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公开(公告)号：US06728946B1
公开(公告)日：2004-04-27
申请号：US09703294
申请日：2000-10-31
IPC分类号： G06F1750
摘要： An embodiment of the present invention described and shown in the specification is a system for optimizing data used in creating a photolithographic mask. The system reads a definition of a layer of wafer to be created with a photolithographic mask and defines a number of polygons corresponding to conventional patterns on a mask and polygons corresponding to areas on the mask that are phase shifters. A number of data layers are created and the polygons that define phase shifting areas that shift the phase of light by differing amounts of are grouped in different data layers. Once separated, the system analyzes the polygons in each data layer against one or more design rules and assigns a phase shift amount to all the polygons in a data layer in accordance with the analysis. The polygon definitions in each data layer are then given to a mask maker to fabricate a photolithographic mask. It is emphasized that this abstract is being provided to comply with the rules requiring an abstract and will not be used to interpret or limit the scope or meaning of the claims under 37 C.F.R. §1.72(b).
摘要翻译： 在说明书中描述和示出的本发明的实施例是用于优化用于创建光刻掩模的数据的系统。 系统读取要用光刻掩模创建的晶片层的定义，并且定义与掩模上的常规图案对应的多个多边形以及对应于作为移相器的掩模上的区域的多边形。 创建了许多数据层，并且定义将不同量的光相移的相移区域的多边形分组在不同的数据层中。 一旦分离，系统根据一个或多个设计规则分析每个数据层中的多边形，并根据分析为数据层中的所有多边形分配相移量。 然后将每个数据层中的多边形定义提供给掩模制造商以制造光刻掩模。 要强调的是，提供本摘要是为了遵守规定抽象要求的规则，不得用于解释或限制37 C.F.R.所述的权利要求的范围或含义。 §1.72（b）。
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公开(公告)号：US07174531B2
公开(公告)日：2007-02-06
申请号：US10811418
申请日：2004-03-26
IPC分类号： G06F17/50
摘要： An embodiment of the present invention described and shown in the specification is a system for optimizing data used in creating a photolithographic mask. The system reads a definition of a layer of wafer to be created with a photolithographic mask and defines a number of polygons corresponding to conventional patterns on a mask and polygons corresponding to areas on the mask that are phase shifters. A number of data layers are created and the polygons that define phase shifting areas that shift the phase of light by differing amounts of are grouped in different data layers. Once separated, the system analyzes the polygons in each data layer against one or more design rules and assigns a phase shift amount to all the polygons in a data layer in accordance with the analysis. The polygon definitions in each data layer are then given to a mask maker to fabricate a photolithographic mask. It is emphasized that this abstract is being provided to comply with the rules requiring an abstract and will not be used to interpret or limit the scope or meaning of the claims under 37 C.F.R. § 1.72(b).
摘要翻译： 在说明书中描述和示出的本发明的实施例是用于优化用于创建光刻掩模的数据的系统。 系统读取要用光刻掩模创建的晶片层的定义，并且定义与掩模上的常规图案对应的多个多边形以及对应于作为移相器的掩模上的区域的多边形。 创建了许多数据层，并且将不同量的光的相位定义相移区域的多边形分组在不同的数据层中。 一旦分离，系统根据一个或多个设计规则分析每个数据层中的多边形，并根据分析为数据层中的所有多边形分配相移量。 然后将每个数据层中的多边形定义提供给掩模制造商以制造光刻掩模。 要强调的是，提供本摘要是为了遵守规定抽象要求的规则，不得用于解释或限制37 C.F.R.所述的权利要求的范围或含义。 §1.72（b）。
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3.发明授权Fragmentation point and simulation site adjustment for resolution enhancement techniques 有权分解点和模拟现场调整用于分辨率增强技术公开(公告)号：US08566753B2
公开(公告)日：2013-10-22
申请号：US12972097
申请日：2010-12-17
申请人： James Word , Nicolas B. Cobb , Patrick J. LaCour
发明人： James Word , Nicolas B. Cobb , Patrick J. LaCour
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G03F1/70 , G06F17/5009 , G06F17/5072 , G06F2217/12 , Y02P90/265
摘要： A method of performing a resolution enhancement technique such as OPC on an initial layout description involves fragmenting a polygon that represents a feature to be created into a number of edge fragments. One or more of the edge fragments is assigned an initial simulation site at which the image intensity is calculated. Upon calculation of the image intensity, the position and/or number of initial simulation sites is varied. New calculations are made of the image intensity with the revised placement or number of simulation sites in order to calculate an OPC correction for the edge fragment. In other embodiments, fragmentation of a polygon is adjusted based on the image intensities calculated at the simulation sites. In one embodiment, the image intensity gradient vector calculated at the initial simulation sites is used to adjust the simulation sites and/or fragmentation of the polygon.
