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1.发明授权Illumination system, lithographic apparatus and method of adjusting an illumination mode 有权照明系统，光刻设备和调节照明模式的方法公开(公告)号：US08867021B2
公开(公告)日：2014-10-21
申请号：US13392022
申请日：2010-03-18
申请人： Gosse Charles De Vries , Edwin Johan Buis , Marinus Johannes Maria Van Dam , Jan Bernard Plechelmus Van Schoot , Fidelus Adrianus Boon , Hermanus Johannes Maria Kreuwel
发明人： Gosse Charles De Vries , Edwin Johan Buis , Marinus Johannes Maria Van Dam , Jan Bernard Plechelmus Van Schoot , Fidelus Adrianus Boon , Hermanus Johannes Maria Kreuwel
CPC分类号： G03F7/70116 , G03F7/70075
摘要： An illumination system is disclosed that had a plurality of moveable reflective elements and associated actuators which may be configured to form an illumination mode. One or more of the actuators is arranged to move between first, second and third positions, and so move an associated moveable reflective element between first, second and third orientations, the first and second orientations being such that radiation reflected from the moveable reflective element forms part of the illumination mode, and the third orientation being such that radiation reflected from the moveable reflective element does not form part of the illumination mode.
摘要翻译： 公开了一种照明系统，其具有多个可移动反射元件和相关联的致动器，其可被配置为形成照明模式。 一个或多个致动器布置成在第一，第二和第三位置之间移动，并且因此在第一，第二和第三取向之间移动相关联的可移动反射元件，第一和第二取向使得从可移动反射元件反射的辐射形成 照明模式的一部分，并且第三取向使得从可移动反射元件反射的辐射不会形成照明模式的一部分。
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2.发明授权Device manufacturing method and lithographic apparatus,and computer program product 有权设备制造方法和光刻设备，以及计算机程序产品公开(公告)号：US08218130B2
公开(公告)日：2012-07-10
申请号：US12289920
申请日：2008-11-06
CPC分类号： G03F7/70358 , G03F7/70425 , G03F7/70625
摘要： In a lithographic printing process a substrate is moved, in the scanning direction, relative to a patterned beam of radiation being projected onto it during a scanning exposure of a pattern feature. An image of the pattern feature is blurred in the scanning direction. The effect of the blurring is used to reduce a difference of critical dimension between similar horizontal and vertical features. The effect on critical dimension may be obtained by providing an amount of anamorphic magnification to the projection system.
摘要翻译： 在平版印刷工艺中，在图案特征的扫描曝光期间，衬底沿扫描方向相对于被投影到其上的图案化的辐射束移动。 图案特征的图像在扫描方向上模糊。 模糊的效果用于减少相似的水平和垂直特征之间的临界尺寸的差异。 可以通过向投影系统提供一定量的变形放大来获得对临界尺寸的影响。
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3.发明申请GAS MANIFOLD, MODULE FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权气体放映机，光刻设备模块，光刻设备和器件制造方法公开(公告)号：US20120092631A1
公开(公告)日：2012-04-19
申请号：US13273817
申请日：2011-10-14
申请人： Frank Johannes Jacobus VAN BOXTEL , Marinus Johannes Maria Van Dam , Johannes Christiaan Maria Jasper , Ronald Van Der Ham , Sergei Yurievich Shulepov , Gerben Pieterse , Marco Baragona , Pieter Debrauwer , Antonius Arnoldus Henricus Van Der Steen
发明人： Frank Johannes Jacobus VAN BOXTEL , Marinus Johannes Maria Van Dam , Johannes Christiaan Maria Jasper , Ronald Van Der Ham , Sergei Yurievich Shulepov , Gerben Pieterse , Marco Baragona , Pieter Debrauwer , Antonius Arnoldus Henricus Van Der Steen
IPC分类号： G03B27/52
CPC分类号： G03F7/70891 , G03F7/70091 , G03F7/70991
摘要： A gas manifold to direct a gas flow between two plates of an optical component of a lithographic apparatus, the gas manifold having an inlet, a diffuser downstream of the inlet, a flow straightener downstream of the inlet, a contractor downstream of the flow straightener, and an outlet downstream of the contractor.
摘要翻译： 气体歧管，用于将气流引导到光刻设备的光学部件的两个板之间，气体歧管具有入口，入口下游的扩散器，入口下游的流动矫正器，流动矫直机下游的承重器， 和承包商下游的出口。
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4.发明申请Device manufacturing method and lithographic apparatus,and computer program product 有权设备制造方法和光刻设备，以及计算机程序产品公开(公告)号：US20090122290A1
公开(公告)日：2009-05-14
申请号：US12289920
申请日：2008-11-06
CPC分类号： G03F7/70358 , G03F7/70425 , G03F7/70625
摘要： In a lithographic printing process a substrate is moved, in the scanning direction, relative to a patterned beam of radiation being projected onto it during a scanning exposure of a pattern feature. An image of the pattern feature is blurred in the scanning direction. The effect of the blurring is used to reduce a difference of critical dimension between similar horizontal and vertical features. The effect on critical dimension may obtained by providing an amount of anamorphic magnification to the projection system.
摘要翻译： 在平版印刷工艺中，在图案特征的扫描曝光期间，衬底沿扫描方向相对于被投影到其上的图案化的辐射束移动。 图案特征的图像在扫描方向上模糊。 模糊的效果用于减少相似的水平和垂直特征之间的临界尺寸的差异。 通过向投影系统提供一定量的变形放大可以获得对临界尺寸的影响。
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5.发明授权Gas manifold, module for a lithographic apparatus, lithographic apparatus and device manufacturing method 有权气体歧管，光刻设备模块，光刻设备和器件制造方法公开(公告)号：US08675169B2
公开(公告)日：2014-03-18
申请号：US13273817
申请日：2011-10-14
申请人： Frank Johannes Jacobus Van Boxtel , Marinus Johannes Maria Van Dam , Johannes Christiaan Maria Jasper , Ronald Van Der Ham , Sergei Yurievich Shulepov , Gerben Pieterse , Marco Baragona , Pieter Debrauwer , Antonius Arnoldus Henricus Van Der Steen
发明人： Frank Johannes Jacobus Van Boxtel , Marinus Johannes Maria Van Dam , Johannes Christiaan Maria Jasper , Ronald Van Der Ham , Sergei Yurievich Shulepov , Gerben Pieterse , Marco Baragona , Pieter Debrauwer , Antonius Arnoldus Henricus Van Der Steen
CPC分类号： G03F7/70891 , G03F7/70091 , G03F7/70991
摘要： A gas manifold to direct a gas flow between two plates of an optical component of a lithographic apparatus, the gas manifold having an inlet, a diffuser downstream of the inlet, a flow straightener downstream of the inlet, a contractor downstream of the flow straightener, and an outlet downstream of the contractor.
摘要翻译： 气体歧管，用于将气流引导到光刻设备的光学部件的两个板之间，气体歧管具有入口，入口下游的扩散器，入口下游的流动矫正器，流动矫直机下游的承重器， 和承包商下游的出口。
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公开(公告)号：US07148954B2
公开(公告)日：2006-12-12
申请号：US11086662
申请日：2005-03-23
CPC分类号： G03F7/70991 , G03F7/70525
摘要： An apparatus and method for imaging a pattern onto a substrate is described. A recipe for producing an image includes optional tool-type information. Where tool-type information indicates that the recipe pertains to a different tool type, the apparatus makes adjustments to its imaging settings in order to emulate performance of the different tool type.
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