive structures (47; 49; 145, 146, 141, 143) to form an adapted measuring wave (64; 114), the wavefront of which is adapted to the desired shape of the optical surface (12; 103), positioning the optical surface (12; 103) in the optical path of the adapted measuring wave (64, 114) so that the adapted measuring wave (64; 114) interacts with the optical surface (12; 103) and measuring the wavefront of the adapted measuring wave (64; 114) after interaction of the latter with the optical surface (12; 103).

摘要翻译： 确定实际形状与光学表面（12; 103）的期望形状的偏差的方法包括：提供输入的电磁测量波（20; 113），提供两个衍射结构（47,49; 145,146， 分别被设计成重新形成到达波的波前，通过将进入的测量波（20; 113）辐射到所述两个衍射结构（47,49; 145,146,141,143）中来校准所述两个衍射结构 至少一个待校准的衍射结构（47,49; 145,146,141,143），并且在后者与所述测量波的相互作用之后确定所述实际波前与所述测量波（20; 113）的期望波阵面的校准偏差 至少一个待校准的衍射结构（47,49; 145,146,141,143），将两个衍射结构（47; 49; 145,146,141,143）定位在入射测量波的光路中 20; 113），使得测量波的各个射线通过两个衍射辐射 结构（47; 49; 并且借助于所述两个衍射结构（47; 49; 145,146,141,143）对所述输入测量波（20; 113）重塑，以形成适应的测量波（64; 114 ），其波前适应于光学表面（12; 103）的期望形状，将光学表面（12; 103）定位在适配测量波（64,114）的光路中，使得适配测量 波（64; 114）与光学表面（12; 103）相互作用，并在后者与光学表面（12; 103）相互作用之后测量适应测量波（64; 114）的波前。

公开(公告)号：US07791737B2

公开(公告)日：2010-09-07

申请号：US11939382

申请日：2007-11-13

申请人： Bernd Doerband ,  Matthias Dreher

发明人： Bernd Doerband ,  Matthias Dreher

IPC分类号： G01B11/02 ,  G01B9/02

CPC分类号： G01B11/2441 ,  G01B9/02039

摘要： Electromagnetic illumination radiation is produced and provided as an input wave. The input wave passes through a diffractive optical element and leaves as an incoming measuring wave, the wave front of the input wave being transformed such that the wave front of the incoming measuring wave is adapted to the desired shape of the effective reflection surface. Furthermore, the test object is disposed in a test position in which the incoming measuring wave is reflected back to the diffractive optical element as a reflected measuring wave, the reflected measuring wave passing through the diffractive optical element and leaving as an outgoing measuring wave, the propagation direction of the outgoing measuring wave being deviated in relation to the opposite propagation direction of the input wave. A reference wave branched off from the illumination radiation interferes with the outgoing measuring wave this interference being recorded by detector.

摘要翻译： 产生电磁照射辐射作为输入波。 输入波通过衍射光学元件并作为入射测量波离开，输入波的波前被变换，使得入射测量波的波前适应于有效反射表面的期望形状。 此外，被测试对象被设置在测试位置，在测试位置中，入射测量波被反射回衍射光学元件作为反射测量波，反射的测量波通过衍射光学元件并作为输出测量波留下， 输出测量波的传播方向相对于输入波的相反传播方向偏离。 从照射辐射分支的参考波干扰出射测量波，这种干扰由检测器记录。

公开(公告)号：US20090237672A1

公开(公告)日：2009-09-24

申请号：US11939382

申请日：2007-11-13

申请人： Bernd Doerband ,  Matthias Dreher

发明人： Bernd Doerband ,  Matthias Dreher

IPC分类号： G01B9/021 ,  G01B11/24 ,  G01B9/02

CPC分类号： G01B11/2441 ,  G01B9/02039

摘要： The invention relates to a method and to an apparatus for interferometrically determining a deviation of an actual shape of an effective reflection surface (12) of a test object (14) from a desired shape of the effective reflection surface (12). In the method according to the invention electromagnetic illumination radiation (24) is produced by means of an illumination device (16) and provided as an input wave (30). The input wave (30) passes through a diffractive optical element (18) and leaves the latter as an incoming measuring wave (42), the wave front of the input wave (30) being transformed upon passing through the optical element (18) such that the wave front of the incoming measuring wave (42) is adapted to the desired shape of the effective reflection surface (12). Furthermore, the test object (14) is disposed in a test position in which the incoming measuring wave (42) is reflected back to the diffractive optical element (18) by the effective reflection surface (12) of the test object (14) as a reflected measuring wave, the reflected measuring wave (44) passes through the diffractive optical element (18) and leaves the latter as an outgoing measuring wave (46), the propagation direction (48) of the outgoing measuring wave (46) being deviated upon passing out of the diffractive optical element (18) in relation to the opposite propagation direction (50) of the input wave (30) upon passing into the diffractive optical element (18). A reference wave (32) is branched off from the illumination radiation (24) such that the reference wave (32) interferes with the outgoing measuring wave (46), and records the intensity distribution of an interference pattern produced by the interference of the reference wave (32) with the outgoing measuring wave (46) by means of a recording device (20).