公开(公告)号：US09551696B2

公开(公告)日：2017-01-24

申请号：US14311380

申请日：2014-06-23

Applicant: GLOBALFOUNDRIES INC.

Inventor： Mark S. Chace ,  Martin Glodde ,  Margaret C. Lawson ,  Janine L. Protzman ,  Qin Yuan

IPC: B08B7/04 ,  G01N21/00 ,  G03F7/42 ,  G01N33/44 ,  G03F7/20 ,  B08B7/00

CPC classification number: G01N33/44 ,  B08B7/00 ,  B08B7/0035 ,  B08B7/04 ,  G01N1/44 ,  G03F7/70916

Abstract: A method of testing the cleanability of polymerized sublimate outgassed from a lithography material during a thermal heating process including; placing a wafer on a wafer hotplate inside a chamber with the wafer being covered by a lithography material; placing a target, having a starting composition, above the wafer in the chamber; heating the wafer using the wafer hotplate in an attempt to outgas a sublimate, where the sublimate condenses on the target; forming a polymerized sublimate on the target; and applying organic solvents to the target to determine the cleanability of the polymerized sublimate.

Abstract translation: 一种在热加热过程中测试从光刻材料脱气的聚合升华物的可清洁性的方法，包括： 将晶片放置在室内的晶片加热板上，晶片被光刻材料覆盖; 将具有起始组成的靶放置在所述腔中的所述晶片之上; 使用晶片加热板加热晶片以试图排出升华，其中升华在目标上冷凝; 在目标上形成聚合的升华; 并向目标物施加有机溶剂以确定聚合的升华物的可清洁性。