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公开(公告)号：US20180007771A1
公开(公告)日：2018-01-04
申请号：US15697915
申请日：2017-09-07
Applicant: Gigaphoton Inc.
Inventor： Kouichi SATOU , Takayuki YABU , Yoshifumi UENO , Hirokazu HOSODA
CPC classification number: H05G2/008 , G21K2201/06 , H01S3/10 , H05G2/005 , H05G2/006
Abstract: The stability of operations of an EUV light generating apparatus is improved. A droplet detector may include: a light source unit configured to emit illuminating light onto a droplet, which is output into a chamber and generate extreme ultraviolet light when irradiated with a laser beam; a light receiving unit configured to receive the illuminating light and to detect changes in light intensities; and a timing determining circuit configured to output a droplet detection signal that indicates that the droplet has been detected at a predetermined position within the chamber, based on a first timing at which the light intensity of the illuminating light decreases due to the droplet being irradiated therewith and a second timing at which the light intensity of the illuminating light increases.
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公开(公告)号：US20160037616A1
公开(公告)日：2016-02-04
申请号：US14879754
申请日：2015-10-09
Applicant: Gigaphoton Inc.
Inventor： Takashi SAITO , Fumio IWAMOTO , Osamu WAKABAYASHI , Takayuki YABU
IPC: H05G2/00
Abstract: An extreme ultraviolet light generation apparatus includes a target supplier configured to output a target into a chamber as a droplet, the target generating extreme ultraviolet light when being irradiated with a laser beam in the chamber; a droplet measurement unit configured to measure a parameter for a state of the droplet outputted into the chamber; a pressure regulator configured to regulate a pressure in the target supplier in which the target is accommodated; and a target generation controller configured to control the pressure regulator, based on the parameter measured by the droplet measurement unit.
Abstract translation: 一种极紫外光发生装置，具备将目标物作为液滴输出到室内的目标供给装置，在所述室内照射激光时产生极紫外光; 液滴测量单元，被配置为测量输出到所述室中的液滴的状态的参数; 压力调节器，被配置为调节所述目标供应器中容纳所述目标的压力; 以及目标产生控制器，其被配置为基于由所述液滴测量单元测量的参数来控制所述压力调节器。
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公开(公告)号：US20240186760A1
公开(公告)日：2024-06-06
申请号：US18402829
申请日：2024-01-03
Applicant: Gigaphoton Inc.
Inventor： Takayuki YABU , Taisuke MIURA
CPC classification number: H01S3/10092 , G02F1/3507 , G03F7/70025 , G03F7/70191 , G03F7/70525 , H01S3/094076 , H01S3/1024 , H01S3/108 , H01S3/1625 , H01S3/1636 , G02F1/3534
Abstract: A laser apparatus includes a first seed laser outputting continuous-wave first seed laser light having a first wavelength, a second seed laser outputting continuous-wave second seed laser light having a second wavelength, an optical switch sequentially selecting the first seed laser light and the second seed laser light one at a time and outputting the selected seed laser light, a first pulsing section pulsing the selected laser light and outputting first pulse laser light, a wavelength converter outputting output laser light by using the first pulse laser light, and a processor controlling a timing of sequentially selecting the first seed laser light and the second seed laser light one at a time. The wavelength converter outputs the output laser light having a first converted wavelength produced using the first wavelength, and outputs the output laser light having a second converted wavelength produced using the second wavelength.
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公开(公告)号：US20180284617A1
公开(公告)日：2018-10-04
申请号：US16001239
申请日：2018-06-06
Applicant: Gigaphoton Inc.
Inventor： Yuichi NISHIMURA , Takayuki YABU , Yoshifumi UENO
CPC classification number: G03F7/70033 , H05G2/005 , H05G2/008
Abstract: An extreme ultraviolet light generation device includes: an EUV sensor configured to measure energy of extreme ultraviolet light generated when a target is irradiated with a plurality of laser beams in a predetermined region in a chamber; an irradiation position adjustment unit configured to adjust at least one of irradiation positions of the laser beams with which the target is irradiated in the predetermined region; an irradiation timing adjustment unit configured to adjust at least one of irradiation timings of the laser beams with which the target is irradiated in the predetermined region; and a control unit configured to control the irradiation position adjustment unit and the irradiation timing adjustment unit, the control unit controlling the irradiation position adjustment unit and then controlling the irradiation timing adjustment unit based on a measurement result of the EUV sensor.
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公开(公告)号：US20180224746A1
公开(公告)日：2018-08-09
申请号：US15941858
申请日：2018-03-30
Applicant: Gigaphoton Inc.
Inventor： Takayuki YABU
CPC classification number: G03F7/70033 , G03F7/20 , G21K1/062 , H05G2/00 , H05G2/008
Abstract: An extreme ultraviolet light generating device may include a chamber in which extreme ultraviolet light is generated from a target supplied to a generation region, a focusing mirror configured to reflect the extreme ultraviolet light by a reflection surface and focus the light at a focal point, a light source unit configured to output illumination light, and a light receiving unit configured to receive reflected light from the target. The reflection surface may be formed in a spheroidal face that defines a first focus at the generation region and a second focus at the focal point. Assuming that a surface formed when an extended line, on the first focus side, of a line segment linking the outer peripheral edge of the reflection surface and the first focus is rotated about an axis passing through the first focus and the second focus is a first limit surface, and a surface formed when the line segment and an extended line on the outer peripheral side are rotated about the axis is a second limit surface, the light source unit and the light receiving unit may be disposed such that at least one of an optical path of the illumination light and an optical path of the reflected light passes through the first focus and is included between the first limit surface and the second limit surface.
