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1.发明申请GAS MANIFOLD, MODULE FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权气体放映机，光刻设备模块，光刻设备和器件制造方法公开(公告)号：US20120092631A1
公开(公告)日：2012-04-19
申请号：US13273817
申请日：2011-10-14
申请人： Frank Johannes Jacobus VAN BOXTEL , Marinus Johannes Maria Van Dam , Johannes Christiaan Maria Jasper , Ronald Van Der Ham , Sergei Yurievich Shulepov , Gerben Pieterse , Marco Baragona , Pieter Debrauwer , Antonius Arnoldus Henricus Van Der Steen
发明人： Frank Johannes Jacobus VAN BOXTEL , Marinus Johannes Maria Van Dam , Johannes Christiaan Maria Jasper , Ronald Van Der Ham , Sergei Yurievich Shulepov , Gerben Pieterse , Marco Baragona , Pieter Debrauwer , Antonius Arnoldus Henricus Van Der Steen
IPC分类号： G03B27/52
CPC分类号： G03F7/70891 , G03F7/70091 , G03F7/70991
摘要： A gas manifold to direct a gas flow between two plates of an optical component of a lithographic apparatus, the gas manifold having an inlet, a diffuser downstream of the inlet, a flow straightener downstream of the inlet, a contractor downstream of the flow straightener, and an outlet downstream of the contractor.
摘要翻译： 气体歧管，用于将气流引导到光刻设备的光学部件的两个板之间，气体歧管具有入口，入口下游的扩散器，入口下游的流动矫正器，流动矫直机下游的承重器， 和承包商下游的出口。
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2.发明授权Gas manifold, module for a lithographic apparatus, lithographic apparatus and device manufacturing method 有权气体歧管，光刻设备模块，光刻设备和器件制造方法公开(公告)号：US08675169B2
公开(公告)日：2014-03-18
申请号：US13273817
申请日：2011-10-14
申请人： Frank Johannes Jacobus Van Boxtel , Marinus Johannes Maria Van Dam , Johannes Christiaan Maria Jasper , Ronald Van Der Ham , Sergei Yurievich Shulepov , Gerben Pieterse , Marco Baragona , Pieter Debrauwer , Antonius Arnoldus Henricus Van Der Steen
发明人： Frank Johannes Jacobus Van Boxtel , Marinus Johannes Maria Van Dam , Johannes Christiaan Maria Jasper , Ronald Van Der Ham , Sergei Yurievich Shulepov , Gerben Pieterse , Marco Baragona , Pieter Debrauwer , Antonius Arnoldus Henricus Van Der Steen
CPC分类号： G03F7/70891 , G03F7/70091 , G03F7/70991
摘要： A gas manifold to direct a gas flow between two plates of an optical component of a lithographic apparatus, the gas manifold having an inlet, a diffuser downstream of the inlet, a flow straightener downstream of the inlet, a contractor downstream of the flow straightener, and an outlet downstream of the contractor.
摘要翻译： 气体歧管，用于将气流引导到光刻设备的光学部件的两个板之间，气体歧管具有入口，入口下游的扩散器，入口下游的流动矫正器，流动矫直机下游的承重器， 和承包商下游的出口。
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3.发明申请FLUID HANDLING STRUCTURE, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD 失效流体处理结构，平面设备和设备制造方法公开(公告)号：US20110292357A1
公开(公告)日：2011-12-01
申请号：US13098830
申请日：2011-05-02
申请人： Ronald Van Der Ham , Martinus Hendrikus Antonius Leenders , Johannes Catharinus Hubertus Mulkens , Richard Moerman , Michel Riepen , Sergei Shulepov , Koen Steffens , Jan Willem Cromwijk , Johanna Antoinette Maria Sondag-Huethorst , Marco Baragona , Robertus Leonardus Maria In 'T Groen , Ralph Theodorus Hubertus Maessen , Jacob Marinus Jan Den Toonder , Milica Kovacevic-Milivojevic
发明人： Ronald Van Der Ham , Martinus Hendrikus Antonius Leenders , Johannes Catharinus Hubertus Mulkens , Richard Moerman , Michel Riepen , Sergei Shulepov , Koen Steffens , Jan Willem Cromwijk , Johanna Antoinette Maria Sondag-Huethorst , Marco Baragona , Robertus Leonardus Maria In 'T Groen , Ralph Theodorus Hubertus Maessen , Jacob Marinus Jan Den Toonder , Milica Kovacevic-Milivojevic
IPC分类号： G03B27/52
CPC分类号： G03F7/70925 , G03F7/70 , G03F7/70341
摘要： A fluid handling structure to confine immersion liquid in a space between a projection system and a facing surface of a substrate, of a table to support the substrate, or both, is disclosed. The fluid handling structure includes a transponder to dissolve at least some of the gas in a bubble in the immersion liquid or to control a bubble in the immersion liquid so that it avoids entering an optical path of a beam from the projection system.
