公开(公告)号：US20110163247A1

公开(公告)日：2011-07-07

申请号：US13047131

申请日：2011-03-14

申请人： Georg SOUMAGNE ,  Yoshifumi Ueno ,  Hiroshi Komori ,  Akira Sumitani ,  Katsunobu Nishihara ,  Young Gwang Kang ,  Masanori Nunami

发明人： Georg SOUMAGNE ,  Yoshifumi Ueno ,  Hiroshi Komori ,  Akira Sumitani ,  Katsunobu Nishihara ,  Young Gwang Kang ,  Masanori Nunami

IPC分类号： G21K5/00

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70858 ,  G03F7/70916 ,  H05G2/005 ,  H05G2/008

摘要： In an extreme ultra violet light source apparatus of a laser produced plasma type, charged particles such as ions emitted from plasma are promptly ejected to the outside of a chamber. The extreme ultra violet light source apparatus includes a chamber in which extreme ultra violet light is generated, a target supply unit for supplying a target material to a predetermined position within the chamber, a driver laser for applying a laser beam to the target material supplied by the target supply unit to generate plasma, a collector mirror for collecting the extreme ultra violet light radiated from the plasma to output the extreme ultra violet light, a magnetic field forming unit for forming an asymmetric magnetic field in a generation position of the plasma by using a coil, and a charged particle collection mechanism provided on at least one of two surfaces of the chamber to which lines of magnetic force generated by the coil extend.

摘要翻译： 在激光产生的等离子体型的极紫外光源装置中，将从等离子体发射的离子等带电粒子迅速地排出到室外。 极紫外光源装置包括产生极紫外光的室，用于将目标材料供应到室内的预定位置的目标供应单元，用于将激光束施加到由 用于产生等离子体的目标供应单元，用于收集从等离子体辐射的极端紫外光以输出极紫外光的集光镜;用于在等离子体的产生位置形成非对称磁场的磁场形成单元，其通过使用 线圈和带电粒子收集机构，设置在腔室的两个表面中的至少一个上，线圈产生的磁力线延伸到该表面。

公开(公告)号：US20090261277A1

公开(公告)日：2009-10-22

申请号：US12385569

申请日：2009-04-13

申请人： Georg Soumagne ,  Yoshifumi Ueno ,  Hiroshi Komori ,  Akira Sumitani ,  Katsunobu Nishihara ,  Young Gwang Kang ,  Masanori Nunami

发明人： Georg Soumagne ,  Yoshifumi Ueno ,  Hiroshi Komori ,  Akira Sumitani ,  Katsunobu Nishihara ,  Young Gwang Kang ,  Masanori Nunami

IPC分类号： G01J3/10

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70858 ,  G03F7/70916 ,  H05G2/005 ,  H05G2/008

摘要： In an extreme ultra violet light source apparatus of a laser produced plasma type, charged particles such as ions emitted from plasma are promptly ejected to the outside of a chamber. The extreme ultra violet light source apparatus includes a chamber in which extreme ultra violet light is generated, a target supply unit for supplying a target material to a predetermined position within the chamber, a driver laser for applying a laser beam to the target material supplied by the target supply unit to generate plasma, a collector mirror for collecting the extreme ultra violet light radiated from the plasma to output the extreme ultra violet light, a magnetic field forming unit for forming an asymmetric magnetic field in a generation position of the plasma by using a coil, and a charged particle collection mechanism provided on at least one of two surfaces of the chamber to which lines of magnetic force generated by the coil extend.

摘要翻译： 在激光产生的等离子体型的极紫外光源装置中，将从等离子体发射的离子等带电粒子迅速地排出到室外。 极紫外光源装置包括产生极紫外光的室，用于将目标材料供应到室内的预定位置的目标供应单元，用于将激光束施加到由 用于产生等离子体的目标供应单元，用于收集从等离子体辐射的极端紫外光以输出极紫外光的集光镜;用于在等离子体的产生位置形成非对称磁场的磁场形成单元，其通过使用 线圈和带电粒子收集机构，设置在腔室的两个表面中的至少一个上，线圈产生的磁力线延伸到该表面。