摘要翻译： 在初始布局描述上执行诸如OPC的分辨率增强技术的方法涉及将表示要创建的特征的多边形分段成多个边缘片段。 一个或多个边缘片段被分配有计算图像强度的初始模拟位置。 在计算图像强度时，初始模拟位置的位置和/或数量是变化的。 通过修改的位置或模拟位置数量对图像强度进行新的计算，以计算边缘片段的OPC校正。 在其他实施例中，基于在模拟位置处计算的图像强度来调整多边形的碎裂。 在一个实施例中，使用在初始模拟位置处计算的图像强度梯度矢量来调整多边形的模拟位置和/或碎片。
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4.发明授权Fragmentation point and simulation site adjustment for resolution enhancement techniques 有权分解点和模拟现场调整用于分辨率增强技术公开(公告)号：US07861207B2
公开(公告)日：2010-12-28
申请号：US11067504
申请日：2005-02-25
申请人： James Word , Nicolas B. Cobb , Patrick J. LaCour
发明人： James Word , Nicolas B. Cobb , Patrick J. LaCour
CPC分类号： G06F17/5081 , G03F1/70 , G06F17/5009 , G06F17/5072 , G06F2217/12 , Y02P90/265
摘要： A method of performing a resolution enhancement technique such as OPC on an initial layout description involves fragmenting a polygon that represents a feature to be created into a number of edge fragments. One or more of the edge fragments is assigned an initial simulation site at which the image intensity is calculated. Upon calculation of the image intensity, the position and/or number of initial simulation sites is varied. New calculations are made of the image intensity with the revised placement or number of simulation sites in order to calculate an OPC correction for the edge fragment. In other embodiments, fragmentation of a polygon is adjusted based on the image intensities calculated at the simulation sites. In one embodiment, the image intensity gradient vector calculated at the initial simulation sites is used to adjust the simulation sites and/or fragmentation of the polygon.
摘要翻译： 在初始布局描述上执行诸如OPC的分辨率增强技术的方法涉及将表示要创建的特征的多边形分段成多个边缘片段。 一个或多个边缘片段被分配有计算图像强度的初始模拟位置。 在计算图像强度时，初始模拟位置的位置和/或数量是变化的。 通过修改的位置或模拟位置数量对图像强度进行新的计算，以计算边缘片段的OPC校正。 在其他实施例中，基于在模拟位置处计算的图像强度来调整多边形的碎裂。 在一个实施例中，使用在初始模拟位置处计算的图像强度梯度矢量来调整多边形的模拟位置和/或碎片。
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5.发明申请FRAGMENTATION POINT AND SIMULATION SITE ADJUSTMENT FOR RESOLUTION ENHANCEMENT TECHNIQUES 有权分辨率增强技术的分解点和模拟场址调整公开(公告)号：US20110161894A1
公开(公告)日：2011-06-30
申请号：US12972097
申请日：2010-12-17
申请人： James Word , Nicolas B. Cobb , Patrick J. LaCour
发明人： James Word , Nicolas B. Cobb , Patrick J. LaCour
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G03F1/70 , G06F17/5009 , G06F17/5072 , G06F2217/12 , Y02P90/265
摘要： A method of performing a resolution enhancement technique such as OPC on an initial layout description involves fragmenting a polygon that represents a feature to be created into a number of edge fragments. One or more of the edge fragments is assigned an initial simulation site at which the image intensity is calculated. Upon calculation of the image intensity, the position and/or number of initial simulation sites is varied. New calculations are made of the image intensity with the revised placement or number of simulation sites in order to calculate an OPC correction for the edge fragment. In other embodiments, fragmentation of a polygon is adjusted based on the image intensities calculated at the simulation sites. In one embodiment, the image intensity gradient vector calculated at the initial simulation sites is used to adjust the simulation sites and/or fragmentation of the polygon.
摘要翻译： 在初始布局描述上执行诸如OPC的分辨率增强技术的方法涉及将表示要创建的特征的多边形分段成多个边缘片段。 一个或多个边缘片段被分配有计算图像强度的初始模拟位置。 在计算图像强度时，初始模拟位置的位置和/或数量是变化的。 通过修改的位置或模拟位置数量对图像强度进行新的计算，以计算边缘片段的OPC校正。 在其他实施例中，基于在模拟位置处计算的图像强度来调整多边形的碎裂。 在一个实施例中，使用在初始模拟位置处计算的图像强度梯度矢量来调整多边形的模拟位置和/或碎片。
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公开(公告)号：US06901574B2
公开(公告)日：2005-05-31
申请号：US09781128
申请日：2001-02-09
申请人： Patrick J. LaCour , Emile Sahouria , Siqiong You
发明人： Patrick J. LaCour , Emile Sahouria , Siqiong You
CPC分类号： G03F1/68
摘要： A method of translating device layout data to a format for a mask writing tool includes the acts of reading a file defining a number of cells that represent structures on the device. One or more cells are selected and one or more modified cells based on the interaction of the selected cells with other cells in the device layout are created. One or more additional cells is created that will create structures on the mask that are not formed by writing files corresponding to the modified cells and areas that prevent extraneous structures from being formed on the mask at a selected location by the writing of the files corresponding to the modified cells. A jobdeck for the mask writing tool is created that indicates where the files corresponding to modified cells and the one or more additional cells should be written to create one or more masks or reticles.
摘要翻译： 将设备布局数据转换为掩模写入工具的格式的方法包括读取定义表示设备上的结构的多个单元格的文件的动作。 选择一个或多个单元，并且创建基于所选单元与设备布局中的其他单元的交互的一个或多个修改单元。 创建一个或多个额外的单元，其将在掩模上创建不是通过写入与修改的单元相对应的文件而形成的结构，并且通过写入对应于文件的文件来防止在选定位置上的掩模上形成外来结构的区域 修饰细胞。 创建面具书写工具的工作台，其指示与修改的单元格对应的文件的位置以及应写入一个或多个其他单元格以创建一个或多个掩码或掩模版。
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