-
1.发明申请Composite material, heat-absorbing component, and method for producing the composite material 有权复合材料，吸热组件以及复合材料的制造方法公开(公告)号：US20150132511A1
公开(公告)日：2015-05-14
申请号：US14077182
申请日：2013-11-11
申请人： Gerrit Scheich , Christian Schenk , Frank Wessely , Nadine Tscholitsch , Christian Neumann , Stephan Moritz , Dirk Michel , Ashur Atanos
发明人： Gerrit Scheich , Christian Schenk , Frank Wessely , Nadine Tscholitsch , Christian Neumann , Stephan Moritz , Dirk Michel , Ashur Atanos
CPC分类号： C09K5/14 , B28B1/26 , C03B19/066 , C03C14/004 , C03C14/006 , C03C2214/04 , C03C2214/08 , C03C2214/16 , C03C2214/30 , C04B35/14 , C04B35/64 , F27B14/10 , F27B2014/0843 , Y10T428/131
摘要： In a known composite material with a fused silica matrix there are regions of silicon-containing phase embedded. In order to provide a composite material which is suitable for producing components for use in high-temperature processes for heat treatment even when exacting requirements are imposed on impermeability to gas and on purity, it is proposed in accordance with the invention that the composite material be impervious to gas, have a closed porosity of less than 0.5% and a specific density of at least 2.19 g/cm3, and at a temperature of 1000° C. have a spectral emissivity of at least 0.7 for wavelengths between 2 and 8 μm.
摘要翻译： 在具有熔融二氧化硅基质的已知复合材料中，存在嵌入含硅相的区域。 为了提供一种适用于生产用于热处理的高温方法的组分的复合材料，即使当对气体的不渗透性和纯度施加严格要求时，根据本发明提出复合材料为 不透气体，具有小于0.5％的封闭孔隙率和至少2.19g / cm 3的比密度，并且在1000℃的温度下，波长在2和8μm之间的光谱发射率至少为0.7。
-
2.发明申请公开(公告)号：US20180215984A1
公开(公告)日：2018-08-02
申请号：US15937711
申请日：2018-03-27
申请人： Gerrit Scheich , Christian Schenk , Frank Wessely , Nadine Tscholitsch , Ashur J. Atanos , Christian Neumann , Stephan Moritz , Dirk Michel
发明人： Gerrit Scheich , Christian Schenk , Frank Wessely , Nadine Tscholitsch , Ashur J. Atanos , Christian Neumann , Stephan Moritz , Dirk Michel
CPC分类号： C09K5/14 , B28B1/26 , C03B19/066 , C03C14/004 , C03C14/006 , C03C2214/04 , C03C2214/08 , C03C2214/16 , C03C2214/30 , C04B35/14 , C04B35/64 , F27B14/10 , F27B2014/0843 , Y10T428/131
摘要： In a known composite material with a fused silica matrix there are regions of silicon-containing phase embedded. In order to provide a composite material which is suitable for producing components for use in high-temperature processes for heat treatment even when exacting requirements are imposed on impermeability to gas and on purity, it is proposed in accordance with the invention that the composite material be impervious to gas, have a closed porosity of less than 0.5% and a specific density of at least 2.19 g/cm3, and at a temperature of 1000° C. have a spectral emissivity of at least 0.7 for wavelengths between 2 and 8 μm.
-
3.发明授权公开(公告)号：US09957431B2
公开(公告)日：2018-05-01
申请号：US14077182
申请日：2013-11-11
申请人： Gerrit Scheich , Christian Schenk , Frank Wessely , Nadine Tscholitsch , Ashur J. Atanos , Christian Neumann , Stephan Moritz , Dirk Michel
发明人： Gerrit Scheich , Christian Schenk , Frank Wessely , Nadine Tscholitsch , Ashur J. Atanos , Christian Neumann , Stephan Moritz , Dirk Michel
CPC分类号： C09K5/14 , B28B1/26 , C03B19/066 , C03C14/004 , C03C14/006 , C03C2214/04 , C03C2214/08 , C03C2214/16 , C03C2214/30 , C04B35/14 , C04B35/64 , F27B14/10 , F27B2014/0843 , Y10T428/131
摘要： In a known composite material with a fused silica matrix there are regions of silicon-containing phase embedded. In order to provide a composite material which is suitable for producing components for use in high-temperature processes for heat treatment even when exacting requirements are imposed on impermeability to gas and on purity, it is proposed in accordance with the invention that the composite material be impervious to gas, have a closed porosity of less than 0.5% and a specific density of at least 2.19 g/cm3, and at a temperature of 1000° C. have a spectral emissivity of at least 0.7 for wavelengths between 2 and 8 μm.