摘要翻译： 公开了一种用于将浸没液体限制在投影系统和基板的面对表面之间的空间中的流体处理结构，用于支撑基板的台面或两者。 流体处理结构包括一个应答器，用于溶解浸入液体中的气泡中的至少一些气体或控制浸没液体中的气泡，使得其避免进入来自投影系统的光束的光路。
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4.发明授权Fluid handling structure, a lithographic apparatus and a device manufacturing method 失效流体处理结构，光刻设备和装置制造方法公开(公告)号：US08711326B2
公开(公告)日：2014-04-29
申请号：US13098830
申请日：2011-05-02
申请人： Ronald Van Der Ham , Martinus Hendrikus Antonius Leenders , Johannes Catharinus Hubertus Mulkens , Richard Moerman , Michel Riepen , Sergei Shulepov , Koen Steffens , Jan Willem Cromwijk , Johanna Antoinette Maria Sondag-Huethorst , Marco Baragona , Robertus Leonardus Maria In 'T Groen , Ralph Theodorus Hubertus Maessen , Jacob Marinus Jan Den Toonder , Milica Kovacevic-Milivojevic
发明人： Ronald Van Der Ham , Martinus Hendrikus Antonius Leenders , Johannes Catharinus Hubertus Mulkens , Richard Moerman , Michel Riepen , Sergei Shulepov , Koen Steffens , Jan Willem Cromwijk , Johanna Antoinette Maria Sondag-Huethorst , Marco Baragona , Robertus Leonardus Maria In 'T Groen , Ralph Theodorus Hubertus Maessen , Jacob Marinus Jan Den Toonder , Milica Kovacevic-Milivojevic
CPC分类号： G03F7/70925 , G03F7/70 , G03F7/70341
摘要： A fluid handling structure to confine immersion liquid in a space between a projection system and a facing surface of a substrate, of a table to support the substrate, or both, is disclosed. The fluid handling structure includes a transponder to dissolve at least some of the gas in a bubble in the immersion liquid or to control a bubble in the immersion liquid so that it avoids entering an optical path of a beam from the projection system.
摘要翻译： 公开了一种用于将浸没液体限制在投影系统和基板的面对表面之间的空间中的流体处理结构，用于支撑基板或两者的台。 流体处理结构包括一个应答器，用于溶解浸入液体中的气泡中的至少一些气体或控制浸没液体中的气泡，使得其避免进入来自投影系统的光束的光路。
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公开(公告)号：US09618835B2
公开(公告)日：2017-04-11
申请号：US13017700
申请日：2011-01-31
申请人： Daniel Jozef Maria Direcks , Erik Henricus Egidius Catharina Eummelen , Clemens Johannes Gerardus Van Den Dungen , Maikel Adrianus Cornelis Schepers , Sergei Shulepov , Pieter Mulder , David Bessems , Marco Baragona
发明人： Daniel Jozef Maria Direcks , Erik Henricus Egidius Catharina Eummelen , Clemens Johannes Gerardus Van Den Dungen , Maikel Adrianus Cornelis Schepers , Sergei Shulepov , Pieter Mulder , David Bessems , Marco Baragona
IPC分类号： G03B27/52
CPC分类号： G03B27/52
摘要： In a liquid confinement structure of an immersion lithographic apparatus an elongate continuous opening forms an outlet for supplying liquid to a space beneath the projection system. The elongate slit forms a region of high shear and pressure gradient that deflects bubbles away from the image field.
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公开(公告)号：US20110188012A1
公开(公告)日：2011-08-04
申请号：US13017700
申请日：2011-01-31
申请人： Daniel Jozef Maria DIRECKS , Erik Henricus Egidius Catharina Eummelen , Clemens Johannes Gerardus Van Den Dungen , Maikel Adrianus Cornelis Schepers , Sergei Shulepov , Pieter Mulder , David Bessems , Marco Baragona
发明人： Daniel Jozef Maria DIRECKS , Erik Henricus Egidius Catharina Eummelen , Clemens Johannes Gerardus Van Den Dungen , Maikel Adrianus Cornelis Schepers , Sergei Shulepov , Pieter Mulder , David Bessems , Marco Baragona
IPC分类号： G03B27/52
CPC分类号： G03B27/52
摘要： In a liquid confinement structure of an immersion lithographic apparatus an elongate continuous opening forms an outlet for supplying liquid to a space beneath the projection system. The elongate slit forms a region of high shear and pressure gradient that deflects bubbles away from the image field.
摘要翻译： 在浸没式光刻设备的液体限制结构中，细长的连续开口形成用于将液体供应到投影系统下方的空间的出口。 细长狭缝形成高剪切和压力梯度的区域，其使气泡偏离图像场。
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