公开(公告)号：US08354657B2

公开(公告)日：2013-01-15

申请号：US13047131

申请日：2011-03-14

申请人： Georg Soumagne ,  Yoshifumi Ueno ,  Hiroshi Komori ,  Akira Sumitani ,  Katsunobu Nishihara ,  Young Gwang Kang ,  Masanori Nunami

发明人： Georg Soumagne ,  Yoshifumi Ueno ,  Hiroshi Komori ,  Akira Sumitani ,  Katsunobu Nishihara ,  Young Gwang Kang ,  Masanori Nunami

IPC分类号： A61N5/06 ,  G01J3/10

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70858 ,  G03F7/70916 ,  H05G2/005 ,  H05G2/008

摘要： In an extreme ultra violet light source apparatus of a laser produced plasma type, charged particles such as ions emitted from plasma are promptly ejected to the outside of a chamber. The apparatus includes a chamber, a target supply unit for supplying a target material into the chamber, a collector mirror for collecting extreme ultra violet light radiated from plasma generated by irradiating the target material with a laser beam to output the extreme ultra violet light, an electromagnet arranged outside of the chamber, and a charged particle collection mechanism provided on at least one of two surfaces of the chamber to which lines of magnetic force generated by the electromagnet extend.

摘要翻译： 在激光产生的等离子体型的极紫外光源装置中，将从等离子体发射的离子等带电粒子迅速地排出到室外。 该装置包括：室，用于将目标材料供应到室中的目标供应单元，用于收集由用激光束照射目标材料而产生的等离子体辐射的极紫外光以输出极紫外光的集光镜; 设置在室外的电磁体，以及设置在室的两个表面中的至少一个表面上的电荷粒子收集机构，由电磁体产生的磁力线延伸。

公开(公告)号：US07928418B2

公开(公告)日：2011-04-19

申请号：US12385569

申请日：2009-04-13

申请人： Georg Soumagne ,  Yoshifumi Ueno ,  Hiroshi Komori ,  Akira Sumitani ,  Katsunobu Nishihara ,  Young Gwang Kang ,  Masanori Nunami

发明人： Georg Soumagne ,  Yoshifumi Ueno ,  Hiroshi Komori ,  Akira Sumitani ,  Katsunobu Nishihara ,  Young Gwang Kang ,  Masanori Nunami

IPC分类号： A61N5/06 ,  G01J3/10 ,  H05G2/00

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70858 ,  G03F7/70916 ,  H05G2/005 ,  H05G2/008

摘要： In an extreme ultra violet light source apparatus of a laser produced plasma type, charged particles such as ions emitted from plasma are promptly ejected to the outside of a chamber. The extreme ultra violet light source apparatus includes a chamber in which extreme ultra violet light is generated, a target supply unit for supplying a target material to a predetermined position within the chamber, a driver laser for applying a laser beam to the target material supplied by the target supply unit to generate plasma, a collector mirror for collecting the extreme ultra violet light radiated from the plasma to output the extreme ultra violet light, a magnetic field forming unit for forming an asymmetric magnetic field in a generation position of the plasma by using a coil, and a charged particle collection mechanism provided on at least one of two surfaces of the chamber to which lines of magnetic force generated by the coil extend.

摘要翻译： 在激光产生的等离子体型的极紫外光源装置中，将从等离子体发射的离子等带电粒子迅速地排出到室外。 极紫外光源装置包括产生极紫外光的室，用于将目标材料供应到室内的预定位置的目标供应单元，用于将激光束施加到由 用于产生等离子体的目标供应单元，用于收集从等离子体辐射的极端紫外光以输出极紫外光的集光镜;用于在等离子体的产生位置形成非对称磁场的磁场形成单元，其通过使用 线圈和带电粒子收集机构，设置在腔室的两个表面中的至少一个上，线圈产生的磁力线延伸到该表面。

公开(公告)号：US08586953B2

公开(公告)日：2013-11-19

申请号：US13370074

申请日：2012-02-09

申请人： Hiroshi Komori ,  Yoshifumi Ueno ,  Georg Soumagne

发明人： Hiroshi Komori ,  Yoshifumi Ueno ,  Georg Soumagne

IPC分类号： G21G4/00

CPC分类号： G21K5/00 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： An extreme ultra violet light source device of a laser produced plasma type, in which charged particles such as ions emitted from plasma can be efficiently ejected. The extreme ultra violet light source device includes: a target nozzle that supplies a target material; a laser oscillator that applies a laser beam to the target material supplied from the target nozzle to generate plasma; collector optics that collects extreme ultra violet light radiated from the plasma; and a magnetic field forming unit that forms an asymmetric magnetic field in a position where the laser beam is applied to the target material.

