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公开(公告)号：US10375809B2
公开(公告)日：2019-08-06
申请号：US16156356
申请日：2018-10-10
Applicant: Gigaphoton Inc.
Inventor： Yuta Takashima , Yoshifumi Ueno , Go Shirozu
Abstract: An extreme ultraviolet light generating apparatus includes a laser device, a target detector, and a controller. The laser device emits a pulsed laser beam. The target detector detects a target substance supplied as an application target for the laser beam to the inside of a chamber. The controller controls the laser device based on a burst signal in which a burst period and an idle period are repeated. In the burst period, an extreme ultraviolet light beam has to be generated. In the idle period, the generation of the extreme ultraviolet light beam has to be paused. When a size of a target substance detected at the target detector in the idle period is greater than a predetermined size, the controller may reduce an intensity of a laser beam entering the inside of the chamber from the laser device.
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公开(公告)号：US10271414B2
公开(公告)日：2019-04-23
申请号：US15697915
申请日：2017-09-07
Applicant: Gigaphoton Inc.
Inventor： Kouichi Satou , Takayuki Yabu , Yoshifumi Ueno , Hirokazu Hosoda
Abstract: The stability of operations of an EUV light generating apparatus is improved. A droplet detector may include: a light source unit configured to emit illuminating light onto a droplet, which is output into a chamber and generate extreme ultraviolet light when irradiated with a laser beam; a light receiving unit configured to receive the illuminating light and to detect changes in light intensities; and a timing determining circuit configured to output a droplet detection signal that indicates that the droplet has been detected at a predetermined position within the chamber, based on a first timing at which the light intensity of the illuminating light decreases due to the droplet being irradiated therewith and a second timing at which the light intensity of the illuminating light increases.
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3.发明授权公开(公告)号：US08710475B2
公开(公告)日：2014-04-29
申请号：US13846852
申请日：2013-03-18
Applicant: Gigaphoton Inc.
Inventor： Hiroshi Komori , Tatsuya Yanagida , Yoshifumi Ueno , Akira Sumitani , Akira Endo , Tsukasa Hori
IPC: A61N5/06
CPC classification number: G21K5/00 , G03F7/70033 , G03F7/70916 , H05G2/003 , H05G2/005 , H05G2/008
Abstract: An EUV (Extreme Ultra Violet) light source device ionizes a target material in an ionizer, and supplies the ionized target material to a point of generating a plasma. This reduces the generation of debris. The ionizer simultaneously irradiates laser beams of plural wavelengths corresponding to the excited level of tin on a target material to ionize the target material. The ionized target material is extracted from the ionizer with a high voltage applied from an ion beam extractor, and accelerated and supplied to a plasma generation chamber. When driver laser beam is irradiated on the ionized target material, a plasma is generated, thereby emitting EUV radiation.
Abstract translation: EUV（Extreme Ultra Violet）光源装置将离子发生器中的目标材料离子化，并将电离靶材材料提供到产生等离子体的点。 这减少了碎片的产生。 离子发生器同时将与激发的锡水平相对应的多个波长的激光束照射在目标材料上以电离目标材料。 电离目标材料从离子束提取器施加的高电压从电离器中提取，并被加速并提供给等离子体产生室。 当驱动激光束照射在电离靶材上时，产生等离子体，从而发射EUV辐射。
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4.发明授权公开(公告)号：US08604453B2
公开(公告)日：2013-12-10
申请号：US13904731
申请日：2013-05-29
Applicant: Gigaphoton Inc.
Inventor： Akira Endo , Yoshifumi Ueno , Youichi Sasaki , Osamu Wakabayashi
IPC: H05G2/00
CPC classification number: G21K5/00 , G03F7/70033 , H05G2/00 , H05G2/003 , H05G2/008
Abstract: An extreme ultraviolet light source apparatus, which is to generate an extreme ultraviolet light by irradiating a target with a main pulse laser light after irradiating the target with a prepulse laser light, the extreme ultraviolet light source apparatus comprises: a prepulse laser light source generating a pre-plasma by irradiating the target with the prepulse laser light while a part of the target remains, the pre-plasma being generated at a different region from a target region, the different region being located on an incident side of the prepulse laser light; and a main pulse laser light source generating the extreme ultraviolet light by irradiating the pre-plasma with the main pulse laser light.
Abstract translation: 一种极紫外光源装置，其特征在于，所述极紫外光源装置包括：前脉冲激光光源，其产生前脉冲激光光源，所述极紫外光源装置包括：前脉冲激光光源，其通过用前脉冲激光照射所述靶之后用主脉冲激光照射靶， 在一部分目标物保留的同时用前脉冲激光照射靶的预等离子体，在与目标区域不同的区域产生预等离子体，不同的区域位于预激光激光的入射侧; 以及通过用主脉冲激光照射预等离子体而产生极紫外光的主脉冲激光光源。
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5.发明授权公开(公告)号：US10609803B2
公开(公告)日：2020-03-31
申请号：US16532124
申请日：2019-08-05
Applicant: Gigaphoton Inc.
