Multi-layer reactive sputtering method with reduced stabilization time
    5.
    发明授权
    Multi-layer reactive sputtering method with reduced stabilization time 失效
    减少稳定时间的多层反应溅射法

    公开(公告)号:US06217720B1

    公开(公告)日:2001-04-17

    申请号:US08867789

    申请日:1997-06-03

    IPC分类号: C23C1434

    CPC分类号: C23C14/548 C23C14/568

    摘要: A method is described for depositing a complex optical multilayer coating on a substrate. The coating consists of multiple layers of at least two material types. The layers are sequentially deposited in a deposition chamber by reactive deposition; preferably sputtering, and the thickness of the deposited layers is determined one or more times during the layer deposition by taking optical measurements of the deposited layer and fitting theoretical values derived from a model of the deposited layers to the corresponding actual values obtained from said measurements. A process variable is continually controlled to ensure homogeneity of the deposited layers so that a valid thickness determination can be made from said theoretical model.

    摘要翻译: 描述了一种在衬底上沉积复杂的光学多层涂层的方法。 涂层由至少两种材料类型的多层组成。 这些层通过反应性沉积顺序地沉积在沉积室中; 优选溅射,并且在层沉积期间通过对沉积层进行光学测量并将从沉积层的模型导出的理论值拟合到从所述测量获得的相应实际值来确定沉积层的厚度一次或多次。 连续地控制过程变量以确保沉积层的均匀性,从而可以从所述理论模型进行有效的厚度确定。