摘要翻译： 激光产生等离子体的极紫外光源装置，其中可以有效地喷射从等离子体发射的离子等带电粒子。 极紫外光源装置包括：提供目标材料的目标喷嘴; 激光振荡器，其将激光束施加到从所述目标喷嘴供给的目标材料以产生等离子体; 收集从等离子体辐射的极紫外光的收集器光学元件; 以及在将激光束施加到目标材料的位置形成非对称磁场的磁场形成单元。

公开(公告)号：US20100176312A1

公开(公告)日：2010-07-15

申请号：US12352694

申请日：2009-01-13

申请人： Hiroshi Komori ,  Yoshifumi Ueno ,  Georg Soumagne

发明人： Hiroshi Komori ,  Yoshifumi Ueno ,  Georg Soumagne

IPC分类号： G01J3/10

CPC分类号： G03F7/70916 ,  G03F7/70033 ,  H05G2/003 ,  H05G2/008

摘要： In a laser produced plasma type extreme ultra violet light source apparatus, charged particles such as ions emitted from plasma can be efficiently ejected by the action of a magnetic field and secondary production of contaminants can be suppressed. The extreme ultra violet light source apparatus includes: a target nozzle for supplying a target material; a laser oscillator for applying a laser beam to the target material supplied by the target nozzle to generate plasma; an EUV collector mirror for collecting extreme ultra violet light radiated from the plasma; and an electromagnet for forming a magnetic field in a position where the laser beam is applied to the target material, wherein an aperture of the electromagnet is formed according to a shape of lines of magnetic flux of the magnetic field.

摘要翻译： 在激光产生的等离子体型极紫外光源装置中，可以通过磁场的作用有效地喷射从等离子体发射的离子等带电粒子，能够抑制二次生成污染物。 极紫外光源装置包括：用于供给目标材料的目标喷嘴; 激光振荡器，用于将激光束施加到由目标喷嘴供应的目标材料以产生等离子体; 用于收集从等离子体辐射的极紫外光的EUV收集镜; 以及用于在将激光束施加到目标材料的位置形成磁场的电磁体，其中根据磁场的磁通线的形状形成电磁体的孔。

公开(公告)号：US20070228298A1

公开(公告)日：2007-10-04

申请号：US11730139

申请日：2007-03-29

申请人： Hiroshi Komori ,  Yoshifumi Ueno ,  Georg Soumagne

发明人： Hiroshi Komori ,  Yoshifumi Ueno ,  Georg Soumagne

IPC分类号： G21G4/00

CPC分类号： G21K5/00 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： An extreme ultra violet light source device of a laser produced plasma type, in which charged particles such as ions emitted from plasma can be efficiently ejected. The extreme ultra violet light source device includes: a target nozzle that supplies a target material; a laser oscillator that applies a laser beam to the target material supplied from the target nozzle to generate plasma; collector optics that collects extreme ultra violet light radiated from the plasma; and a magnetic field forming unit that forms an asymmetric magnetic field in a position where the laser beam is applied to the target material.

摘要翻译： 激光产生等离子体的极紫外光源装置，其中可以有效地喷射从等离子体发射的离子等带电粒子。 极紫外光源装置包括：提供目标材料的目标喷嘴; 激光振荡器，其将激光束施加到从所述目标喷嘴供给的目标材料以产生等离子体; 收集从等离子体辐射的极紫外光的收集器光学元件; 以及在将激光束施加到目标材料的位置形成非对称磁场的磁场形成单元。

公开(公告)号：US08143606B2

公开(公告)日：2012-03-27

申请号：US11730139

申请日：2007-03-29

申请人： Hiroshi Komori ,  Yoshifumi Ueno ,  Georg Soumagne

发明人： Hiroshi Komori ,  Yoshifumi Ueno ,  Georg Soumagne

IPC分类号： H05G2/00

CPC分类号： G21K5/00 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： An extreme ultra violet light source device of a laser produced plasma type, in which charged particles such as ions emitted from plasma can be efficiently ejected. The extreme ultra violet light source device includes: a target nozzle that supplies a target material; a laser oscillator that applies a laser beam to the target material supplied from the target nozzle to generate plasma; collector optics that collects extreme ultra violet light radiated from the plasma; and a magnetic field forming unit that forms an asymmetric magnetic field in a position where the laser beam is applied to the target material.

