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1.发明申请公开(公告)号：US20180215984A1
公开(公告)日：2018-08-02
申请号：US15937711
申请日：2018-03-27
申请人： Gerrit Scheich , Christian Schenk , Frank Wessely , Nadine Tscholitsch , Ashur J. Atanos , Christian Neumann , Stephan Moritz , Dirk Michel
发明人： Gerrit Scheich , Christian Schenk , Frank Wessely , Nadine Tscholitsch , Ashur J. Atanos , Christian Neumann , Stephan Moritz , Dirk Michel
CPC分类号： C09K5/14 , B28B1/26 , C03B19/066 , C03C14/004 , C03C14/006 , C03C2214/04 , C03C2214/08 , C03C2214/16 , C03C2214/30 , C04B35/14 , C04B35/64 , F27B14/10 , F27B2014/0843 , Y10T428/131
摘要： In a known composite material with a fused silica matrix there are regions of silicon-containing phase embedded. In order to provide a composite material which is suitable for producing components for use in high-temperature processes for heat treatment even when exacting requirements are imposed on impermeability to gas and on purity, it is proposed in accordance with the invention that the composite material be impervious to gas, have a closed porosity of less than 0.5% and a specific density of at least 2.19 g/cm3, and at a temperature of 1000° C. have a spectral emissivity of at least 0.7 for wavelengths between 2 and 8 μm.
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公开(公告)号：US08920878B2
公开(公告)日：2014-12-30
申请号：US13501137
申请日：2010-09-01
CPC分类号： C03C17/02 , C03C2218/11
摘要： In a known method, a SiO2 slip layer is applied to a basic quartz glass body by means of spraying on an SiO2 slip, the slip layer is dried and sintered to form an SiO2-containing functional layer. In order to permit the reproducible production of a functional quartz glass layer, even in the case of surfaces that are curved or inclined with respect to the vertical, having high layer thicknesses which satisfy high requirements on the layer homogeneity, the invention proposes that the slip contain the following components in a dispersion liquid: splintery, amorphous SiO2 granules having a gain size distribution having a D50 value in the range of 3 μm to 30 μm and having a proportion by weight of at least 10% by weight, based on the total solids content; spherical, amorphous SiO2 particles having a particle size distribution having a D50 value in the range of 1 μm to 50 μm and having a proportion by weight of at least 30% by weight, based on the total solids content; SiO2 nano particles having particle sizes of less than 100 nm and having a proportion by weight between 0.2% and 10% by weight, based on the total solids content; and a non-ionic, alkali-free surfactant having a proportion in the range of 0.005 to 0.5%, based on the volume of the dispersion liquid.
摘要翻译： 在已知的方法中，通过喷涂在SiO 2滑移上将SiO2滑移层施加到碱性石英玻璃体上，将滑移层干燥并烧结以形成含SiO 2的功能层。 为了允许可再生产的功能性石英玻璃层，即使在相对于垂直方向弯曲或倾斜的表面的情况下，具有满足对层均匀性的高要求的高层厚度，本发明提出了滑动 在分散液中含有以下组分：分散体，具有D50值在3μm至30μm范围内并且按重量计至少10重量％的增益尺寸分布的无定形SiO 2颗粒，基于总计 固体含量; 基于总固体含量，具有D50值在1μm至50μm范围内并具有至少30重量％的重量比的粒度分布的球形无定形SiO 2颗粒; 基于总固体含量，粒径小于100nm并且重量比为0.2％至10％的SiO 2纳米颗粒; 和非离子型无碱性表面活性剂，其比例基于分散液体积的0.005〜0.5％。
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公开(公告)号：US20120237685A1
公开(公告)日：2012-09-20
申请号：US13501137
申请日：2010-09-01
CPC分类号： C03C17/02 , C03C2218/11
摘要： In a known method, a SiO2 slip layer is applied to a basic quartz glass body by means of spraying on an SiO2 slip, the slip layer is dried and sintered to form an SiO2-containing functional layer. In order to permit the reproducible production of a functional quartz glass layer, even in the case of surfaces that are curved or inclined with respect to the vertical, having high layer thicknesses which satisfy high requirements on the layer homogeneity, the invention proposes that the slip contain the following components in a dispersion liquid: splintery, amorphous SiO2 granules having a gain size distribution having a D50 value in the range of 3 μm to 30 μm and having a proportion by weight of at least 10% by weight, based on the total solids content; spherical, amorphous SiO2 particles having a particle size distribution having a D50 value in the range of 1 μm to 50 μm and having a proportion by weight of at least 30% by weight, based on the total solids content; SiO2 nano particles having particle sizes of less than 100 nm and having a proportion by weight between 0.2% and 10% by weight, based on the total solids content; and a non-ionic, alkali-free surfactant having a proportion in the range of 0.005 to 0.5%, based on the volume of the dispersion liquid.
