公开(公告)号：US08481984B2

公开(公告)日：2013-07-09

申请号：US12482796

申请日：2009-06-11

申请人： Masato Moriya ,  Osamu Wakabayashi ,  Tamotsu Abe ,  Takashi Suganuma ,  Akira Endo ,  Akira Sumitani

发明人： Masato Moriya ,  Osamu Wakabayashi ,  Tamotsu Abe ,  Takashi Suganuma ,  Akira Endo ,  Akira Sumitani

IPC分类号： G21K5/00

摘要： An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for applying a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam applied by the driver laser.

公开(公告)号：US20100171049A1

公开(公告)日：2010-07-08

申请号：US12382964

申请日：2009-03-27

申请人： Masato Moriya ,  Tamotsu Abe ,  Takashi Suganuma ,  Hiroshi Someya ,  Takayuki Yabu ,  Akira Sumitani ,  Osamu Wakabayashi

发明人： Masato Moriya ,  Tamotsu Abe ,  Takashi Suganuma ,  Hiroshi Someya ,  Takayuki Yabu ,  Akira Sumitani ,  Osamu Wakabayashi

IPC分类号： H05G2/00 ,  G01N21/00

CPC分类号： H05G2/003 ,  H05G2/008

摘要： An EUV light source apparatus can reliably detect and accurately judge deterioration of an optical element in a laser beam focusing optics disposed within an EUV light generation chamber. This EUV light source apparatus includes: the EUV light generation chamber; a target material supply unit; an EUV light collector mirror; a driver laser; a window; a parabolic mirror which focuses collimated laser beam by reflection and is disposed within the EUV light generation chamber; an energy detector detecting energy of the laser beam diffused without being applied to a target material after being focused by the laser beam focusing optics when the EUV light is not generated; and a processing unit for judging the deterioration of the window and the parabolic mirror according to the laser beam energy detected by the energy detector.

摘要翻译： EUV光源装置可以可靠地检测并准确地判断设置在EUV光生成室内的激光束聚焦光学元件中的光学元件的劣化。 该EUV光源装置包括：EUV光产生室; 目标材料供应单位; EUV集光镜; 驱动激光器 一个窗口; 抛物面镜，其通过反射聚焦准直激光束并设置在EUV光产生室内; 能量检测器，当不产生EUV光时，检测在被激光束聚焦光学器件聚焦之后不会施加到目标材料上的激光束的能量扩散; 以及处理单元，用于根据由能量检测器检测的激光束能量来判断窗口和抛物面镜的劣化。

公开(公告)号：US20080073598A1

公开(公告)日：2008-03-27

申请号：US11902596

申请日：2007-09-24

申请人： Masato Moriya ,  Tamotsu Abe ,  Takashi Suganuma ,  Hiroshi Someya ,  Takayuki Yabu ,  Akira Sumitani

发明人： Masato Moriya ,  Tamotsu Abe ,  Takashi Suganuma ,  Hiroshi Someya ,  Takayuki Yabu ,  Akira Sumitani

IPC分类号： H05G2/00

CPC分类号： H05G2/001

摘要： An EUV light source apparatus capable of preventing the efficiency of generation of EUV light from decreasing due to deterioration of a window of an EUV light generation chamber. The EUV light source apparatus includes an EUV light generation chamber provided with a window, a driver laser which generates a laser beam, a concave lens which enlarges the laser beam, a convex lens which collimates the enlarged laser beam, a parabolic concave mirror which is arranged in the EUV light generation chamber and reflects the collimated laser beam to collect the laser beam to a target material, a parabolic concave mirror adjusting mechanism which adjusts position and angle of the parabolic concave mirror, an EUV light collector mirror which collects EUV light, and a purge gas supply unit which supplies a purge gas for protecting the window and the parabolic concave mirror.

