-
公开(公告)号：US08664680B2
公开(公告)日：2014-03-04
申请号：US13350073
申请日：2012-01-13
申请人： Fu-Tien Weng , Chieh-Yuan Cheng , Han-Lin Wu
发明人： Fu-Tien Weng , Chieh-Yuan Cheng , Han-Lin Wu
IPC分类号： H01L33/00 , H01L21/00 , H01L27/146 , H01L31/0216
CPC分类号： H01L27/14621 , G02B5/201 , G02B5/286 , G03F7/0007 , H01L27/14627 , H01L27/14685 , H01L31/02162
摘要： A method for fabricating a color filter structure includes: providing a base layer; forming a first colored layer on the base layer; patterning the first colored layer to form a pair of first colored patterns, a first opening between the first colored patterns, and a second opening adjacent to the first colored patterns; forming a first dielectric layer on the first colored patterns and the base layer exposed by the first and second openings; forming a second colored layer on the first colored patterns and the first dielectric layer; patterning the second colored layer to form a second colored pattern in the first opening; forming a second dielectric layer on the first dielectric layer and the second colored pattern; forming a third colored layer on the second dielectric layer; and patterning the third colored layer to form a third colored pattern in the second opening.
摘要翻译： 一种制造滤色器结构的方法包括：提供基底层; 在基层上形成第一着色层; 图案化第一着色层以形成一对第一着色图案，第一着色图案之间的第一开口和与第一着色图案相邻的第二开口; 在由第一和第二开口暴露的第一着色图案和基底层上形成第一电介质层; 在所述第一着色图案和所述第一介电层上形成第二着色层; 图案化第二着色层以在第一开口中形成第二着色图案; 在所述第一介电层和所述第二着色图案上形成第二电介质层; 在所述第二介电层上形成第三着色层; 以及在第二开口中图案化第三着色层以形成第三着色图案。
-
公开(公告)号：US20130180949A1
公开(公告)日：2013-07-18
申请号：US13350073
申请日：2012-01-13
申请人： Fu-Tien Weng , Chieh-Yuan Cheng , Han-Lin Wu
发明人： Fu-Tien Weng , Chieh-Yuan Cheng , Han-Lin Wu
CPC分类号： H01L27/14621 , G02B5/201 , G02B5/286 , G03F7/0007 , H01L27/14627 , H01L27/14685 , H01L31/02162
摘要： A method for fabricating a color filter structure includes: providing a base layer; forming a first colored layer on the base layer; patterning the first colored layer to form a pair of first colored patterns, a first opening between the first colored patterns, and a second opening adjacent to the first colored patterns; forming a first dielectric layer on the first colored patterns and the base layer exposed by the first and second openings; forming a second colored layer on the first colored patterns and the first dielectric layer; patterning the second colored layer to form a second colored pattern in the first opening; forming a second dielectric layer on the first dielectric layer and the second colored pattern; forming a third colored layer on the second dielectric layer; and patterning the third colored layer to form a third colored pattern in the second opening.
摘要翻译： 一种制造滤色器结构的方法包括：提供基底层; 在基层上形成第一着色层; 图案化第一着色层以形成一对第一着色图案，第一着色图案之间的第一开口和与第一着色图案相邻的第二开口; 在由第一和第二开口暴露的第一着色图案和基底层上形成第一电介质层; 在所述第一着色图案和所述第一介电层上形成第二着色层; 图案化第二着色层以在第一开口中形成第二着色图案; 在所述第一介电层和所述第二着色图案上形成第二电介质层; 在所述第二介电层上形成第三着色层; 以及在第二开口中图案化第三着色层以形成第三着色图案。
-
公开(公告)号：US08630042B2
公开(公告)日：2014-01-14
申请号：US13280975
申请日：2011-10-25
申请人： Han-Lin Wu , Chih-Chiang Ho , Lin-Ya Tseng , Chia-Yang Chang , Kuo-Jung Fu
发明人： Han-Lin Wu , Chih-Chiang Ho , Lin-Ya Tseng , Chia-Yang Chang , Kuo-Jung Fu
CPC分类号： G02B3/0056 , G02B3/0031 , Y10S359/90
摘要： A method for forming a lens assembly is provided, including: providing a mold substrate, wherein at least a recess is formed from a surface of the mold substrate; providing a transparent substrate; disposing a lens precursor material on the surface of the mold substrate or on a first surface of the transparent substrate; disposing the mold substrate on the transparent substrate such that at least a portion of the lens precursor material is filled in the recess; disposing a mask on a second surface of the transparent substrate to partially cover the transparent substrate; after the mask is disposed, irradiating a light on the second surface of the transparent substrate to transform at least a portion of the lens precursor material on the first surface of the transparent substrate into a lens; and removing the mask and the mold substrate from the transparent substrate and the lens.
