公开(公告)号：US20240405502A1

公开(公告)日：2024-12-05

申请号：US18807455

申请日：2024-08-16

Applicant: Gigaphoton Inc.

Inventor： Kazuhiro SUZUKI ,  Hiroshi TANAKA

IPC: H01S3/10 ,  G03F7/20 ,  H01S3/13

Abstract: A laser apparatus includes: a laser oscillator including a wavelength adjuster and configured to output pulse laser light having a center wavelength adjusted by the wavelength adjuster; a spectrum monitor configured to generate data on a spectrum of the pulse laser light; and a processor configured to control the wavelength adjuster in such a way that the center wavelength of the pulse laser light changes in accordance with a target wavelength that periodically changes to each of multiple values including first and second wavelengths, calculate a first spectral linewidth from data on spectra of multiple pulses each having the first wavelength as the target wavelength, and calculate a second spectral linewidth from data on spectra of multiple pulses each having the second wavelength as the target wavelength.

公开(公告)号：US20150342015A1

公开(公告)日：2015-11-26

申请号：US14814983

申请日：2015-07-31

Applicant: GIGAPHOTON INC.

Inventor： Hideyuki HAYASHI ,  Kazuhiro SUZUKI ,  Osamu WAKABAYASHI

IPC: H05G2/00 ,  H01S3/00

CPC classification number: H05G2/008 ,  H01S3/005 ,  H01S3/10015 ,  H01S3/10038 ,  H01S3/2316 ,  H05G2/006

Abstract: An extreme ultraviolet light generation apparatus may include a chamber containing a plasma generation region irradiated by a pulse laser beam from a laser apparatus, a target supply device configured to supply a plurality of targets consecutively to the plasma generation region in the chamber, a target detection unit configured to detect a target outputted from the target supply device, and a laser controller configured to control the laser apparatus; the laser controller generating a light emission trigger instructing a laser device included in the laser apparatus to emit a pulse laser beam, and outputting the generated light emission trigger to the laser apparatus, in accordance with a detection signal from the target detection unit; and the laser controller adjusting generation of the light emission trigger outputted consecutively to the laser apparatus so that a time interval of the light emission trigger is within a predetermined range.

Abstract translation: 极紫外线发生装置可以包括：包含由来自激光装置的脉冲激光束照射的等离子体产生区域的室，被配置为连续地向室内的等离子体产生区域供给多个目标的目标供给装置，目标检测 被配置为检测从目标供给装置输出的目标的单元，以及被配置为控制所述激光装置的激光控制器; 所述激光控制器生成指示所述激光装置所具备的激光装置发射脉冲激光束的发光触发器，并且根据来自所述目标检测部的检测信号将所生成的发光触发信号输出到所述激光装置; 并且所述激光控制器调整所述发光触发器的产生，连续输出到所述激光装置，使得所述发光触发的时间间隔在预定范围内。

公开(公告)号：US20140353528A1

公开(公告)日：2014-12-04

申请号：US14290483

申请日：2014-05-29

Applicant: GIGAPHOTON INC.

Inventor： Hideyuki HAYASHI ,  Kazuhiro SUZUKI ,  Osamu WAKABAYASHI

IPC: H05G2/00 ,  H01S3/11

CPC classification number: H05G2/008 ,  H01S3/005 ,  H01S3/10015 ,  H01S3/10038 ,  H01S3/2316 ,  H05G2/006

Abstract: An extreme ultraviolet light generation apparatus may include a chamber containing a plasma generation region irradiated by a pulse laser beam from a laser apparatus, a target supply device configured to supply a plurality of targets consecutively to the plasma generation region in the chamber, a target detection unit configured to detect a target outputted from the target supply device, and a laser controller configured to control the laser apparatus; the laser controller generating a light emission trigger instructing a laser device included in the laser apparatus to emit a pulse laser beam, and outputting the generated light emission trigger to the laser apparatus, in accordance with a detection signal from the target detection unit; and the laser controller adjusting generation of the light emission trigger outputted consecutively to the laser apparatus so that a time interval of the light emission trigger is within a predetermined range.

Abstract translation: 极紫外线发生装置可以包括：包含由来自激光装置的脉冲激光束照射的等离子体产生区域的室，被配置为连续地向室内的等离子体产生区域供给多个目标的目标供给装置，目标检测 被配置为检测从目标供给装置输出的目标的单元，以及被配置为控制所述激光装置的激光控制器; 所述激光控制器生成指示所述激光装置所具备的激光装置发射脉冲激光束的发光触发器，并且根据来自所述目标检测部的检测信号将所生成的发光触发信号输出到所述激光装置; 并且所述激光控制器调整所述发光触发器的产生，连续输出到所述激光装置，使得所述发光触发的时间间隔在预定范围内。

公开(公告)号：US20140098830A1

公开(公告)日：2014-04-10

申请号：US14047753

申请日：2013-10-07

Applicant: Gigaphoton Inc.

Inventor： Takayuki YABU ,  Takashi SAITO ,  Hideyuki HAYASHI ,  Kazuhiro SUZUKI ,  Hiroaki NAKARAI

IPC: H01S3/00

CPC classification number: H01S3/0085 ,  H01S3/005 ,  H01S3/2391 ,  H05G2/005 ,  H05G2/008

Abstract: An extreme ultraviolet light generation system may include an optical device configured to cause an optical path of a pulse laser beam to approximately match one of a first optical path in which the pulse laser beam is focused at a plasma generation region and a second optical path in which the pulse laser beam passes outside the plasma generation region, and a control unit configured to output a control signal to the optical device so that the optical device sets the optical path of the pulse laser beam to the second optical path from when a predetermined time starts to when the number of pulses contained in a timing signal reaches a predetermined value and sets the optical path of the pulse laser beam to the first optical path from when the number of pulses reaches the predetermined value to when the predetermined time ends.

Abstract translation: 极紫外光发生系统可以包括光学装置，其被配置为使脉冲激光束的光路近似地匹配脉冲激光束在等离子体产生区域聚焦的第一光路中的一个和第二光路中的第二光路 脉冲激光束通过等离子体产生区域以外的控制单元，以及控制单元，其配置为向光学装置输出控制信号，使得光学装置将脉冲激光束的光路从预定时间设定为第二光路 开始于当定时信号中包含的脉冲数达到预定值并且将脉冲激光束的光路从脉冲数达到预定值到当预定时间结束时设置为第一光路。