摘要翻译： EUV光源装置能够防止由于EUV光产生室的窗口的劣化导致的EUV光的产生效率降低。 EUV光源装置包括：具有窗口的EUV光产生室，产生激光束的驱动激光器，放大激光束的凹透镜;使激光束准直的凸透镜;抛物面凹面镜; 布置在EUV光产生室中，并且反射准直激光束以将激光束收集到目标材料上，调整抛物面凹面镜的位置和角度的抛物面凹面镜调节机构，收集EUV光的EUV聚光镜， 以及净化气体供给单元，其供给用于保护窗口和抛物面凹面镜的吹扫气体。

公开(公告)号：US5811051A

公开(公告)日：1998-09-22

申请号：US649669

申请日：1996-05-28

申请人： Masao Kikuchi ,  Junji Hosokawa ,  Akira Sumitani ,  Haruhito Akimoto ,  Toshiharu Abekawa ,  Eri Suda ,  Shuji Shimozono ,  Nobuyuki Ozawa

发明人： Masao Kikuchi ,  Junji Hosokawa ,  Akira Sumitani ,  Haruhito Akimoto ,  Toshiharu Abekawa ,  Eri Suda ,  Shuji Shimozono ,  Nobuyuki Ozawa

IPC分类号： E04C5/07 ,  B29C53/30 ,  B29C53/58 ,  B29C59/02 ,  B29C70/06 ,  B29C70/52 ,  B29K101/10 ,  B29K105/08 ,  B29L31/06

CPC分类号： B29C47/003 ,  B29C47/0016 ,  B29C53/305 ,  B29C59/021 ,  B29C70/525 ,  B29C70/526 ,  B29C53/58

摘要： A method of continuously draw-molding a fiber reinforced plastic rod formed with a spiral groove includes the steps of arranging in parallel a plurality of reinforcing fibers under tension, impregnating an unhardened thermosetting resin in the reinforcing fibers with tension being applied to the reinforcing fibers, winding a tape having a resin impregnable property and an expandible and contractible property around a fiber bundle composed of the thermosetting resin impregnated reinforcing fibers in a spiral fashion with a winding angle being substantially equal to an angle of the spiral groove with respect to an axial direction of a rod to be molded, passing the fiber bundle with the wound tape in a heating mold provided with a hole having a cross section substantially equal to that of the rod to be molded to heat and harden the thermosetting resin, and taking up the tape thereafter.

摘要翻译： PCT No.PCT / JP94 / 02036 Sec。 371日期：1996年5月28日 102（e）日期1996年5月28日PCT 1994年12月2日PCT PCT。 公开号WO95 / 15255 日期：1995年6月8日一种连续拉伸成形有螺旋槽的纤维增强塑料杆的方法包括以下步骤：在张力下平行布置多个增强纤维，在加强纤维中浸渍未硬化的热固性树脂，并施加张力 对于增强纤维，以缠绕角度与螺旋形槽的角度大致相等的缠绕角度卷绕具有树脂浸渍性能和可膨胀性的可膨胀收缩性的纤维束在由热固性树脂浸渍的增强纤维构成的纤维束上， 相对于待模制的杆的轴向，将具有卷绕带的纤维束通过具有截面大致等于待模制棒的横截面的加热模具加热并硬化热固性树脂， 并在此之后拿起胶带。

公开(公告)号：US08536551B2

公开(公告)日：2013-09-17

申请号：US12482796

申请日：2009-06-11

申请人： Masato Moriya ,  Osamu Wakabayashi ,  Tamotsu Abe ,  Takashi Suganuma ,  Akira Endo ,  Akira Sumitani

发明人： Masato Moriya ,  Osamu Wakabayashi ,  Tamotsu Abe ,  Takashi Suganuma ,  Akira Endo ,  Akira Sumitani

IPC分类号： G21K5/00

CPC分类号： G21K5/04 ,  G03F7/70191 ,  G03F7/70575 ,  G03F7/70858 ,  G03F7/70941 ,  G21K1/10 ,  H05G2/005 ,  H05G2/008

摘要： An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for applying a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam applied by the driver laser.

摘要翻译： 一种使用能够获得高光谱纯度的EUV光的光谱纯度滤光片的极紫外光源装置。 该装置包括一个室; 用于提供目标材料的目标供应单元; 使用包含二氧化碳气体的激光气体作为激光介质的激光激光器，用于向目标材料施加激光以产生等离子体; 用于收集和输出从等离子体辐射的极紫外光的收集器反射镜; 以及设置在极紫外光的光路中的光谱纯度滤光片，用于透射极紫外光并反射激光束，光谱纯度滤光器包括具有导电性的网格，并且形成为具有间距不大的孔 超过由驱动器激光器施加的激光束的最短波长的一半。

