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    Method and apparatus for determining a deviation of an actual shape from a desired shape of an optical surface
    1.
    发明授权
    Method and apparatus for determining a deviation of an actual shape from a desired shape of an optical surface 有权
    用于确定实际形状与光学表面的期望形状的偏差的方法和装置

    公开(公告)号：US08345262B2

    公开(公告)日：2013-01-01

    申请号：US13361442

    申请日：2012-01-30

    申请人： Frank Schillke ,  Rolf Freimann ,  Matthias Dreher

    发明人： Frank Schillke ,  Rolf Freimann ,  Matthias Dreher

    IPC分类号： G01B11/02

    CPC分类号： G01B11/2441 ,  G01B9/02039

    摘要： An optical element having an optical surface (12; 103), which optical surface has an actual shape, the actual shape deviating from a desired shape by maximum 0.2 nm, wherein the desired shape is either: a free-form surface having a deviation from its best-fitting sphere of at least 5 μm or a substantially rotationally symmetrical surface having a deviation from its best-fitting sphere of at least 0.5 mm.

    摘要翻译： 一种具有光学表面（12; 103）的光学元件，该光学表面具有实际形状，实际形状偏离所需形状最大为0.2nm，其中所需形状为：自由曲面与 其最适合的球体至少为5μm，或者具有与其最佳拟合球体至少为0.5mm的偏差的基本上旋转对称的表面。

    METHOD AND APPARATUS FOR DETERMINING A DEVIATION OF AN ACTUAL SHAPE FROM A DESIRED SHAPE OF AN OPTICAL SURFACE
    3.
    发明申请
    METHOD AND APPARATUS FOR DETERMINING A DEVIATION OF AN ACTUAL SHAPE FROM A DESIRED SHAPE OF AN OPTICAL SURFACE 有权
    用于确定从光学表面形成的实际形状偏差的方法和装置

    公开(公告)号：US20090128829A1

    公开(公告)日：2009-05-21

    申请号：US12263564

    申请日：2008-11-03

    申请人： Frank Schillke ,  Rolf Freimann ,  Matthias Dreher

    发明人： Frank Schillke ,  Rolf Freimann ,  Matthias Dreher

    IPC分类号： G01B9/02

    CPC分类号： G01B11/2441 ,  G01B9/02039

    摘要： A method of determining a deviation of an actual shape from a desired shape of an optical surface (12; 103) includes: providing an incoming electromagnetic measuring wave (20; 113), providing two diffractive structures (47, 49; 145, 146, 141, 143) which are respectively designed to reshape the wavefront of an arriving wave, calibrating one of the two diffractive structures (47, 49; 145, 146, 141, 143) by radiating the incoming measuring wave (20; 113) onto the at least one diffractive structure to be calibrated (47, 49; 145, 146, 141, 143) and determining a calibration deviation of the actual wavefront from a desired wavefront of the measuring wave (20; 113) after interaction of the latter with the at least one diffractive structure to be calibrated (47, 49; 145, 146, 141, 143), positioning the two diffractive structures (47; 49; 145, 146, 141, 143) in the optical path of the incoming measuring wave (20; 113) such that individual rays of the measuring wave radiate through both diffractive structures (47; 49; 145, 146, 141, 143), and reshaping the incoming measuring wave (20; 113) by means of the two diffractive structures (47; 49; 145, 146, 141, 143) to form an adapted measuring wave (64; 114), the wavefront of which is adapted to the desired shape of the optical surface (12; 103), positioning the optical surface (12; 103) in the optical path of the adapted measuring wave (64, 114) so that the adapted measuring wave (64; 114) interacts with the optical surface (12; 103) and measuring the wavefront of the adapted measuring wave (64; 114) after interaction of the latter with the optical surface (12; 103).

    摘要翻译： 确定实际形状与光学表面（12; 103）的期望形状的偏差的方法包括：提供输入的电磁测量波（20; 113），提供两个衍射结构（47,49; 145,146， 分别被设计成重新形成到达波的波前，通过将进入的测量波（20; 113）辐射到所述两个衍射结构（47,49; 145,146,141,143）中来校准所述两个衍射结构 至少一个待校准的衍射结构（47,49; 145,146,141,143），并且在后者与所述测量波的相互作用之后确定所述实际波前与所述测量波（20; 113）的期望波阵面的校准偏差 至少一个待校准的衍射结构（47,49; 145,146,141,143），将两个衍射结构（47; 49; 145,146,141,143）定位在入射测量波的光路中 20; 113），使得测量波的各个射线通过两个衍射辐射 结构（47; 49; 并且借助于所述两个衍射结构（47; 49; 145,146,141,143）对所述输入测量波（20; 113）重塑，以形成适应的测量波（64; 114 ），其波前适应于光学表面（12; 103）的期望形状，将光学表面（12; 103）定位在适配测量波（64,114）的光路中，使得适配测量 波（64; 114）与光学表面（12; 103）相互作用，并在后者与光学表面（12; 103）相互作用之后测量适应测量波（64; 114）的波前。