摘要翻译： 激光产生等离子体的极紫外光源装置，其中可以有效地喷射从等离子体发射的离子等带电粒子。 极紫外光源装置包括：提供目标材料的目标喷嘴; 激光振荡器，其将激光束施加到从所述目标喷嘴供给的目标材料以产生等离子体; 收集从等离子体辐射的极紫外光的收集器光学元件; 以及在将激光束施加到目标材料的位置形成非对称磁场的磁场形成单元。

公开(公告)号：US08471226B2

公开(公告)日：2013-06-25

申请号：US12547896

申请日：2009-08-26

申请人： Hiroshi Komori ,  Tatsuya Yanagida ,  Yoshifumi Ueno ,  Akira Sumitani ,  Akira Endo ,  Tsukasa Hori

发明人： Hiroshi Komori ,  Tatsuya Yanagida ,  Yoshifumi Ueno ,  Akira Sumitani ,  Akira Endo ,  Tsukasa Hori

IPC分类号： A61N5/06

CPC分类号： G21K5/00 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： An EUV (Extreme Ultra Violet) light source device ionizes a target material in an ionizer, and supplies the ionized target material to a point of generating a plasma. This reduces the generation of debris. The ionizer simultaneously irradiates laser beams of plural wavelengths corresponding to the excited level of tin on a target material to ionize the target material. The ionized target material is extracted from the ionizer with a high voltage applied from an ion beam extractor, and accelerated and supplied to a plasma generation chamber. When driver laser beam is irradiated on the ionized target material, a plasma is generated, thereby emitting EUV radiation.

摘要翻译： EUV（Extreme Ultra Violet）光源装置将离子发生器中的目标材料离子化，并将电离靶材材料提供到产生等离子体的点。 这减少了碎片的产生。 离子发生器同时将与激发的锡水平相对应的多个波长的激光束照射在目标材料上以电离目标材料。 电离目标材料从离子束提取器施加的高电压从电离器中提取，并被加速并提供给等离子体产生室。 当驱动激光束照射在电离靶材上时，产生等离子体，从而发射EUV辐射。

公开(公告)号：US20110101863A1

公开(公告)日：2011-05-05

申请号：US12547896

申请日：2009-08-26

申请人： Hiroshi Komori ,  Tatsuya Yanagida ,  Yoshifumi Ueno ,  Akira Sumitani ,  Akira Endo ,  Tsukasa Hori

发明人： Hiroshi Komori ,  Tatsuya Yanagida ,  Yoshifumi Ueno ,  Akira Sumitani ,  Akira Endo ,  Tsukasa Hori

IPC分类号： H01J7/00

CPC分类号： G21K5/00 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： An EUV (Extreme Ultra Violet) light source device ionizes a target material in an ionizer, and supplies the ionized target material to a point of generating a plasma. This reduces the generation of debris. The ionizer simultaneously irradiates laser beams of plural wavelengths corresponding to the excited level of tin on a target material to ionize the target material. The ionized target material is extracted from the ionizer with a high voltage applied from an ion beam extractor, and accelerated and supplied to a plasma generation chamber. When driver laser beam is irradiated on the ionized target material, a plasma is generated, thereby emitting EUV radiation.

摘要翻译： EUV（Extreme Ultra Violet）光源装置将离子发生器中的目标材料离子化，并将电离靶材材料提供到产生等离子体的点。 这减少了碎片的产生。 离子发生器同时将与激发的锡水平相对应的多个波长的激光束照射在目标材料上以电离目标材料。 电离目标材料从离子束提取器施加的高电压从电离器中提取，并被加速并提供给等离子体产生室。 当驱动激光束照射在电离靶材上时，产生等离子体，从而发射EUV辐射。