Inventor： Yuichi Nishimura , Yoshifumi Ueno , Takayuki Yabu
Abstract: An EUV light generating apparatus includes: EUV light sensors configured to measure energy of EUV light from mutually different directions, the EUV light being generated by applying laser light to a target supplied to a predetermined region in a chamber; an application position adjusting unit configured to adjust an application position of the laser light to the target supplied to the predetermined region; and a controller configured to control the application position adjusting unit such that a centroid of the EUV light becomes a target desired centroid, the centroid of the EUV light being specified from measurement results of the EUV light sensors. The controller calibrates the target desired centroid based on EUV light centroids obtained from the energy of the EUV light measured by the EUV light sensors, and a parameter related to the measured energy of the EUV light corresponding to the EUV light centroids.
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Patent Agency Ranking
公开(公告)号：US10455679B2
公开(公告)日：2019-10-22
申请号：US15836877
申请日：2017-12-10
Applicant: Gigaphoton Inc.
Inventor： Takashi Saito , Yoshifumi Ueno , Georg Soumagne
Abstract: The extreme ultraviolet light generation device includes a chamber having a first through-hole that allows a pulse laser beam to enter the chamber, a target supply unit held by the chamber and configured to output a target toward a predetermined region in the chamber, a shield member surrounding the predetermined region in the chamber and having a target path that allows the target outputted from the target supply unit to pass toward the predetermined region, and a tubular member surrounding at least a part of an upstream portion of the trajectory of the target outputted from the target supply unit toward the predetermined region, the upstream portion being upstream from the target path of the shield member.
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公开(公告)号：US10303061B2
公开(公告)日：2019-05-28
申请号：US16001239
申请日：2018-06-06
Applicant: Gigaphoton Inc.
Inventor： Yuichi Nishimura , Takayuki Yabu , Yoshifumi Ueno
Abstract: An extreme ultraviolet light generation device includes: an EUV sensor configured to measure energy of extreme ultraviolet light generated when a target is irradiated with a plurality of laser beams in a predetermined region in a chamber; an irradiation position adjustment unit configured to adjust at least one of irradiation positions of the laser beams with which the target is irradiated in the predetermined region; an irradiation timing adjustment unit configured to adjust at least one of irradiation timings of the laser beams with which the target is irradiated in the predetermined region; and a control unit configured to control the irradiation position adjustment unit and the irradiation timing adjustment unit, the control unit controlling the irradiation position adjustment unit and then controlling the irradiation timing adjustment unit based on a measurement result of the EUV sensor.
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8.发明授权公开(公告)号：US10057972B2
公开(公告)日：2018-08-21
申请号：US15430737
申请日：2017-02-13
Applicant: GIGAPHOTON INC.
Inventor： Yoshifumi Ueno , Hirokazu Hosoda , Takayuki Yabu
CPC classification number: H05G2/008 , G03F7/70033 , H01L21/027 , H01S3/10061 , H05G2/003 , H05G2/006 , H05H1/24 , H05H15/00
Abstract: An extreme ultraviolet light generation system may include a laser system and a controller. The laser system may irradiate the first target with a first pulse laser beam to disperse the first target and produce a mist target, and irradiate the mist target with a second pulse laser beam. The controller may measure a mist diameter of the mist target and control, based on the mist diameter, at least one of time to emit the second pulse laser beam and energy of a first pulse laser beam to be used to irradiate the second target.
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公开(公告)号：US11553583B2
公开(公告)日：2023-01-10
申请号：US17468395
申请日：2021-09-07
Applicant: Gigaphoton Inc.
Inventor： Takayuki Yabu , Yoshifumi Ueno
Abstract: An extreme ultraviolet light generation system may include a laser device configured to emit pulse laser light, an EUV light concentrating mirror configured to reflect and concentrate extreme ultraviolet light generated by irradiating a target with the pulse laser light, and a processor configured to receive a first energy parameter of the extreme ultraviolet light and control an irradiation frequency of the pulse laser light with which the target is irradiated so that change in a second energy parameter related to energy per unit time of the extreme ultraviolet light reflected by the EUV light concentrating mirror is suppressed.
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公开(公告)号：US11228156B2
公开(公告)日：2022-01-18
申请号：US16534806
申请日：2019-08-07
Applicant: Gigaphoton Inc.
Inventor： Yoshifumi Ueno , Yuta Takashima
Abstract: A laser system according to the present disclosure includes: a laser apparatus configured to emit a laser beam; a transmission optical system disposed on a path between the laser apparatus and a target supplied into an EUV chamber in which EUV light is generated; a reflection optical system configured to reflect, toward the target, the laser beam from the transmission optical system; a first sensor configured to detect the laser beam traveling from the laser apparatus toward the reflection optical system; a second sensor configured to detect return light of the laser beam reflected by the reflection optical system and traveling backward to the laser apparatus; and a control unit configured to determine that the reflection optical system is damaged when no anomaly of the laser beam is detected and a light amount of the return light exceeds a predetermined light amount value.
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