公开(公告)号：US20120298134A1

公开(公告)日：2012-11-29

申请号：US13567656

申请日：2012-08-06

申请人： Masato Moriya ,  Yoshifumi Ueno ,  Tamotsu Abe ,  Akira Sumitani

发明人： Masato Moriya ,  Yoshifumi Ueno ,  Tamotsu Abe ,  Akira Sumitani

IPC分类号： B08B7/00 ,  C23F1/08

CPC分类号： H05G2/001 ,  G03F7/70033 ,  H05G2/005

摘要： A method for cleaning an optical element of an extreme ultraviolet light source device for removing, from the optical element in a chamber, scattered matter generated together with extreme ultraviolet light by plasma formed through laser beam excitation of a target in the chamber, the method which comprises: making the scattered matter generated by the plasma no larger than nanosize by using solid tin as the target and using a CO2 laser as an excitation source of the solid tin; and imparting, to the scattered matter no larger than the nanosize adhered to the optical element, an effect of overcoming the adherence of the scattered matter.

摘要翻译： 一种用于清除极紫外光源装置的光学元件的方法，用于从腔室中的光学元件除去通过室中的靶的激光束激发而形成的等离子体与极紫外光一起产生的散射物质， 包括：通过使用固体锡作为目标并使用CO 2激光器作为固体锡的激发源，使由等离子体产生的散射物质不大于纳米尺寸; 并且对不大于粘附到光学元件的纳米尺度的散射物质赋予克服散射物质的粘附的效果。

公开(公告)号：US20110180734A1

公开(公告)日：2011-07-28

申请号：US13081899

申请日：2011-04-07

申请人： Masato MORIYA ,  Tamotsu ABE ,  Takashi SUGANUMA ,  Hiroshi SOMEYA ,  Takayuki YABU ,  Akira SUMITANI ,  Osamu WAKABAYASHI

发明人： Masato MORIYA ,  Tamotsu ABE ,  Takashi SUGANUMA ,  Hiroshi SOMEYA ,  Takayuki YABU ,  Akira SUMITANI ,  Osamu WAKABAYASHI

IPC分类号： H05G2/00

CPC分类号： H05G2/003 ,  H05G2/008

摘要： An EUV light source apparatus can reliably detect and accurately judge deterioration of an optical element in a laser beam focusing optics disposed within an EUV light generation chamber. This EUV light source apparatus includes: the EUV light generation chamber; a target material supply unit; an EUV light collector mirror; a driver laser; a window; a parabolic mirror which focuses collimated laser beam by reflection and is disposed within the EUV light generation chamber; an energy detector detecting energy of the laser beam diffused without being applied to a target material after being focused by the laser beam focusing optics when the EUV light is not generated; and a processing unit for judging the deterioration of the window and the parabolic mirror according to the laser beam energy detected by the energy detector.

摘要翻译： EUV光源装置可以可靠地检测并准确地判断设置在EUV光产生室内的激光束聚焦光学元件中的光学元件的劣化。 该EUV光源装置包括：EUV光产生室; 目标材料供应单位; EUV集光镜; 驱动激光器 一个窗口; 抛物面镜，其通过反射聚焦准直激光束并设置在EUV光产生室内; 能量检测器，当不产生EUV光时，检测在被激光束聚焦光学器件聚焦之后不会施加到目标材料上的激光束的能量扩散; 以及处理单元，用于根据由能量检测器检测的激光束能量来判断窗口和抛物面镜的劣化。

公开(公告)号：US20100176310A1

公开(公告)日：2010-07-15

申请号：US12385835

申请日：2009-04-21

申请人： Masato Moriya ,  Tamotsu Abe ,  Takashi Suganuma ,  Hiroshi Someya ,  Takayuki Yabu ,  Akira Sumitani ,  Osamu Wakabayashi

发明人： Masato Moriya ,  Tamotsu Abe ,  Takashi Suganuma ,  Hiroshi Someya ,  Takayuki Yabu ,  Akira Sumitani ,  Osamu Wakabayashi

IPC分类号： H01J99/00

CPC分类号： G03F7/70891 ,  G03F7/70033 ,  G03F7/7085 ,  G03F7/70883 ,  H05G2/008

摘要： An EUV light source apparatus capable of easily detecting deterioration etc. of a window of an EUV light generating chamber. The EUV light source apparatus includes a driver laser, an EUV light generating chamber, a window which passes the laser beam into the EUV light generating chamber, an EUV light collector mirror, laser beam focusing optics which focuses a laser beam onto a trajectory of a target material, a temperature sensor which detects a temperature of the window, and a laser beam optics deterioration determination processing unit which determines deterioration of the window based on the temperature of the window detected by the temperature sensor when extreme ultra violet light is generated.

