摘要:
Proposed is a procedure for carrying out a scanning probe microscopic or atomic force spectroscopic measurement within predetermined parameters, which said procedure encompasses the following steps: a determination of a value variance of at least one of the parameters, and control of an adjustment member in relation to said variance, so that the variance is at least partially compensated for.
摘要:
The present invention refers to a coating device for depositing of barrier layers on a plastic substrate comprising a first coating station for depositing a first layer comprising a metal and a second coating station for depositing a second layer comprising a resin, wherein a treatment station for treating the deposited first layer is arranged between the first and the second coating stations which comprises sputter means for depositing one or several atomic layers or isles of deposition material. The invention further refers to an appropriate method which can be carried out by the coating device and to a layer system produced thereby.
摘要:
This invention relates to a branching device (1, 25) for at least one electric line. The branching device exhibits branching contacts and a housing (2) in which at least one electrically conducting wire terminal (11) is accommodated in a holder (10, 26). The device is characterised in that contact lips (44, 46) with cutting edges (48) for cutting through the insulation (25) of the wires (50) of the electric line are provided on the wire terminal (11), in that the wire terminals (11) represent the branching contacts and in that a through-channel (47) for the uninterrupted passage of a wire (50) is provided in each wire terminal (11).
摘要:
The present invention refers to a coating device for depositing of barrier layers on a plastic substrate comprising a first coating station for depositing a first layer comprising a metal and a second coating station for depositing a second layer comprising a resin, wherein a treatment station for treating the deposited first layer is arranged between the first and the second coating stations which comprises sputter means for depositing one or several atomic layers or isles of deposition material. The invention further refers to an appropriate method which can be carried out by the coating device and to a layer system produced thereby.