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Patent Agency Ranking
6.发明申请公开(公告)号：US20170171955A1
公开(公告)日：2017-06-15
申请号：US15430737
申请日：2017-02-13
Applicant: GIGAPHOTON INC.
Inventor： Yoshifumi UENO , Hirokazu HOSODA , Takayuki YABU
IPC: H05G2/00 , H01S3/10 , H05H1/24 , H01L21/027
CPC classification number: H05G2/008 , G03F7/70033 , H01L21/027 , H01S3/10061 , H05G2/003 , H05G2/006 , H05H1/24 , H05H15/00
Abstract: An extreme ultraviolet light generation system may include a laser system and a controller. The laser system may irradiate the first target with a first pulse laser beam to disperse the first target and produce a mist target, and irradiate the mist target with a second pulse laser beam. The controller may measure a mist diameter of the mist target and control, based on the mist diameter, at least one of time to emit the second pulse laser beam and energy of a first pulse laser beam to be used to irradiate the second target.
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公开(公告)号：US20140034759A1
公开(公告)日：2014-02-06
申请号：US13953350
申请日：2013-07-29
Applicant: GIGAPHOTON INC.
Inventor： Takayuki YABU , Tamotsu ABE
IPC: G03F7/20
CPC classification number: G03F7/2004 , B05B5/0255 , B05B5/0531 , B05B12/02 , G03F7/70033 , H05G2/003
Abstract: A target supply method uses a target supply device that includes a target generation unit having a nozzle, a pressure control unit having a pressure sensor and an actuator, an electrode, a potential application unit, and a timer; further, the method include raising the pressure inside the target generation unit to a setting pressure by the actuator, applying different potentials to the electrode and a target material from each other by the potential application unit in the case where it is detected that the pressure inside the target generation unit is halfway raised to the setting pressure, and applying a constant first potential to the target material and a first pulse voltage to the electrode by the potential application unit to extract the target material with electrostatic force in the case where it is detected that the pressure inside the target generation unit has been raised to the setting pressure.
Abstract translation: 目标供给方法使用包括具有喷嘴的目标产生单元，具有压力传感器和致动器的压力控制单元，电极，潜在施加单元和定时器的目标供给装置; 此外，该方法包括：通过致动器将目标产生单元内的压力升高到设定压力，在检测到内部的压力的情况下，通过潜在施加单元在电极和目标材料之间施加不同的电位 目标产生单元中途升高到设定压力，并且通过潜在施加单元向目标材料施加恒定的第一电位和第一脉冲电压，以在检测到的情况下用静电力提取目标材料 目标产生单元内的压力已升至设定压力。
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公开(公告)号：US20130209077A1
公开(公告)日：2013-08-15
申请号：US13753324
申请日：2013-01-29
Applicant: Gigaphoton Inc.
Inventor： Takayuki YABU , Osamu WAKABAYASHI
IPC: F24H1/00
CPC classification number: F24H1/0018 , H05G2/005 , H05G2/006 , H05G2/008
Abstract: A target supply apparatus used in an extreme ultraviolet light apparatus that generates extreme ultraviolet light by irradiating a target with a laser beam may include a tank, a nozzle that includes a through-hole and is disposed so that the through-hole communicates with the interior of the tank, a first heater disposed along a wall of the tank, a second heater disposed along a wall of the tank in a position that is further from the nozzle than the first heater, and a control unit configured to control the first heater and the second heater so that a temperature of the first heater is greater than a temperature of the second heater.
Abstract translation: 在通过用激光束照射目标物而产生极紫外光的极紫外光装置中使用的目标供给装置可以包括：罐，包括通孔并且设置成使得通孔与内部连通的喷嘴 所述第一加热器沿着所述罐的壁布置，所述第二加热器沿着所述罐的壁布置在比所述第一加热器更远离所述喷嘴的位置，以及控制单元，其被配置为控制所述第一加热器和 所述第二加热器使得所述第一加热器的温度大于所述第二加热器的温度。
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公开(公告)号：US20220232690A1
公开(公告)日：2022-07-21
申请号：US17457342
申请日：2021-12-02
Applicant: Gigaphoton Inc.
Inventor： Yuichi NISHIMURA , Takayuki YABU , Hiroaki NAKARAI
Abstract: An extreme ultraviolet light generation system includes a target supply unit configured to supply a target substance to a first predetermined region, a laser system configured to output pulse laser light to be radiated to the target substance in the first predetermined region, a first sensor configured to detect an arrival timing at which the target substance has reached a second predetermined region between the target supply unit and the first predetermined region, an optical adjuster arranged on an optical path of the pulse laser light between the laser system and the first predetermined region, and a processor configured to control transmittance of the pulse laser light through the optical adjuster based on the arrival timing.
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公开(公告)号：US20220110205A1
公开(公告)日：2022-04-07
申请号：US17468395
申请日：2021-09-07
Applicant: Gigaphoton Inc.
Inventor： Takayuki YABU , Yoshifumi UENO
Abstract: An extreme ultraviolet light generation system may include a laser device configured to emit pulse laser light, an EUV light concentrating mirror configured to reflect and concentrate extreme ultraviolet light generated by irradiating a target with the pulse laser light, and a processor configured to receive a first energy parameter of the extreme ultraviolet light and control an irradiation frequency of the pulse laser light with which the target is irradiated so that change in a second energy parameter related to energy per unit time of the extreme ultraviolet light reflected by the EUV light concentrating mirror is suppressed.
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