PHOTODETECTORS ON FIN STRUCTURE
    1.
    发明公开

    公开(公告)号:US20240072184A1

    公开(公告)日:2024-02-29

    申请号:US17895599

    申请日:2022-08-25

    CPC classification number: H01L31/035281 H01L31/18 H01L31/028

    Abstract: The present disclosure relates to semiconductor structures and, more particularly, to photodetectors and methods of manufacture. The structure includes: a trench structure in a semiconductor substrate; at least one fin structure comprising semiconductor material which extends from a bottom of the trench structure; a photodetector material within the trench structure and extends from the at least one fin structure; a first contact connected to and on a first side of the photodetector material; and a second contact connected to the semiconductor substrate on a second side of the photodetector material.

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