公开(公告)号：US09142513B2

公开(公告)日：2015-09-22

申请号：US14645598

申请日：2015-03-12

Applicant: GLOBALFOUNDRIES Inc.

Inventor： Mahbub Rashed ,  Yuansheng Ma ,  Irene Lin ,  Jason Stephens ,  Yunfei Deng ,  Yuan Lei ,  Jongwook K E ,  Roderick Augur ,  Shibly Ahmed ,  Subramani Kengeri ,  Suresh Venkatesan

IPC: H01L23/538 ,  H01L29/78 ,  H01L27/092 ,  H01L27/02

CPC classification number: H01L23/5386 ,  H01L21/76895 ,  H01L21/823871 ,  H01L23/5384 ,  H01L27/0207 ,  H01L27/0924 ,  H01L29/7851 ,  H01L2924/0002 ,  H01L2924/00

Abstract: An approach for providing MOL constructs using diffusion contact structures is disclosed. Embodiments include: providing a first diffusion region in a substrate; providing, via a first lithography process, a first diffusion contact structure; providing, via a second lithography process, a second diffusion contact structure; and coupling the first diffusion contact structure to the first diffusion region and the second diffusion contact structure. Embodiments include: providing a second diffusion region in the substrate; providing a diffusion gap region between the first and second diffusion regions; providing the diffusion contact structure over the diffusion gap region; and coupling, via the diffusion contact structure, the first and second diffusion regions.

公开(公告)号：US09519745B2

公开(公告)日：2016-12-13

申请号：US14523558

申请日：2014-10-24

Applicant: GLOBALFOUNDRIES Inc.

Inventor： Lei Yuan ,  Irene Lin ,  Jongwook Kye ,  Mahbub Rashed

IPC: G06F17/50

CPC classification number: G06F17/5081 ,  G06F17/5077 ,  Y02T10/82

Abstract: A method and apparatus for an assisted metal routing is disclosed. Embodiments may include: determining an initial block mask having a first inner vertex for forming a metal routing layer of an integrated circuit (IC); adding an assistant metal portion within the metal routing layer; and determining a modified block mask based on the assistant metal portion for forming the metal routing layer.

Abstract translation: 公开了一种用于辅助金属布线的方法和装置。 实施例可以包括：确定具有用于形成集成电路（IC）的金属布线层的第一内部顶点的初始块掩码; 在所述金属布线层内添加辅助金属部分; 以及基于用于形成金属布线层的辅助金属部分确定修改的块掩模。