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公开(公告)号:US07026657B2
公开(公告)日:2006-04-11
申请号:US10258154
申请日:2001-04-19
申请人: Georg Bogner , Siegmar Kugler , Ernst Nirschl , Raimund Oberschmid , Karl-Heinz Schlereth , Olaf Schoenfeld , Norbert Stath , Gerald Neumann
发明人: Georg Bogner , Siegmar Kugler , Ernst Nirschl , Raimund Oberschmid , Karl-Heinz Schlereth , Olaf Schoenfeld , Norbert Stath , Gerald Neumann
CPC分类号: H01L33/20 , H01L33/02 , H01L33/08 , H01L33/145 , H01L33/44 , H01L2224/16225
摘要: The invention concerns a light-emitting diode chip (1) comprising a radiation-emitting active region (32) and a window layer (2). To increase the luminous efficiency, the cross-sectional area of the radiation-emitting active region (32) is smaller than the cross-sectional area of the window layer (2) available for the decoupling of light.The invention is further directed to a method for fabricating a lens structure on the surface of a light-emitting component.
摘要翻译: 本发明涉及一种包括发射辐射有源区(32)和窗口层(2)的发光二极管芯片(1)。 为了提高发光效率,发射有源区域(32)的横截面面积小于可用于解耦光的窗口层(2)的横截面面积。 本发明还涉及一种用于在发光部件的表面上制造透镜结构的方法。
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公开(公告)号:US07306960B2
公开(公告)日:2007-12-11
申请号:US11311809
申请日:2005-12-19
申请人: Georg Bogner , Siegmar Kugler , Ernst Nirschl , Raimund Oberschmid , Karl-Heinz Schlereth , Olaf Schoenfeld , Norbert Stath , Gerald Neumann
发明人: Georg Bogner , Siegmar Kugler , Ernst Nirschl , Raimund Oberschmid , Karl-Heinz Schlereth , Olaf Schoenfeld , Norbert Stath , Gerald Neumann
IPC分类号: H01L21/00
CPC分类号: H01L33/20 , H01L33/02 , H01L33/08 , H01L33/145 , H01L33/44 , H01L2224/16225
摘要: The invention concerns a light-emitting diode chip comprising a radiation-emitting active region and a window layer. To increase the luminous efficiency, the cross-sectional area of the radiation-emitting active region is smaller than the cross-sectional area of the window layer available for the decoupling of light.The invention is further directed to a method for fabricating a lens structure on the surface of a light-emitting component.
摘要翻译: 本发明涉及包括发射有辐射的有源区和窗口层的发光二极管芯片。 为了提高发光效率,发射有源区域的横截面面积小于可用于解耦光的窗口层的横截面面积。 本发明还涉及一种用于在发光部件的表面上制造透镜结构的方法。
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公开(公告)号:US20060138439A1
公开(公告)日:2006-06-29
申请号:US11311809
申请日:2005-12-19
申请人: Georg Bogner , Siegmar Kugler , Ernst Nirschl , Raimund Oberschmid , Karl-Heinz Schlereth , Olaf Schoenfeld , Norbert Stath , Gerald Neumann
发明人: Georg Bogner , Siegmar Kugler , Ernst Nirschl , Raimund Oberschmid , Karl-Heinz Schlereth , Olaf Schoenfeld , Norbert Stath , Gerald Neumann
IPC分类号: H01L33/00
CPC分类号: H01L33/20 , H01L33/02 , H01L33/08 , H01L33/145 , H01L33/44 , H01L2224/16225
摘要: The invention concerns a light-emitting diode chip comprising a radiation-emitting active region and a window layer. To increase the luminous efficiency, the cross-sectional area of the radiation-emitting active region is smaller than the cross-sectional area of the window layer available for the decoupling of light. The invention is further directed to a method for fabricating a lens structure on the surface of a light-emitting component.