    Method for measuring and manufacturing an optical element and optical apparatus
    5.
    发明申请
    Method for measuring and manufacturing an optical element and optical apparatus 审中-公开
    光学元件和光学装置的测量和制造方法

    公开(公告)号：US20050225774A1

    公开(公告)日：2005-10-13

    申请号：US11098546

    申请日：2005-04-05

    申请人： Rolf Freimann ,  Susanne Beder ,  Guenther Seitz ,  Frank Schillke ,  Bernd Doerband ,  Heinz Martin ,  Franz Krug

    发明人： Rolf Freimann ,  Susanne Beder ,  Guenther Seitz ,  Frank Schillke ,  Bernd Doerband ,  Heinz Martin ,  Franz Krug

    IPC分类号： G01B9/02 ,  G01M11/02 ,  G02B13/18 ,  G02B27/62

    CPC分类号： G01M11/0214 ,  G01M11/025 ,  G01M11/0271 ,  G02B13/18 ,  G02B27/62

    摘要： A method of processing an optical element comprises testing the optical surface of the optical element using an interferometer optics for generating a beam of measuring light; wherein the interferometer optics has a plurality of optical elements which are configured and arranged such that the measuring light is substantially orthogonally incident on a reflecting surface, at each location thereof; and wherein the method further comprises: measuring at least one property of the interferometer optics, disposing the optical surface of the optical element at a measuring position relative to the interferometer optics within the beam of measuring light, and performing at least one interferometric measurement; determining deviations of the optical surface of the first optical element from a target shape thereof, based on the interferometric measurement and the at least one measured property of the interferometer optics.

    摘要翻译： 一种处理光学元件的方法包括使用用于产生测量光束的干涉仪光学器件来测试光学元件的光学表面; 其中所述干涉仪光学元件具有多个光学元件，所述多个光学元件被配置和布置成使得所述测量光在其每个位置处基本正交入射在反射表面上; 并且其中所述方法还包括：测量所述干涉仪光学器件的至少一个属性，将所述光学元件的光学表面相对于所述测量光束内的所述干涉仪光学器件设置在测量位置处，并且执行至少一个干涉测量; 基于干涉测量和干涉仪光学器件的至少一个测量特性，确定第一光学元件的光学表面与其目标形状的偏差。

    Method of manufacturing an optical system
    6.
    发明授权
    Method of manufacturing an optical system 有权
    制造光学系统的方法

    公开(公告)号：US07133225B1

    公开(公告)日：2006-11-07

    申请号：US10965909

    申请日：2004-10-18

    申请人： Rolf Freimann ,  Bernhard Fellner ,  Hans-Guenther Sachs ,  Hartmut Brandenburg ,  Bernd Doerband ,  Frank Schillke

    发明人： Rolf Freimann ,  Bernhard Fellner ,  Hans-Guenther Sachs ,  Hartmut Brandenburg ,  Bernd Doerband ,  Frank Schillke

    IPC分类号： G02B7/02 ,  G01B11/00 ,  G01N23/207

    CPC分类号： G02B7/023 ,  G02B7/1821 ,  G03F7/70258 ,  G03F7/70825

    摘要： A method of manufacturing an optical system comprises assembling an optical element on a mounting frame thereof. The mounting frame is disposed on a rotary table having an axis of rotation, and the mounting frame is adjusted such that a predefined axis of symmetry thereof is parallel to the axis of rotation. The optical element is placed on the mounting frame, and an interferometric measurement of a surface of the optical element is performed. The interferometric measurement is analyzed to arrange the optical element relative to the mounting frame such that a predefined axis of the optical element is parallel to the axis of rotation.

    摘要翻译： 制造光学系统的方法包括在其安装框架上组装光学元件。 安装框架设置在具有旋转轴线的旋转工作台上，并且调整安装框架使其预定的对称轴线平行于旋转轴线。 将光学元件放置在安装框架上，并执行光学元件的表面的干涉测量。 分析干涉测量以使光学元件相对于安装框架布置，使得光学元件的预定轴线平行于旋转轴线。

    Method for calibrating a radius test bench
    10.
    发明授权
    Method for calibrating a radius test bench 失效

    公开(公告)号：US07154612B2

    公开(公告)日：2006-12-26

    申请号：US10420573

    申请日：2003-04-22

    申请人： Rolf Freimann

    发明人： Rolf Freimann

    IPC分类号： G01B9/02

    CPC分类号： G01B9/02039 ,  G01B9/02057 ,  G01B9/02072 ,  G01B11/24 ,  G01B2290/15

    摘要： In a method for calibrating a radius test bench for measuring radii of optical elements, in particular of lenses and spherical mirrors, there are provided an illuminating system 1 that generates a spherical wave and a diffractive optical element 3 that retroreflects a spherical wave of a specific radius into itself. The diffractive optical element 3 is introduced into the radius test bench in at least two positions, a first position thereof being a cat's eye position 1 and another position being an autocollimation position, as a result of which it is possible to use the radius of curvature simulated by the diffractive optical element 3 to detect deviations of the radius test bench from this radius of curvature as errors of the radius test bench, and thus to take them into account in the measurements of optical elements to be tested.