公开(公告)号：US3447218A

公开(公告)日：1969-06-03

申请号：US3447218D

申请日：1966-12-22

Applicant: GEN ELECTRIC

Inventor： WRIGHT ARCHIBALD N ,  MERRILL RICHARD C

IPC: C08F2/46 ,  C08F2/48 ,  H01G4/14 ,  H01G4/18 ,  H01G9/04 ,  H01G13/00

CPC classification number: H01G4/186 ,  C08F2/46 ,  H01G4/145 ,  Y10T29/435

公开(公告)号：US3665269A

公开(公告)日：1972-05-23

申请号：US3665269D

申请日：1969-12-29

Applicant: GEN ELECTRIC

Inventor： WRIGHT ARCHIBALD N ,  MERRILL RICHARD C

IPC: B05D3/06 ,  H01G4/14 ,  H01G1/00

CPC classification number: H01G4/145 ,  B05D3/06 ,  Y10T29/435

Abstract: Capacitors are provided having a first metal substrate, a dielectric film on such substrate and a second electrode on the dielectric film which is made by the photopolymerization of certain photopolymerizable organic materials in vaporous form.

公开(公告)号：US3521339A

公开(公告)日：1970-07-21

申请号：US3521339D

申请日：1969-04-01

Applicant: GEN ELECTRIC

Inventor： WRIGHT ARCHIBALD N ,  MERRILL RICHARD C

IPC: B05D3/06 ,  B05D7/24 ,  C08F2/48 ,  H01G4/14 ,  H01G4/18 ,  H01G13/00

CPC classification number: B05D1/60 ,  B05D3/067 ,  C08F2/48 ,  H01G4/145 ,  H01G4/186 ,  Y10T29/435

公开(公告)号：US3664899A

公开(公告)日：1972-05-23

申请号：US3664899D

申请日：1969-12-29

Applicant: GEN ELECTRIC

Inventor： WRIGHT ARCHIBALD N ,  MERRILL RICHARD C

IPC: G03F7/42 ,  H01L21/00 ,  H01L21/311 ,  H01L49/02 ,  B29C17/08 ,  C23B3/04

CPC classification number: H01L21/00 ,  G03F7/42 ,  H01L21/31138 ,  H01L49/02

Abstract: A solvent free method for removing thin organic polymeric film from a substrate is provided utilizing ultraviolet light at wavelengths below 3,500 Angstroms. The method also can be employed to effect the direct configurational removal of organic polymeric film from etchable substrates to provide for the fabrication of microelectronic circuits.

Abstract translation: 使用波长低于3500埃的紫外线提供了从基片去除薄的有机聚合物膜的无溶剂方法。 该方法也可用于实现有机聚合物膜从可蚀刻基材的直接构造去除以提供微电子电路的制造。