摘要翻译: 本发明涉及包括发射有辐射的有源区和窗口层的发光二极管芯片。 为了提高发光效率,发射有源区域的横截面面积小于可用于解耦光的窗口层的横截面面积。 本发明还涉及一种用于在发光部件的表面上制造透镜结构的方法。
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公开(公告)号:US20070090396A1
公开(公告)日:2007-04-26
申请号:US11541089
申请日:2006-09-28
IPC分类号: H01L31/00
CPC分类号: H01L33/04 , H01L21/02395 , H01L21/02461 , H01L21/02463 , H01L21/02505 , H01L21/02507 , H01L21/02543 , H01L21/02546 , H01L33/025 , H01L33/30
摘要: A semiconductor substrate (1) of GaAs with a semiconductor layer sequence (2) applied on top. The semiconductor layer sequence (2) contains a plurality of semiconductor layers (3, 4, 5, 6, 7) of Al1−yGayAs1−xPx with 0≦x≦1 and 0≦y≦1, the phosphorus component x in a number of the semiconductor layers respectively being greater than in a neighboring semiconductor layer lying thereunder in the direction of growth. Such a semiconductor substrate may be advantageously used as a quasi-substrate substrate (8) for growing further semiconductor layers (28) which have a smaller lattice constant than GaAs.
摘要翻译: 具有半导体层序列(2)的GaAs的半导体衬底(1)施加在顶部。 半导体层序列(2)包含多个Al 1-y Ga y As 1的半导体层(3,4,5,6,7) -x sub> Px,其中0 <= x <= 1且0 <= y <= 1,多个半导体层中的磷成分x分别大于在其下方的相邻半导体层中在 成长。 这种半导体衬底可以有利地用作准衬底基板(8),用于生长具有比GaAs更小的晶格常数的其它半导体层(28)。
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公开(公告)号:US20100065890A1
公开(公告)日:2010-03-18
申请号:US12621854
申请日:2009-11-19
IPC分类号: H01L29/205 , H01L33/00 , H01L31/0304
CPC分类号: H01L33/04 , H01L21/02395 , H01L21/02461 , H01L21/02463 , H01L21/02505 , H01L21/02507 , H01L21/02543 , H01L21/02546 , H01L33/025 , H01L33/30
摘要: A semiconductor substrate, of GaAs with a semiconductor layer sequence applied on top of the substrate. The semiconductor layer sequence comprises a plurality of semiconductor layers of Al1-yGayAs1-xPx with 0≦x≦1 and 0≦y≦1. A number of the semiconductor layers respectively comprising a phosphorus component x which is greater than in a neighboring semiconductor layer lying thereunder in the direction of growth of the semiconductor layer sequence. Two semiconductor layers directly preceding the uppermost semiconductor layer of the semiconductor layer sequence have a smaller lattice constant than the uppermost layer.
摘要翻译: 半导体衬底,具有施加在衬底顶部上的半导体层序列的GaAs。 半导体层序列包括多个半导体层Al1-yGayAs1-xPx,其具有0和nlE; x和nlE; 1和0&nlE; y&nlE; 1。 多个半导体层分别包括在半导体层序列的生长方向上位于其下的相邻半导体层中的磷成分x大于其中的相邻半导体层。 直接在半导体层序列的最上半导体层之前的两个半导体层具有比最上层更小的晶格常数。
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公开(公告)号:US07875961B2
公开(公告)日:2011-01-25
申请号:US12621854
申请日:2009-11-19
IPC分类号: H01L21/02 , H01L29/66 , H01L31/102 , H01L33/00
CPC分类号: H01L33/04 , H01L21/02395 , H01L21/02461 , H01L21/02463 , H01L21/02505 , H01L21/02507 , H01L21/02543 , H01L21/02546 , H01L33/025 , H01L33/30
摘要: A semiconductor substrate, of GaAs with a semiconductor layer sequence applied on top of the substrate. The semiconductor layer sequence comprises a plurality of semiconductor layers of Al1-yGayAs1-xPx with 0≦x≦1 and 0≦y≦1. A number of the semiconductor layers respectively comprising a phosphorus component x which is greater than in a neighboring semiconductor layer lying thereunder in the direction of growth of the semiconductor layer sequence. Two semiconductor layers directly preceding the uppermost semiconductor layer of the semiconductor layer sequence have a smaller lattice constant than the uppermost layer.
摘要翻译: 半导体衬底,具有施加在衬底顶部上的半导体层序列的GaAs。 半导体层序列包括多个半导体层Al1-yGayAs1-xPx,其具有0和nlE; x和nlE; 1和0&nlE; y&nlE; 1。 多个半导体层分别包含在半导体层序列的生长方向上位于其下的相邻半导体层中的磷成分x大于其的相邻半导体层。 直接在半导体层序列的最上半导体层之前的两个半导体层具有比最上层更小的晶格常数。
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