公开(公告)号：US20050259245A1

公开(公告)日：2005-11-24

申请号：US10524687

申请日：2003-08-21

申请人： Franz Cemic ,  Lambert Danner ,  Uwe Graf ,  Robert Mainberger ,  Dirk Sonksen ,  Volker Knorz

发明人： Franz Cemic ,  Lambert Danner ,  Uwe Graf ,  Robert Mainberger ,  Dirk Sonksen ,  Volker Knorz

IPC分类号： G01B11/30 ,  G01N21/88 ,  G01N21/95 ,  G01N21/956 ,  G02B21/06 ,  G02B21/10 ,  G02B21/12 ,  H01L21/66

CPC分类号： G02B21/10 ,  G01N21/8806 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/8825 ,  G01N2021/8838 ,  G01N2201/0696 ,  G02B21/125

摘要： The invention relates to a device and method for inspecting an object (2) involving the use of a bright field illumination beam path (4) of a bright field light source (5), said beam path being formed so that it passes through the projection optics (3), and involving the use or a dark field illumination beam path (6) of a dark field light source (7), this beam path being formed so that it also passes through the projection optics (3). The object (2) can be projected by the projection optics (3) onto the least one detector (8), and the object (2) is simultaneously illuminated by both light sources (5, 7). In order to simultaneously detect bright field images and dark field images without involving complicated filtering operations, the inventive device or method for inspecting an object (2) is characterized in that the light used for the dark field illumination is pulsed and in that the pulse intensity of the light used for the dark field illumination is greater by at least one order of magnitude than the intensity of the continuous light, which is used for the bright field illumination, during a pulsed interval.

摘要翻译： 本发明涉及一种用于检查涉及使用明场光源（5）的亮场照明光束路径（4）的物体（2）的装置和方法，所述光束路径被形成为使得其通过突起 光学器件（3），并且涉及暗场光源（7）的使用或暗场照明光束路径（6），该光束路径被形成为使得其也穿过投影光学器件（3）。 物体（2）可以被投影光学器件（3）投影到最少一个检测器（8）上，物体（2）同时被两个光源（5,7）照射。 为了同时检测亮场图像和暗场图像而不涉及复杂的滤波操作，本发明的用于检测物体（2）的装置或方法的特征在于用于暗场照明的光是脉冲的，并且脉冲强度 用于暗场照明的光比在脉冲间隔期间用于亮场照明的连续光的强度至少大一个数量级。