摘要翻译： 提供了一种用于形成透镜组件的方法，包括：提供模具基板，其中至少一个凹部由模具基板的表面形成; 提供透明基板; 在所述模具基板的表面上或所述透明基板的第一表面上设置透镜前体材料; 将所述模具基板设置在所述透明基板上，使得所述透镜前体材料的至少一部分填充在所述凹部中; 在所述透明基板的第二表面上设置掩模以部分地覆盖所述透明基板; 在掩模设置之后，将光照射在透明基板的第二表面上，以将透明基板的第一表面上的透镜前体材料的至少一部分转换成透镜; 以及从透明基板和透镜去除掩模和模具基板。
-
公开(公告)号：US20050247669A1
公开(公告)日：2005-11-10
申请号：US10841186
申请日：2004-05-07
申请人： Hung-Chun Wang , Ming-Chih Hsieh , Han-Lin Wu
发明人： Hung-Chun Wang , Ming-Chih Hsieh , Han-Lin Wu
IPC分类号： G01L21/30 , G03F1/00 , G03F9/00 , H01L21/302
CPC分类号： G03F1/72
摘要： A method is disclosed for repairing an attenuated phase shift mask. The mask initially has a mask substrate coated with a predetermined shift layer material, a mask pattern layer, and an energy beam resist layer sequentially. After forming a predetermined mask pattern in the mask pattern layer through an energy beam resist layer, the mask is inspected for detecting at least one missing pattern in the mask pattern layer. The predetermined mask pattern is repaired in a predetermined defect area for correcting the missing pattern. After the missing pattern is reformed. The predetermined mask pattern is transferred in the shift layer material.
摘要翻译： 公开了一种修复衰减相移掩模的方法。 掩模最初具有顺序地涂覆有预定移位层材料，掩模图案层和能量束抗蚀剂层的掩模基板。 在通过能量束抗蚀剂层在掩模图案层中形成预定的掩模图案之后，检查掩模以检测掩模图案层中的至少一个缺失图案。 在预定的缺陷区域中修复预定的掩模图案，以校正丢失的图案。 失踪模式被改造之后。 预定的掩模图案被转移到换档层材料中。
-
公开(公告)号：US08072685B1
公开(公告)日：2011-12-06
申请号：US13017445
申请日：2011-01-31
申请人： Han-Lin Wu , Chih-Chiang Ho , Lin-Ya Tseng , Chia-Yang Chang , Kuo-Jung Fu
发明人： Han-Lin Wu , Chih-Chiang Ho , Lin-Ya Tseng , Chia-Yang Chang , Kuo-Jung Fu
IPC分类号： G02B27/10
CPC分类号： G02B3/0056 , G02B3/0031 , Y10S359/90
摘要： A method for forming a lens assembly is provided, including: providing a mold substrate, wherein at least a recess is formed from a surface of the mold substrate; providing a transparent substrate; disposing a lens precursor material on the surface of the mold substrate or on a first surface of the transparent substrate; disposing the mold substrate on the transparent substrate such that at least a portion of the lens precursor material is filled in the recess; disposing a mask on a second surface of the transparent substrate to partially cover the transparent substrate; after the mask is disposed, irradiating a light on the second surface of the transparent substrate to transform at least a portion of the lens precursor material on the first surface of the transparent substrate into a lens; and removing the mask and the mold substrate from the transparent substrate and the lens.
摘要翻译： 提供一种用于形成透镜组件的方法，包括：提供模具基板，其中至少一个凹部由模具基板的表面形成; 提供透明基板; 在所述模具基板的表面上或所述透明基板的第一表面上设置透镜前体材料; 将所述模具基板设置在所述透明基板上，使得所述透镜前体材料的至少一部分填充在所述凹部中; 在所述透明基板的第二表面上设置掩模以部分地覆盖所述透明基板; 在掩模设置之后，将光照射在透明基板的第二表面上，以将透明基板的第一表面上的透镜前体材料的至少一部分转换成透镜; 以及从透明基板和透镜去除掩模和模具基板。
-
公开(公告)号：US07348106B2
公开(公告)日：2008-03-25
申请号：US10841186
申请日：2004-05-07
申请人： Hung-Chun Wang , Ming-Chih Hsieh , Han-Lin Wu
发明人： Hung-Chun Wang , Ming-Chih Hsieh , Han-Lin Wu
CPC分类号： G03F1/72
摘要： A method is disclosed for repairing an attenuated phase shift mask. The mask initially has a mask substrate coated with a predetermined shift layer material, a mask pattern layer, and an energy beam resist layer sequentially. After forming a predetermined mask pattern in the mask pattern layer through an energy beam resist layer, the mask is inspected for detecting at least one missing pattern in the mask pattern layer. The predetermined mask pattern is repaired in a predetermined defect area for correcting the missing pattern. After the missing pattern is reformed. The predetermined mask pattern is transferred in the shift layer material.
摘要翻译： 公开了一种修复衰减相移掩模的方法。 掩模最初具有顺序地涂覆有预定移位层材料，掩模图案层和能量束抗蚀剂层的掩模基板。 在通过能量束抗蚀剂层在掩模图案层中形成预定的掩模图案之后，检查掩模以检测掩模图案层中的至少一个缺失图案。 在预定的缺陷区域中修复预定的掩模图案，以校正丢失的图案。 失踪模式被改造之后。 预定的掩模图案被转移到换档层材料中。
-
-
-
-
-
搜索结果
6 条记录 (耗时 0.023 秒)
