公开(公告)号：US20060121772A1

公开(公告)日：2006-06-08

申请号：US10518907

申请日：2003-03-03

申请人： Gerd Hoffman ,  Reiner Naumann

发明人： Gerd Hoffman ,  Reiner Naumann

IPC分类号： H01R4/24

CPC分类号： H01R4/2458 ,  H01R4/2433

摘要： This invention relates to a branching device (1, 25) for at least one electric line. The branching device exhibits branching contacts and a housing (2) in which at least one electrically conducting wire terminal (11) is accommodated in a holder (10, 26). The device is characterised in that contact lips (44, 46) with cutting edges (48) for cutting through the insulation (25) of the wires (50) of the electric line are provided on the wire terminal (11), in that the wire terminals (11) represent the branching contacts and in that a through-channel (47) for the uninterrupted passage of a wire (50) is provided in each wire terminal (11).

摘要翻译： 本发明涉及一种用于至少一条电线的分支装置（1,25）。 分支装置具有分支触点和壳体（2），其中至少一个导电线端子（11）容纳在支架（10,26）中。 该装置的特征在于，在导线端子（11）上设置有用于切割通过电线的导线（50）的绝缘体（25）的切割边缘（48）的接触唇缘（44,46），因为 电线端子（11）表示分支接点，并且在每个电线端子（11）中设置用于不间断地通过电线（50）的通道（47）。

公开(公告)号：US20090324972A1

公开(公告)日：2009-12-31

申请号：US12418130

申请日：2009-04-03

申请人： Gerd Hoffman ,  Alexandra L. Quiceno

发明人： Gerd Hoffman ,  Alexandra L. Quiceno

IPC分类号： B32B15/04 ,  C23C14/34 ,  B32B9/04

CPC分类号： C23C14/081 ,  C23C14/562 ,  Y10T428/31678

摘要： The present invention refers to a coating device for depositing of barrier layers on a plastic substrate comprising a first coating station for depositing a first layer comprising a metal and a second coating station for depositing a second layer comprising a resin, wherein a treatment station for treating the deposited first layer is arranged between the first and the second coating stations which comprises sputter means for depositing one or several atomic layers or isles of deposition material. The invention further refers to an appropriate method which can be carried out by the coating device and to a layer system produced thereby.

摘要翻译： 本发明涉及一种用于在塑料基板上沉积阻挡层的涂覆装置，包括用于沉积包括金属的第一层的第一涂覆站和用于沉积包含树脂的第二层的第二涂覆站，其中处理站用于处理 沉积的第一层布置在第一和第二涂覆站之间，其包括用于沉积一个或几个原子层或沉积材料岛的溅射装置。 本发明还涉及可以由涂布装置和由其制造的层系统执行的适当方法。

公开(公告)号：US08425738B2

公开(公告)日：2013-04-23

申请号：US12418130

申请日：2009-04-03

申请人： Gerd Hoffman ,  Alexandra L. Quiceno

发明人： Gerd Hoffman ,  Alexandra L. Quiceno

IPC分类号： C23C14/34

CPC分类号： C23C14/081 ,  C23C14/562 ,  Y10T428/31678

摘要： The present invention refers to a coating device for depositing of barrier layers on a plastic substrate comprising a first coating station for depositing a first layer comprising a metal and a second coating station for depositing a second layer comprising a resin, wherein a treatment station for treating the deposited first layer is arranged between the first and the second coating stations which comprises sputter means for depositing one or several atomic layers or isles of deposition material. The invention further refers to an appropriate method which can be carried out by the coating device and to a layer system produced thereby.

摘要翻译： 本发明涉及一种用于在塑料基板上沉积阻挡层的涂覆装置，包括用于沉积包括金属的第一层的第一涂覆站和用于沉积包含树脂的第二层的第二涂覆站，其中处理站用于处理 沉积的第一层布置在第一和第二涂覆站之间，其包括用于沉积一个或几个原子层或沉积材料岛的溅射装置。 本发明还涉及可以由涂布装置和由其制造的层系统执行的适当方法。

公开(公告)号：US20100146673A1

公开(公告)日：2010-06-10

申请号：US12519568

申请日：2006-12-28

申请人： Leif Riemenschneider ,  Gerd Hoffman

发明人： Leif Riemenschneider ,  Gerd Hoffman

IPC分类号： G01Q20/00 ,  G01Q60/24

CPC分类号： G01Q10/06 ,  G01Q30/06

摘要： Proposed is a procedure for carrying out a scanning probe microscopic or atomic force spectroscopic measurement within predetermined parameters, which said procedure encompasses the following steps: a determination of a value variance of at least one of the parameters, and control of an adjustment member in relation to said variance, so that the variance is at least partially compensated for.

摘要翻译： 提出了在预定参数内执行扫描探针微观或原子力光谱测量的程序，所述方法包括以下步骤：确定至少一个参数的值方差，以及关于调节构件的控制 到所述方差，使得​​方差至少部分地被补偿。