-
公开(公告)号：US5866062A
公开(公告)日：1999-02-02
申请号：US814713
申请日：1997-03-11
申请人： Stephan Moritz , Wolfgang Englisch
发明人： Stephan Moritz , Wolfgang Englisch
CPC分类号： C30B35/002 , B22C9/12 , C03B19/06 , C03B19/066 , C03B20/00 , C03C11/00 , C03C3/06 , C04B35/14 , C04B35/62204 , C04B35/6261 , C04B35/6263 , C03B2201/23 , C03C2201/02 , C03C2201/80 , C03C2203/10 , C03C2203/52 , C04B2235/3418 , C04B2235/36 , C04B2235/5427 , C04B2235/5436 , C04B2235/5463 , C04B2235/6027 , C04B2235/606 , C04B2235/656 , C04B2235/6562 , C04B2235/6565 , C04B2235/6567 , C04B2235/661 , C04B2235/72 , C04B2235/77 , C04B2235/95 , C04B2235/96 , C04B2235/9653
摘要： A shaped body of amorphous silicon dioxide, which has a chemical purity of at least 99.9% and a cristobalite content of at most 1% and which is impermeable to gas, is known. To provide shaped bodies of amorphous silicon dioxide which have a high precision, which can be small or large in size and of simple to complicated shape, which have a chemical purity of at least 99.9%, are impermeable to gas above wall thicknesses of 1 mm, which have a high cold flexural strength, low thermal conductivity and low radiation of heat, which are thermal shock resistant and can be exposed repeatedly or also long-term to temperatures in the range from 1000.degree. to 1300.degree. C. and which can be welded in a sharply delineated manner without spreading joins and which have a low spectral transmission from the ultraviolet to the middle infrared spectral region, the shaped body is opaque, contains pores, at a wall thickness of 1 mm has a direct spectral transmission which is virtually constant in the wavelength range from .lambda.=190 nm to .lambda.=2650 nm and is below 10%, and it has a density which is at least 2.15 g/cm.sup.3. A process for producing such shaped bodies is also provided.
摘要翻译： 已知一种无定形二氧化硅的成形体，其化学纯度为99.9％以上，方石方含量为1％以下且不透气。 为了提供具有至少99.9％的化学纯度的具有高精度的成形体的非晶形二氧化硅，其尺寸可以是小的或大的，并且具有简单到复杂的形状，对于壁厚为1mm的气体是不可渗透的 ，具有高的抗弯强度，低导热性和低辐射热，耐热冲击，可以反复暴露或长时间暴露于1000℃至1300℃的温度，并且可以是 焊接成锐利的方式而不扩散接头，并且具有从紫外线到中红外光谱区域的低光谱透射率，成形体是不透明的，包含孔，在1mm厚的壁处具有直接光谱透射，其实际上 在λ= 190nm至λ= 2650nm的波长范围内恒定，并且低于10％，并且其密度为至少2.15g / cm 3。 还提供了一种用于生产这种成形体的方法。
-
5.发明授权Molded body of quartz glass and process for the production of a molded body of quartz glass 失效石英玻璃成型体及生产石英玻璃成型体的工艺
公开(公告)号：US5736206A
公开(公告)日：1998-04-07
申请号：US640759
申请日：1996-05-07
IPC分类号： C03B20/00 , B22C9/12 , B28B1/26 , C03B19/06 , C03C3/06 , C03C11/00 , C03C17/02 , C04B33/28 , C04B35/14 , C30B35/00 , G01J1/42 , B01J3/00 , H01L21/02
CPC分类号： C03C17/02 , B22C9/12 , C03B19/06 , C03B19/066 , C03B20/00 , C03C11/00 , C03C3/06 , C30B35/002 , G01J1/429 , C03B2201/23 , C03C2201/02 , C03C2201/80 , C03C2203/52 , Y10T428/131 , Y10T428/1317
摘要： Molded bodies of quartz glass have at least one surface area of transparent quartz glass, the exposed surfaces of which are smooth and which have a surface microroughness of less than 8 .mu.m. The base material has a chemical purity of at least 99.9% and a cristobalite content of no more than 1%; is gas-impermeable and opaque; and contains pores. At a wall thickness of 1 mm, the base material has a nearly uniform direct spectral transmission of less than 10% in the wavelength range of .lambda.=190-2,650 nm; and which has a density of at least 2.215 g/cm.sup.3. The transparent surface area is formed from base material by heating it to a temperature above 1,650.degree. C. The thickness of the transparent layer is at least 0.5 mm, and its direct spectral transmission in the wavelength range of .lambda.=6001-2,650 nm is at least 60% for a layer thickness of 1 mm.
