公开(公告)号：US20150325473A1

公开(公告)日：2015-11-12

申请号：US14275448

申请日：2014-05-12

Applicant: GLOBALFOUNDRIES Inc.

Inventor： Hiroaki NIIMI ,  Kisik CHOI ,  Hoon KIM ,  Andy WEI ,  Guillaume BOUCHE

IPC: H01L21/768 ,  H01L23/522

CPC classification number: H01L23/535 ,  H01L21/285 ,  H01L21/28568 ,  H01L21/76802 ,  H01L21/76831 ,  H01L21/76843 ,  H01L21/76855 ,  H01L21/823431 ,  H01L21/823821 ,  H01L23/485 ,  H01L23/5226 ,  H01L23/53266 ,  H01L27/0886 ,  H01L27/0924 ,  H01L2221/1063 ,  H01L2924/0002 ,  H01L2924/00

Abstract: Devices and methods for forming semiconductor devices with metal-titanium oxide contacts are provided. One intermediate semiconductor device includes, for instance: a substrate, at least one field-effect transistor disposed on the substrate, a first contact region positioned over at least a first portion of the at least one field-effect transistor between a spacer and an interlayer dielectric, and a second contact region positioned over at least a second portion of the at least one field-effect transistor between a spacer and an interlayer dielectric. One method includes, for instance: obtaining an intermediate semiconductor device and forming at least one contact on the intermediate semiconductor device.

Abstract translation: 提供了用金属 - 氧化钛触点形成半导体器件的器件和方法。 一个中间半导体器件包括例如：衬底，设置在衬底上的至少一个场效应晶体管，位于至少一个场效应晶体管的至少第一部分之间的第一接触区域，位于间隔物和中间层之间 电介质和位于至少一个场效应晶体管的至少一个第二部分之间的第二接触区域在间隔物和层间电介质之间。 一种方法包括例如获得中间半导体器件并在中间半导体器件上形成至少一个接触。

公开(公告)号：US20160079168A1

公开(公告)日：2016-03-17

申请号：US14947259

申请日：2015-11-20

Applicant: GLOBALFOUNDRIES INC.

Inventor： Hiroaki NIIMI ,  Kisik CHOI ,  Hoon KIM ,  Andy WEI ,  Guillaume BOUCHE

IPC: H01L23/535

CPC classification number: H01L23/535 ,  H01L21/285 ,  H01L21/28568 ,  H01L21/76802 ,  H01L21/76831 ,  H01L21/76843 ,  H01L21/76855 ,  H01L21/823431 ,  H01L21/823821 ,  H01L23/485 ,  H01L23/5226 ,  H01L23/53266 ,  H01L27/0886 ,  H01L27/0924 ,  H01L2221/1063 ,  H01L2924/0002 ,  H01L2924/00

Abstract: Devices and methods for forming semiconductor devices with metal-titanium oxide contacts are provided. One intermediate semiconductor device includes, for instance: a substrate, at least one field-effect transistor disposed on the substrate, a first contact region positioned over at least a first portion of the at least one field-effect transistor between a spacer and an interlayer dielectric, and a second contact region positioned over at least a second portion of the at least one field-effect transistor between a spacer and an interlayer dielectric. One method includes, for instance: obtaining an intermediate semiconductor device and forming at least one contact on the intermediate semiconductor device.