Treatment apparatus for high-precision analysis of impurities in silicic
material
    1.
    发明授权
    Treatment apparatus for high-precision analysis of impurities in silicic material 失效
    用于高精度分析硅材料杂质的处理装置

    公开(公告)号:US5849597A

    公开(公告)日:1998-12-15

    申请号:US769128

    申请日:1996-12-18

    摘要: A treatment apparatus for analyzing the impurities in silicic material with high precision, includes a container having an inner space in which at least one analysis sample container and a sample decomposing solution are accommodated. The container is divided into a lid body and a lower body, each of the lid body and the lower body being opened at the division surface side thereof to form an open end and being closed at the surface side opposite to the division surface side to form a close end thereof. The inner peripheral surface of the open end of the lower body is formed in a stepwise shape so that the analysis sample container is disposed to be spaced from the surface of the decomposing solution which is stocked in the lower body, and the inner peripheral surfaces of the lid body and the lower body are smoothly continuously threadily engaged with each other through abutment faces thereof to keep the container in an appropriate hermetic level. Through the analysis process using the apparatus, the impurities contained in silicic materials used for semiconductor industries in which integration techniques are remarkably developed can be quantitatively analyzed in the order of ppt to obtain silicic products having high reliability.

    摘要翻译: 一种高精度地分析硅质材料中的杂质的处理装置,包括具有至少一个分析用样品容器和样品分解溶液的内部空间的容器。 容器分为盖体和下体,盖体和下体各自在分割面侧开口,形成开口端,与分割面侧相反的表面侧封闭,形成 其结束。 下体的开口端的内周面形成为阶梯状,使得分析用样品容器配置成与储存在下体中的分解溶液的表面间隔开,并且内周面 盖体和下体通过其邻接面平滑地连续地彼此接合,以将容器保持在适当的气密度。 通过使用该装置的分析处理,可以以ppt的顺序对用于半导体工业中用于集成技术显着开发的硅材料中所含的杂质进行定量分析,以获得具有高可靠性的硅产品。