摘要翻译： 在已知的方法中，通过喷涂在SiO 2滑移上将SiO2滑移层施加到碱性石英玻璃体上，将滑移层干燥并烧结以形成含SiO 2的功能层。 为了允许可再生产的功能性石英玻璃层，即使在相对于垂直方向弯曲或倾斜的表面的情况下，具有满足对层均匀性的高要求的高层厚度，本发明提出了滑动 在分散液中含有以下组分：分散体，具有D50值在3μm至30μm范围内并且按重量计至少10重量％的增益尺寸分布的无定形SiO 2颗粒，基于总计 固体含量; 基于总固体含量，具有D50值在1μm至50μm范围内并具有至少30重量％的重量比的粒度分布的球形无定形SiO 2颗粒; 基于总固体含量，粒径小于100nm并且重量比为0.2％至10％的SiO 2纳米颗粒; 和非离子型无碱性表面活性剂，其比例基于分散液体积的0.005〜0.5％。
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4.发明授权公开(公告)号：US09957431B2
公开(公告)日：2018-05-01
申请号：US14077182
申请日：2013-11-11
申请人： Gerrit Scheich , Christian Schenk , Frank Wessely , Nadine Tscholitsch , Ashur J. Atanos , Christian Neumann , Stephan Moritz , Dirk Michel
发明人： Gerrit Scheich , Christian Schenk , Frank Wessely , Nadine Tscholitsch , Ashur J. Atanos , Christian Neumann , Stephan Moritz , Dirk Michel
CPC分类号： C09K5/14 , B28B1/26 , C03B19/066 , C03C14/004 , C03C14/006 , C03C2214/04 , C03C2214/08 , C03C2214/16 , C03C2214/30 , C04B35/14 , C04B35/64 , F27B14/10 , F27B2014/0843 , Y10T428/131
摘要： In a known composite material with a fused silica matrix there are regions of silicon-containing phase embedded. In order to provide a composite material which is suitable for producing components for use in high-temperature processes for heat treatment even when exacting requirements are imposed on impermeability to gas and on purity, it is proposed in accordance with the invention that the composite material be impervious to gas, have a closed porosity of less than 0.5% and a specific density of at least 2.19 g/cm3, and at a temperature of 1000° C. have a spectral emissivity of at least 0.7 for wavelengths between 2 and 8 μm.
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5.发明申请Composite material, heat-absorbing component, and method for producing the composite material 有权复合材料，吸热组件以及复合材料的制造方法公开(公告)号：US20150132511A1
公开(公告)日：2015-05-14
申请号：US14077182
申请日：2013-11-11
申请人： Gerrit Scheich , Christian Schenk , Frank Wessely , Nadine Tscholitsch , Christian Neumann , Stephan Moritz , Dirk Michel , Ashur Atanos
发明人： Gerrit Scheich , Christian Schenk , Frank Wessely , Nadine Tscholitsch , Christian Neumann , Stephan Moritz , Dirk Michel , Ashur Atanos
CPC分类号： C09K5/14 , B28B1/26 , C03B19/066 , C03C14/004 , C03C14/006 , C03C2214/04 , C03C2214/08 , C03C2214/16 , C03C2214/30 , C04B35/14 , C04B35/64 , F27B14/10 , F27B2014/0843 , Y10T428/131
摘要： In a known composite material with a fused silica matrix there are regions of silicon-containing phase embedded. In order to provide a composite material which is suitable for producing components for use in high-temperature processes for heat treatment even when exacting requirements are imposed on impermeability to gas and on purity, it is proposed in accordance with the invention that the composite material be impervious to gas, have a closed porosity of less than 0.5% and a specific density of at least 2.19 g/cm3, and at a temperature of 1000° C. have a spectral emissivity of at least 0.7 for wavelengths between 2 and 8 μm.
摘要翻译： 在具有熔融二氧化硅基质的已知复合材料中，存在嵌入含硅相的区域。 为了提供一种适用于生产用于热处理的高温方法的组分的复合材料，即使当对气体的不渗透性和纯度施加严格要求时，根据本发明提出复合材料为 不透气体，具有小于0.5％的封闭孔隙率和至少2.19g / cm 3的比密度，并且在1000℃的温度下，波长在2和8μm之间的光谱发射率至少为0.7。
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