公开(公告)号：US20160162626A1

公开(公告)日：2016-06-09

申请号：US15042779

申请日：2016-02-12

Applicant: GLOBALFOUNDRIES Inc.

Inventor： Thomas Herrmann ,  Stefan Schueler ,  Aravind Narayana Samy

IPC: G06F17/50

CPC classification number: G06F17/5081 ,  G03F1/36 ,  G03F1/70 ,  G03F7/70441 ,  G03F7/705 ,  G03F7/70641 ,  G06F17/5009

Abstract: A method of manufacturing a semiconductor device, comprising providing design data, producing lithography masks based on the design data, predicting a product process window and producing a wafer including semiconductor structures by means of the lithography masks and observing conditions defined by the product process window.

Abstract translation: 一种制造半导体器件的方法，包括提供设计数据，基于设计数据产生光刻掩模，预测产品工艺窗口，并通过光刻掩模和由产品工艺窗口定义的观察条件来生产包括半导体结构的晶片。

公开(公告)号：US20160154922A1

公开(公告)日：2016-06-02

申请号：US14556711

申请日：2014-12-01

Applicant: GLOBALFOUNDRIES Inc.

Inventor： Rakesh Kumar Kuncha ,  Aravind Narayana Samy

IPC: G06F17/50 ,  G03F1/36

CPC classification number: G03F1/36 ,  G03F1/70 ,  G03F7/70441 ,  G03F7/705 ,  G03F7/70641

Abstract: A method of manufacturing semiconductor devices employing optical proximity correction (OPC) is provided including providing a design layout of masks, performing OPC on the design layout to obtain a post OPC layout, performing post chemical mechanical polishing (CMP) topography simulations of a wafer to obtain the surface topography of the wafer, calculating a focus shift of a nominal focus caused by the surface topography of the wafer to obtain a shifted nominal focus, determining a process window based on the shifted nominal focus, simulating a nominal image based on the post OPC layout and the shifted nominal focus and process window images based on the post OPC layout and the process window, and identifying hotspots based on the simulated nominal and process window images.

Abstract translation: 提供一种制造采用光学邻近校正（OPC）的半导体器件的方法，包括提供掩模的设计布局，在设计布局上执行OPC以获得后OPC布局，执行晶片的后化学机械抛光（CMP）形貌模拟 获得晶片的表面形貌，计算由晶片的表面形貌引起的标称焦点的聚焦偏移以获得移动的标称焦点，基于偏移的标称焦点确定处理窗口，基于该信息模拟标称图像 OPC布局和基于OPC后布局和过程窗口的移动的标称焦点和过程窗口图像，以及基于模拟的名义和过程窗口图像来识别热点。