摘要翻译： EUV光源装置，能够容易地检测EUV光产生室的窗口的劣化等。 EUV光源装置包括驱动激光器，EUV光产生室，将激光束通入EUV光产生室的窗口，EUV聚光镜，激光束聚焦光学器件，其将激光束聚焦到 目标材料，检测窗口的温度的温度传感器，以及激光束光学劣化判定处理单元，其基于当产生极紫外光时由温度传感器检测到的窗口的温度来确定窗口的劣化。

公开(公告)号：US07683355B2

公开(公告)日：2010-03-23

申请号：US11902596

申请日：2007-09-24

申请人： Masato Moriya ,  Tamotsu Abe ,  Takashi Suganuma ,  Hiroshi Someya ,  Takayuki Yabu ,  Akira Sumitani

发明人： Masato Moriya ,  Tamotsu Abe ,  Takashi Suganuma ,  Hiroshi Someya ,  Takayuki Yabu ,  Akira Sumitani

IPC分类号： H05G2/00 ,  G21G4/00 ,  A61N5/06 ,  G01J3/10

CPC分类号： H05G2/001

摘要： An EUV light source apparatus capable of preventing the efficiency of generation of EUV light from decreasing due to deterioration of a window of an EUV light generation chamber. The EUV light source apparatus includes an EUV light generation chamber provided with a window, a driver laser which generates a laser beam, a concave lens which enlarges the laser beam, a convex lens which collimates the enlarged laser beam, a parabolic concave mirror which is arranged in the EUV light generation chamber and reflects the collimated laser beam to collect the laser beam to a target material, a parabolic concave mirror adjusting mechanism which adjusts position and angle of the parabolic concave mirror, an EUV light collector mirror which collects EUV light, and a purge gas supply unit which supplies a purge gas for protecting the window and the parabolic concave mirror.

摘要翻译： EUV光源装置能够防止由于EUV光产生室的窗口的劣化导致的EUV光的产生效率降低。 EUV光源装置包括：具有窗口的EUV光产生室，产生激光束的驱动激光器，放大激光束的凹透镜;使激光束准直的凸透镜;抛物面凹面镜; 布置在EUV光产生室中，并且反射准直激光束以将激光束收集到目标材料上，调整抛物面凹面镜的位置和角度的抛物面凹面镜调节机构，收集EUV光的EUV聚光镜， 以及净化气体供给单元，其供给用于保护窗口和抛物面凹面镜的吹扫气体。

公开(公告)号：US20090261277A1

公开(公告)日：2009-10-22

申请号：US12385569

申请日：2009-04-13

申请人： Georg Soumagne ,  Yoshifumi Ueno ,  Hiroshi Komori ,  Akira Sumitani ,  Katsunobu Nishihara ,  Young Gwang Kang ,  Masanori Nunami

发明人： Georg Soumagne ,  Yoshifumi Ueno ,  Hiroshi Komori ,  Akira Sumitani ,  Katsunobu Nishihara ,  Young Gwang Kang ,  Masanori Nunami

IPC分类号： G01J3/10

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70858 ,  G03F7/70916 ,  H05G2/005 ,  H05G2/008

摘要： In an extreme ultra violet light source apparatus of a laser produced plasma type, charged particles such as ions emitted from plasma are promptly ejected to the outside of a chamber. The extreme ultra violet light source apparatus includes a chamber in which extreme ultra violet light is generated, a target supply unit for supplying a target material to a predetermined position within the chamber, a driver laser for applying a laser beam to the target material supplied by the target supply unit to generate plasma, a collector mirror for collecting the extreme ultra violet light radiated from the plasma to output the extreme ultra violet light, a magnetic field forming unit for forming an asymmetric magnetic field in a generation position of the plasma by using a coil, and a charged particle collection mechanism provided on at least one of two surfaces of the chamber to which lines of magnetic force generated by the coil extend.

摘要翻译： 在激光产生的等离子体型的极紫外光源装置中，将从等离子体发射的离子等带电粒子迅速地排出到室外。 极紫外光源装置包括产生极紫外光的室，用于将目标材料供应到室内的预定位置的目标供应单元，用于将激光束施加到由 用于产生等离子体的目标供应单元，用于收集从等离子体辐射的极端紫外光以输出极紫外光的集光镜;用于在等离子体的产生位置形成非对称磁场的磁场形成单元，其通过使用 线圈和带电粒子收集机构，设置在腔室的两个表面中的至少一个上，线圈产生的磁力线延伸到该表面。