摘要翻译： PCT No.PCT / EP94 / 03722 Sec。 371日期：1996年5月7日 102（e）日期1996年5月7日PCT 1994年11月10日PCT PCT。 公开号WO95 / 13248 日期1995年5月18日石英玻璃体的模体具有透明石英玻璃的至少一个表面积，其露出表面光滑，表面微粗糙度小于8μm。 基材的化学纯度为99.9％以上，方石方含量不超过1％。 是不透气和不透明的; 并含有毛孔。 在壁厚为1mm的情况下，基材在λ= 190-2,650nm的波长范围内具有小于10％的几乎均匀的直接光谱透射; 并且其密度为至少2.215g / cm 3。 透明表面积由基材通过加热至1650℃以上而形成。透明层的厚度至少为0.5mm，其在λ= 6001-2,650nm的波长范围内的直接光谱透过率为 对于层厚为1mm，最少为60％。
-
6.发明授权Shaped body having a high silicon dioxide content and a process for producing such shaped bodies 失效具有高二氧化硅含量的成形体和用于制造这种成形体的方法
公开(公告)号：US5674792A
公开(公告)日：1997-10-07
申请号：US636889
申请日：1996-04-24
申请人： Stephan Moritz , Wolfgang Englisch
发明人： Stephan Moritz , Wolfgang Englisch
CPC分类号： C30B35/002 , B22C9/12 , C03B19/06 , C03B19/066 , C03B20/00 , C03C11/00 , C03C3/06 , C04B35/14 , C04B35/62204 , C04B35/6261 , C04B35/6263 , C03B2201/23 , C03C2201/02 , C03C2201/80 , C03C2203/10 , C03C2203/52 , C04B2235/3418 , C04B2235/36 , C04B2235/5427 , C04B2235/5436 , C04B2235/5463 , C04B2235/6027 , C04B2235/606 , C04B2235/656 , C04B2235/6562 , C04B2235/6565 , C04B2235/6567 , C04B2235/661 , C04B2235/72 , C04B2235/77 , C04B2235/95 , C04B2235/96 , C04B2235/9653
摘要： A shaped body of amorphous silicon dioxide, which has a chemical purity of at least 99.9% and a cristobalite content of at most 1% and which is impermeable to gas, is known. To provide shaped bodies of amorphous silicon dioxide which have a high precision, which can be small or large in size and of simple to complicated shape, which have a chemical purity of at least 99.9%, are impermeable to gas above wall thicknesses of 1 mm, which have a high cold flexural strength, low thermal conductivity and low radiation of heat, which are thermal shock resistant and can be exposed repeatedly or also long-term to temperatures in the range from 1000.degree. to 1300.degree. C. and which can be welded in a sharply delineated manner without spreading joins and which have a low spectral transmission from the ultraviolet to the middle infrared spectral region, the shaped body is opaque, contains pores, at a wall thickness of 1 mm has a direct spectral transmission which is virtually constant in the wavelength range from .lambda.=190 nm to .lambda.=2650 nm and is below 10%, and it has a density which is at least 2.15 g/cm.sup.3. A process for producing such shaped bodies is also provided.
摘要翻译： 已知一种无定形二氧化硅的成形体，其化学纯度为99.9％以上，方石方含量为1％以下且不透气。 为了提供具有至少99.9％的化学纯度的具有高精度的成形体的非晶形二氧化硅，其尺寸可以是小的或大的，并且具有简单到复杂的形状，对于壁厚为1mm的气体是不可渗透的 ，具有高的抗弯强度，低导热性和低辐射热，耐热冲击，可以反复暴露或长时间暴露于1000℃至1300℃的温度，并且可以是 焊接成锐利的方式而不扩散接头，并且具有从紫外线到中红外光谱区域的低光谱透射率，成形体是不透明的，包含孔，在1mm厚的壁处具有直接光谱透射，其实际上 在λ= 190nm至λ= 2650nm的波长范围内恒定，并且低于10％，并且其密度为至少2.15g / cm 3。 还提供了一种用于生产这种成形体的方法。
-
-
-
-
-
搜索结果
6 条记录 (耗时 0.039 秒)
